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公开(公告)号：US08633259B2
公开(公告)日：2014-01-21
申请号：US13339784
申请日：2011-12-29
CPC分类号： C08K5/41 , C08K5/04 , C08K5/1535 , C08K5/16 , C08K5/5419 , C08K5/5425 , C08K5/548 , H01L21/6835 , H01L2221/68327 , H01L2221/6834 , H01L2221/68381 , C08L101/00
摘要： Embodiments in accordance with the present invention are directed to polymer compositions that are useful for forming temporary bonding layers that serve to releasably join a first substrate to a second substrate as well as methods of both forming such a temporary bond and methods of debonding such substrates. Some such polymer compositions encompass a casting solvent, a photoacid generator and optionally a sensitizer and/or an adhesion promoter.
摘要翻译： 根据本发明的实施方案涉及可用于形成用于将第一基底可释放地连接到第二基底的临时粘合层的聚合物组合物以及形成这种临时粘结的方法以及使这种基底脱粘的方法。 一些这样的聚合物组合物包括浇铸溶剂，光致酸产生剂和任选的敏化剂和/或粘合促进剂。
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2.发明授权Norbornene-type polymers, compositions thereof and lithographic processes using such compositions 失效降冰片烯型聚合物，其组合物和使用这种组合物的平版印刷方法公开(公告)号：US08329838B2
公开(公告)日：2012-12-11
申请号：US12884786
申请日：2010-09-17
申请人： Larry F. Rhodes , Chun Chang , Pramod Kandanarachchi , Lawrence D. Seger , Keita Ishiduka , Kotaro Endo , Tomoyuki Ando
发明人： Larry F. Rhodes , Chun Chang , Pramod Kandanarachchi , Lawrence D. Seger , Keita Ishiduka , Kotaro Endo , Tomoyuki Ando
CPC分类号： G03F7/0395 , C08F232/08 , G03F7/0046 , G03F7/11 , G03F7/2041 , H01L2924/0002 , H01L2924/00
摘要： Embodiments of the present invention relate generally to non-self imagable and imagable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.
摘要翻译： 本发明的实施方案一般涉及可用于浸渍式光刻工艺的非自成像和可成象的降冰片烯型聚合物，制备这种聚合物的方法，使用这种聚合物的组合物以及使用这种组合物的浸渍光刻工艺。 更具体地，本发明的实施方案涉及可用于在浸没式光刻工艺中形成成像层和用于覆盖这种成像层的顶涂层的降冰片烯型聚合物及其工艺。
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公开(公告)号：US20120172479A1
公开(公告)日：2012-07-05
申请号：US13339784
申请日：2011-12-29
IPC分类号： C08K5/1535 , C08K5/101 , H01L21/02 , C08K5/07 , C08K5/05 , B32B37/24 , C08K5/3415 , C08K5/20
CPC分类号： C08K5/41 , C08K5/04 , C08K5/1535 , C08K5/16 , C08K5/5419 , C08K5/5425 , C08K5/548 , H01L21/6835 , H01L2221/68327 , H01L2221/6834 , H01L2221/68381 , C08L101/00
摘要： Embodiments in accordance with the present invention are directed to polymer compositions that are useful for forming temporary bonding layers that serve to releasably join a first substrate to a second substrate as well as methods of both forming such a temporary bond and methods of debonding such substrates. Some such polymer compositions encompass a casting solvent, a photoacid generator and optionally a sensitizer and/or an adhesion promoter.
摘要翻译： 根据本发明的实施方案涉及可用于形成用于将第一基底可释放地连接到第二基底的临时粘合层的聚合物组合物以及形成这种临时粘结的方法以及使这种基底脱粘的方法。 一些这样的聚合物组合物包括浇铸溶剂，光致酸产生剂和任选的敏化剂和/或粘合促进剂。
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公开(公告)号：US08114948B2
公开(公告)日：2012-02-14
申请号：US11324738
申请日：2006-01-03
申请人： Edmund Elce , Takashi Hirano , Jeffrey C. Krotine, Jr. , Larry F. Rhodes , Brian L. Goodall , SaiKumar Jayaraman , W. Chris McDougall , Shenliang Sun
发明人： Edmund Elce , Takashi Hirano , Jeffrey C. Krotine, Jr. , Larry F. Rhodes , Brian L. Goodall , SaiKumar Jayaraman , W. Chris McDougall , Shenliang Sun
CPC分类号： G03F7/0382 , C08G59/3218 , C08G61/02 , C08G61/06
摘要： A copolymer composition including a copolymer having repeat units of structural formula I: where X is selected from —CH2—, —CH2—CH2— and O; m is an integer from 0 to 5; and each occurrence of R1-R4 are independently selected from H; C1 to C25 linear, branched, and cyclic alkyl, aryl, aralkyl, alkaryl, alkenyl and alkynyl that can include one or more hetero atoms selected from O, N, and Si; a group that contains an epoxy functionality; —(CH2)nC(O)OR5; —(CH2)nC(O)OR6; —(CH2)nOR6; —(CH2)nOC(O)R6; —(CH2)nC(O)R6; —(CH2)nOC(O)OR6; and any combination of two of R1, R2, R3, and R4 linked together by a linking group. A portion of the repeat units having structural formula I contain at least one epoxy functional pendant group. The copolymer composition can be included with a material that photonically forms a catalyst in a photodefinable dielectric composition, which can be used to form a photodefinable layer on a substrate.
摘要翻译： 一种共聚物组合物，其包含具有结构式I的重复单元的共聚物：其中X选自-CH 2 - ， - CH 2 -CH 2 - 和O; m是0至5的整数; 并且每次出现的R 1 -R 4独立地选自H; 可以包括一个或多个选自O，N和Si的杂原子的C 1至C 25直链，支链和环烷基，芳基，芳烷基，烷芳基，烯基和炔基; 含有环氧官能团的基团; - （CH 2）n C（O）OR 5; - （CH 2）n C（O）OR 6; - （CH 2）nOR 6; - （CH 2）n OC（O）R 6; - （CH 2）n C（O）R 6; - （CH 2）n OC（O）OR 6; 并且通过连接基团连接在一起的R1，R2，R3和R4中的两个的任意组合。 具有结构式I的重复单元的一部分含有至少一个环氧官能侧基。 该共聚物组合物可以包含在可光致定影的电介质组合物中光子形成催化剂的材料，该组合物可用于在基底上形成光可定义层。
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5.发明授权Vinyl addition polycyclic olefin polymers prepared with non-olefinic chain transfer agents and uses thereof 有权用非烯烃链转移剂制备的乙烯基加成多环烯烃聚合物及其用途公开(公告)号：US07674847B2
公开(公告)日：2010-03-09
申请号：US10782547
申请日：2004-02-19
申请人： Larry F. Rhodes , Dennis A. Barnes , Andrew Bell , Brian K. Bennet , Chung Chang , John-Henry Lipian , Xiaoming Wu
发明人： Larry F. Rhodes , Dennis A. Barnes , Andrew Bell , Brian K. Bennet , Chung Chang , John-Henry Lipian , Xiaoming Wu
IPC分类号： C08F4/44
CPC分类号： C08F2/38 , C08F232/00 , C08F232/08 , Y10S526/905
摘要： A method of polymerizing poly(cyclic)olefin monomers encompassing (a) combining a monomer composition containing the poly(cyclic)olefin monomers, a non-olefinic chain transfer agent and an activator compound to form a mixture; (b) heating the mixture; and (c) adding a polymerization catalyst containing Ni and/or Pd. The non-olefinic chain transfer agent includes one or more compounds selected from H2, alkylsilanes, alkylalkoxysilanes, alkylgermanes, alkylalkoxygermanes, alkylstannanes, and alkylalkoxystannanes. The activator is characterized as having an active hydrogen with a pKa of at least 5. The resulting poly(cyclic)olefin polymers can be used in photoresist compositions.
摘要翻译： 聚合聚（环状）烯烃单体的方法包括（a）将含有聚（环状）烯烃单体，非烯烃链转移剂和活化剂化合物的单体组合物混合以形成混合物; （b）加热混合物; 和（c）加入含有Ni和/或Pd的聚合催化剂。 非烯烃链转移剂包括一种或多种选自H 2，烷基硅烷，烷基烷氧基硅烷，烷基锗烷，烷基烷氧基锗烷，烷基锡烷和烷基烷氧基烷烃的化合物。 活化剂的特征在于具有pKa至少为5的活性氢。所得聚（环状）烯烃聚合物可用于光致抗蚀剂组合物中。
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公开(公告)号：US07612146B2
公开(公告)日：2009-11-03
申请号：US11220814
申请日：2005-09-07
申请人： Larry F. Rhodes , Richard Vicari , Leah J. Langsdorf , Andrew A. Sobek , Edwin P. Boyd , Brian Bennett
发明人： Larry F. Rhodes , Richard Vicari , Leah J. Langsdorf , Andrew A. Sobek , Edwin P. Boyd , Brian Bennett
IPC分类号： C08F8/42
CPC分类号： C08G61/06 , G03F7/0046 , G03F7/0395 , G03F7/0397
摘要： The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer.
摘要翻译： 本发明涉及多环聚合物，多环聚合物的制备方法及其在制造集成电路中用作光致抗蚀剂的方法。 在一个实施方案中，本发明涉及由至少一种卤代多环单体或氢卤化多环单体的聚合形成的光致抗蚀剂组合物。 在另一个实施方案中，本发明涉及由至少一种卤代多环单体或氢卤化多环单体与至少一种非卤化多环单体的共聚合形成的光致抗蚀剂组合物。
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公开(公告)号：US20090270247A1
公开(公告)日：2009-10-29
申请号：US12428936
申请日：2009-04-23
IPC分类号： B01J31/12
CPC分类号： C08F4/70 , C08F4/7037 , C08F232/08 , C08F2410/03
摘要： Embodiments in accordance with the present invention encompass methods of forming in situ olefin polymerization catalyst systems, catalysts encompassed by such systems and polymers made using such systems. For such in situ olefin polymerization catalyst systems, a hydrocarbyl magnesium halide is generally contacted with a halohydrocarbyl compound to form a halohydrocarbyl Grignard and such Grignard is generally contacted with a Group 10 metal compound to form an olefin polymerization catalyst which is contacted with one or more olefin monomers to form a polymer therefrom.
摘要翻译： 根据本发明的实施方案包括形成原位烯烃聚合催化剂体系，由这种体系包含的催化剂和使用这种体系制备的聚合物的方法。 对于这样的原位烯烃聚合催化剂体系，烃基卤化镁通常与卤代烃基化合物接触以形成卤代烃基格氏，并且这种格利雅特通常与第10族金属化合物接触以形成烯烃聚合催化剂，其与一种或多种 烯烃单体从其形成聚合物。
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公开(公告)号：US07422836B2
公开(公告)日：2008-09-09
申请号：US10783386
申请日：2004-02-20
IPC分类号： G03F7/00 , G03F7/004 , C08F136/00
CPC分类号： C08F232/08 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397
摘要： Oligomers of polycyclic olefin monomers, and optionally allylic or olefinic monomers, and a method of making such oligomers that includes reacting polycyclic olefin monomers in the presence of a Ni or Pd containing catalyst, or in the case of allylic monomers in the presence of a free radical initiator. The oligomers can be included in photoresist compositions as dissolution rate modifiers. The photoresist compositions can further include a polymeric binder resin, a photoacid generator, and solvents.
摘要翻译： 多环烯烃单体和任选的烯丙基或烯属单体的低聚物，以及制备这样的低聚物的方法，其包括在含有Ni或Pd的催化剂存在下使多环烯烃单体反应，或者在烯丙基单体的情况下， 自由基引发剂。 低聚物可以包含在光致抗蚀剂组合物中作为溶解速率改性剂。 光致抗蚀剂组合物还可以包括聚合物粘合剂树脂，光致酸产生剂和溶剂。
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公开(公告)号：US06949609B2
公开(公告)日：2005-09-27
申请号：US10317366
申请日：2002-12-12
申请人： Larry F. Rhodes , Richard Vicari , Leah J. Langsdorf , Andrew A. Sobek , Edwin P. Boyd , Brian Bennett
发明人： Larry F. Rhodes , Richard Vicari , Leah J. Langsdorf , Andrew A. Sobek , Edwin P. Boyd , Brian Bennett
CPC分类号： C08G61/06 , G03F7/0046 , G03F7/0395 , G03F7/0397
摘要： The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer. Additionally, the present invention relates to methods by which to post-treat such photoresist compositions in order to obtain one or more of: (1) a reduction in optical density of the polymer composition; and (2) a reduction in the amount of residual metal and/or monomer in the polymer composition. Also disclosed are catalyst systems for use in producing the photoresist compositions of the present invention which permit molecular weight control of the photoresist products.
摘要翻译： 本发明涉及多环聚合物，多环聚合物的制备方法及其在制造集成电路中用作光致抗蚀剂的方法。 在一个实施方案中，本发明涉及由至少一种卤代多环单体或氢卤化多环单体的聚合形成的光致抗蚀剂组合物。 在另一个实施方案中，本发明涉及由至少一种卤代多环单体或氢卤化多环单体与至少一种非卤化多环单体的共聚合形成的光致抗蚀剂组合物。 另外，本发明涉及用于后处理这种光致抗蚀剂组合物以便获得以下一种或多种的方法：（1）聚合物组合物的光密度的降低; 和（2）聚合物组合物中残余金属和/或单体的量的减少。 还公开了用于制备本发明的光致抗蚀剂组合物的催化剂体系，其允许光致抗蚀剂产品的分子量控制。
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公开(公告)号：US06790579B1
公开(公告)日：2004-09-14
申请号：US09630894
申请日：2000-08-02
IPC分类号： G03F7039
CPC分类号： C08G61/08 , G03F7/0045 , G03F7/038 , G03F7/039 , Y10S430/106
摘要： The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
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