公开(公告)号：US08456610B2

公开(公告)日：2013-06-04

申请号：US12382661

申请日：2009-03-20

申请人： Andrew J. Hazelton ,  Michael Sogard

发明人： Andrew J. Hazelton ,  Michael Sogard

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866 ,  G03F7/709

摘要： A liquid containment system is used for a liquid immersion lithography apparatus in which a substrate is exposed through liquid between an optical member of a projection system and the substrate. The liquid containment system includes a liquid containment member which confines the liquid, the liquid containment member including a removing inlet which removes the liquid from a gap between the liquid confinement member and the substrate. The liquid containment system also includes an actuator by which the liquid containment member is moved.

公开(公告)号：US07839486B2

公开(公告)日：2010-11-23

申请号：US11701378

申请日：2007-02-02

申请人： Andrew J. Hazelton ,  Michael Sogard

发明人： Andrew J. Hazelton ,  Michael Sogard

IPC分类号： G03B27/42 ,  G03B27/52

摘要： A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table, the space having a cross-sectional area smaller than the area of the substrate. The liquid confinement structure includes a first inlet to supply liquid, through which the patterned beam is projected, to the space, a first outlet to remove liquid after the liquid has passed under the projection system, a second inlet formed in a face of the structure, the face arranged to oppose a surface of the substrate, and located radially outward, with respect to an optical axis of the projection system, of the space to supply gas, and a second outlet formed in the face and located radially outward, with respect to an optical axis of the projection system, of the second inlet to remove gas.

公开(公告)号：US20090180096A1

公开(公告)日：2009-07-16

申请号：US12382661

申请日：2009-03-20

申请人： Andrew J. Hazelton ,  Michael Sogard

发明人： Andrew J. Hazelton ,  Michael Sogard

IPC分类号： G03B27/58

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866 ,  G03F7/709

摘要： A liquid containment system is used for a liquid immersion lithography apparatus in which a substrate is exposed through liquid between an optical member of a projection system and the substrate. The liquid containment system includes a liquid containment member which confines the liquid, the liquid containment member including a removing inlet which removes the liquid from a gap between the liquid confinement member and the substrate. The liquid containment system also includes an actuator by which the liquid containment member is moved.

摘要翻译： 液体容纳系统用于液浸式光刻设备，其中衬底通过液体在投影系统的光学构件和衬底之间暴露。 液体容纳系统包括限制液体的液体容纳构件，液体容纳构件包括从液体限制构件和衬底之间的间隙去除液体的去除入口。 液体容纳系统还包括致动器，液体容纳构件通过致动器移动。

公开(公告)号：US08836914B2

公开(公告)日：2014-09-16

申请号：US13529663

申请日：2012-06-21

申请人： Andrew J. Hazelton ,  Michael Sogard

发明人： Andrew J. Hazelton ,  Michael Sogard

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866 ,  G03F7/709

摘要： A liquid immersion lithography apparatus exposes a wafer through a liquid in a space under a lens. The apparatus includes a containment member provided such that the containment member surrounds the space under the lens, and a seal member provided between the lens and the containment member. The containment member has a first fluid inlet. The first fluid inlet removes fluid from a gap between the containment member and the wafer during the exposure.

摘要翻译： 液浸式光刻设备通过透镜下的空间中的液体暴露晶片。 该装置包括设置成使得容纳构件围绕透镜下方的空间的密封构件和设置在透镜和容纳构件之间的密封构件。 容纳构件具有第一流体入口。 第一流体入口在曝光期间从容纳构件和晶片之间的间隙中去除流体。

公开(公告)号：US08089610B2

公开(公告)日：2012-01-03

申请号：US11701378

申请日：2007-02-02

申请人： Andrew J. Hazelton ,  Michael Sogard

发明人： Andrew J. Hazelton ,  Michael Sogard

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866 ,  G03F7/709

摘要： A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table, the space having a cross-sectional area smaller than the area of the substrate. The liquid confinement structure includes a first inlet to supply liquid, through which the patterned beam is projected, to the space, a first outlet to remove liquid after the liquid has passed under the projection system, a second inlet formed in a face of the structure, the face arranged to oppose a surface of the substrate, and located radially outward, with respect to an optical axis of the projection system, of the space to supply gas, and a second outlet formed in the face and located radially outward, with respect to an optical axis of the projection system, of the second inlet to remove gas.

摘要翻译： 光刻投影装置包括沿着投影系统和基板台之间的空间的边界的至少一部分延伸的液体限制结构，该空间的横截面积小于基板的面积。 液体限制结构包括：第一入口，用于将图案化的光束投射到该空间上的液体供给液体经过投影系统之前的第一出口以去除液体，形成在该结构的表面上的第二入口 相对于投影系统的光轴径向向外设置有供给气体的空间的面以及形成在该表面上并位于径向外侧的第二出口，该第二出口相对于基板的表面 到第二入口的投影系统的光轴，以除去气体。

公开(公告)号：US07456930B2

公开(公告)日：2008-11-25

申请号：US11819089

申请日：2007-06-25

申请人： Andrew J Hazelton ,  Michael Sogard

发明人： Andrew J Hazelton ,  Michael Sogard

IPC分类号： G03B27/42 ,  G03B27/58

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866 ,  G03F7/709

摘要： An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier and an immersion fluid system. The fluid barrier is positioned near the device. The immersion fluid system delivers an immersion fluid that fills the gap and collects the immersion fluid that is directly between the fluid barrier and the device. The fluid barrier can include a scavenge inlet that is positioned near the device, and the immersion fluid system can include a low pressure source that is in fluid communication with the scavenge inlet. The fluid barrier confines any vapor of the immersion fluid and prevents it from perturbing a measurement system. Additionally, the environmental system can include a bearing fluid source that directs a bearing fluid between the fluid barrier and the device to support the fluid barrier relative to the device.

公开(公告)号：US08810768B2

公开(公告)日：2014-08-19

申请号：US12926029

申请日：2010-10-21

申请人： Andrew J. Hazelton ,  Michael Sogard

发明人： Andrew J. Hazelton ,  Michael Sogard

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866 ,  G03F7/709

摘要： A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table, the space having a cross-sectional area smaller than the area of the substrate. The liquid confinement structure includes a first inlet to supply liquid, through which the patterned beam is projected, to the space, a first outlet to remove liquid after the liquid has passed under the projection system, a second inlet formed in a face of the structure, the face arranged to oppose a surface of the substrate, and located radially outward, with respect to an optical axis of the projection system, of the space to supply gas, and a second outlet formed in the face and located radially outward, with respect to an optical axis of the projection system, of the second inlet to remove gas.

摘要翻译： 光刻投影装置包括沿着投影系统和基板台之间的空间的边界的至少一部分延伸的液体限制结构，该空间的横截面积小于基板的面积。 液体限制结构包括：第一入口，用于将图案化的光束投射到该空间上的液体供给液体经过投影系统之前的第一出口以去除液体，形成在该结构的表面上的第二入口 相对于投影系统的光轴径向向外设置有供给气体的空间的面以及形成在该表面上并位于径向外侧的第二出口，该第二出口相对于基板的表面 到第二入口的投影系统的光轴，以除去气体。

公开(公告)号：US07932995B2

公开(公告)日：2011-04-26

申请号：US11701378

申请日：2007-02-02

申请人： Andrew J. Hazelton ,  Michael Sogard

发明人： Andrew J. Hazelton ,  Michael Sogard

IPC分类号： G03B27/42 ,  G03B27/52

摘要： A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table, the space having a cross-sectional area smaller than the area of the substrate. The liquid confinement structure includes a first inlet to supply liquid, through which the patterned beam is projected, to the space, a first outlet to remove liquid after the liquid has passed under the projection system, a second inlet formed in a face of the structure, the face arranged to oppose a surface of the substrate, and located radially outward, with respect to an optical axis of the projection system, of the space to supply gas, and a second outlet formed in the face and located radially outward, with respect to an optical axis of the projection system, of the second inlet to remove gas.

公开(公告)号：US20110037959A1

公开(公告)日：2011-02-17

申请号：US12926029

申请日：2010-10-21

申请人： Andrew J. Hazelton ,  Michael Sogard

发明人： Andrew J. Hazelton ,  Michael Sogard

IPC分类号： G03B27/52

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866 ,  G03F7/709

摘要： A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table, the space having a cross-sectional area smaller than the area of the substrate. The liquid confinement structure includes a first inlet to supply liquid, through which the patterned beam is projected, to the space, a first outlet to remove liquid after the liquid has passed under the projection system, a second inlet formed in a face of the structure, the face arranged to oppose a surface of the substrate, and located radially outward, with respect to an optical axis of the projection system, of the space to supply gas, and a second outlet formed in the face and located radially outward, with respect to an optical axis of the projection system, of the second inlet to remove gas.

摘要翻译： 光刻投影装置包括沿着投影系统和基板台之间的空间的边界的至少一部分延伸的液体限制结构，该空间的横截面积小于基板的面积。 液体限制结构包括：第一入口，用于将图案化的光束投射到该空间上的液体供给液体经过投影系统之前的第一出口以去除液体，形成在该结构的表面上的第二入口 相对于投影系统的光轴径向向外设置有供给气体的空间的面以及形成在该表面上并位于径向外侧的第二出口，该第二出口相对于基板的表面 到第二入口的投影系统的光轴，以除去气体。

公开(公告)号：US07321415B2

公开(公告)日：2008-01-22

申请号：US11237799

申请日：2005-09-29

申请人： Andrew J. Hazelton ,  Michael Sogard

发明人： Andrew J. Hazelton ,  Michael Sogard

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/58

CPC分类号： G03F7/70875 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866 ,  G03F7/709

摘要： An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier and an immersion fluid system. The fluid barrier is positioned near the device. The immersion fluid system delivers an immersion fluid that fills the gap and collects the immersion fluid that is directly between the fluid barrier and the device. The fluid barrier can include a scavenge inlet that is positioned near the device, and the immersion fluid system can include a low pressure source that is in fluid communication with the scavenge inlet. The fluid barrier confines any vapor of the immersion fluid and prevents it from perturbing a measurement system. Additionally, the environmental system can include a bearing fluid source that directs a bearing fluid between the fluid barrier and the device to support the fluid barrier relative to the device.

摘要翻译： 环境系统控制光学组件和装置之间的间隙中的环境，并且包括流体屏障和浸液系统。 流体屏障位于设备附近。 浸没流体系统提供填充间隙的浸没流体并且收集直接在流体屏障和装置之间的浸没流体。 流体屏障可以包括位于装置附近的扫气入口，并且浸没流体系统可以包括与清流入口流体连通的低压源。 流体屏障限制浸没流体的任何蒸气，并防止其扰动测量系统。 此外，环境系统可以包括轴承流体源，其将轴承流体引导在流体屏障和装置之间以相对于装置支撑流体屏障。