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公开(公告)号:US08481163B2
公开(公告)日:2013-07-09
申请号:US10552546
申请日:2004-04-14
IPC分类号: B32B9/00
CPC分类号: B82Y30/00 , B82Y10/00 , B82Y40/00 , C01B32/162 , H01L21/28562 , H01L51/0048 , H01L51/0052 , Y10T428/24967 , Y10T428/25 , Y10T428/30
摘要: The invention relates to a method of growing carbon nanotubes (5) on a substrate (1) using a hot-wire-assisted chemical vapor deposition method. The inventive method consists in first depositing a bilayer of titanium (12) and cobalt (13) on the substrate such that: the thickness of the titanium layer is between 0.5 and 5 nm, the thickness of the cobalt layer is between 0.25 and 10 nm, and the thickness of the cobalt layer is between half and double that of the titanium layer.
摘要翻译: 本发明涉及使用热丝辅助化学气相沉积法在基片(1)上生长碳纳米管(5)的方法。 本发明的方法包括首先在基底上沉积钛(12)和钴(13)的双层,使得钛层的厚度在0.5和5nm之间,钴层的厚度在0.25和10nm之间 ,钴层的厚度为钛层的一半的一半。
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公开(公告)号:US20100154087A1
公开(公告)日:2010-06-17
申请号:US12526450
申请日:2008-02-01
CPC分类号: G01Q70/12 , C01B32/162 , C01B2202/02 , C01B2202/04 , C01B2202/34 , G01Q60/38
摘要: The invention relates to a method for the catalytic growth of carbon nanotubes on nanometric tips by chemical vapour deposition assisted by a hot filament, that comprises a first step of applying a preliminary dual-layer coating of cobalt and titanium on said tip, the titanium layer having a thickness of between 0.1 nm and 0.2 nm and cobalt layer having a thickness of between 0.3 nm and 2 nm.
摘要翻译: 本发明涉及通过由热丝辅助的化学气相沉积在纳米尖端催化生长碳纳米管的方法,其包括在所述尖端上施加钴和钛的初步双层涂层的第一步骤,所述钛层 具有0.1nm至0.2nm的厚度和厚度在0.3nm至2nm之间的钴层。
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公开(公告)号:US20070110971A1
公开(公告)日:2007-05-17
申请号:US10552546
申请日:2004-04-14
申请人: Anne-Marie Bonnot
发明人: Anne-Marie Bonnot
CPC分类号: B82Y30/00 , B82Y10/00 , B82Y40/00 , C01B32/162 , H01L21/28562 , H01L51/0048 , H01L51/0052 , Y10T428/24967 , Y10T428/25 , Y10T428/30
摘要: The invention relates to a method of growing carbon nanotubes (5) on a substrate (1) using a hot-wire-assisted chemical vapour deposition method. The inventive method consists in first depositing a bilayer of titanium (12) and cobalt (13) on the substrate such that: the thickness of the titanium layer is between 0.5 and 5 nm, the thickness of the cobalt layer is between 0.25 and 10 nm, and the thickness of the cobalt layer is between half and double that of the titanium layer.
摘要翻译: 本发明涉及使用热丝辅助化学气相沉积法在基片(1)上生长碳纳米管(5)的方法。 本发明的方法包括首先在基底上沉积钛(12)和钴(13)的双层,使得钛层的厚度在0.5和5nm之间,钴层的厚度在0.25和10nm之间 ,钴层的厚度为钛层的一半的一半。
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