公开(公告)号：US5874014A

公开(公告)日：1999-02-23

申请号：US483982

申请日：1995-06-07

申请人： Anthony E. Robson ,  Ronald A. Rudder ,  Robert C. Hendry ,  Moses M. David ,  James V. Burt

发明人： Anthony E. Robson ,  Ronald A. Rudder ,  Robert C. Hendry ,  Moses M. David ,  James V. Burt

IPC分类号： H05H1/46 ,  C23C8/36 ,  C23C16/27 ,  C23C16/50 ,  C23C16/507 ,  C30B29/04 ,  H01J37/32 ,  H01L21/31 ,  H05H1/00

CPC分类号： C23C16/272 ,  C23C16/277 ,  C23C16/507 ,  C23C8/36 ,  H01J37/321 ,  H01J37/32458 ,  H01J37/32522

摘要： A method and apparatus for treating a work surface, wherein there is provided a chamber having a longitudinal axis and longitudinally extending electrically conductive sidewalls, at least one sidewall having at least one longitudinally extending gap that interrupts a current path through the sidewalls transverse to the longitudinal axis, and wherein the chamber is sealed to allow pressure inside the chamber to be controlled. Also provided is an axially-extending array of current-carrying conductors which at least partially encircle the chamber, are transverse to the longitudinal axis, and establish a magnetic field parallel to the longitudinal axis of the chamber, and a power supply connected to the conductor array and adapted to provide high-frequency current in the conductors to magnetically induce ionization of the gaseous material in the chamber and form a plasma sheath that surrounds and extends along the longitudinal axis and conforms to the sidewalls of the chamber, and wherein the work surface is exposed to the plasma sheath and extends in the direction of the longitudinal axis.

公开(公告)号：US5182496A

公开(公告)日：1993-01-26

申请号：US867862

申请日：1992-04-07

申请人： Wallace M. Manheimer ,  Anthony E. Robson ,  Robert A. Meger

发明人： Wallace M. Manheimer ,  Anthony E. Robson ,  Robert A. Meger

IPC分类号： H05H1/10

CPC分类号： H05H1/10 ,  Y02E30/126

摘要： A method and apparatus for forming plasma sheets of preselected planar curvature, which can be used as mirrors for X-Band microwaves and above. A plasma is created using a shaped cathode. Confining magnetic fields maintains the plasma in the shape of the cathode. Additional magnetic fields can provide additional curvature to the plasma sheet.

摘要翻译： 一种用于形成预选平面曲率的等离子体片的方法和装置，其可用作X波段微波及其以上的反射镜。 使用成形阴极产生等离子体。 限制磁场将等离子体保持为阴极的形状。 额外的磁场可以为等离子体片提供额外的曲率。

公开(公告)号：USH1868H

公开(公告)日：2000-10-03

申请号：US60056

申请日：1998-04-15

申请人： Anthony E. Robson

发明人： Anthony E. Robson

IPC分类号： C23C16/507 ,  H01J37/32 ,  C23C16/00

CPC分类号： H01J37/321 ,  C23C16/507 ,  H01J37/3233 ,  H01J2237/0206

摘要： A method of and apparatus for controlling the potential of a plasma including a metal-walled chamber and a conductive coil which carries a radio-frequency current and is wrapped around the metal-walled chamber to produce a plasma within the chamber. A filament made of refractory metal has two ends, and a central portion formed in the shape of a probe. The central portion of the filament extends into the interior of the chamber and the two ends of the filament pass through a wall of the chamber to the exterior of the chamber. A heating power supply is connected to the two ends to the filament and to the chamber wall for heating the filament to a predetermined temperature above that of the plasma. The heated filament produces thermionic emissions from the filament to the plasma in order to control the plasma potential and eliminate unipolar arcing at the chamber wall.

摘要翻译： 一种用于控制包括金属壁室和导电线圈的等离子体的电位的方法和装置，其传送射频电流并缠绕在金属壁室周围以在室内产生等离子体。 由难熔金属制成的灯丝具有两端，形成为探针形状的中央部。 细丝的中心部分延伸到室的内部，并且细丝的两端通过腔室的壁到达室的外部。 加热电源的两端连接到灯丝和室壁，用于将灯丝加热到高于等离子体的预定温度。 加热的灯丝产生从灯丝到等离子体的热离子发射，以便控制等离子体电位并消除室壁处的单极电弧。

公开(公告)号：US6105518A

公开(公告)日：2000-08-22

申请号：US885720

申请日：1997-06-30

申请人： Anthony E. Robson ,  Ronald A. Rudder ,  Robert C. Hendry ,  Moses M. David ,  James V. Burt

发明人： Anthony E. Robson ,  Ronald A. Rudder ,  Robert C. Hendry ,  Moses M. David ,  James V. Burt

IPC分类号： H05H1/46 ,  C23C8/36 ,  C23C16/27 ,  C23C16/50 ,  C23C16/507 ,  C30B29/04 ,  H01J37/32 ,  H01L21/31 ,  H05H1/00

CPC分类号： C23C16/272 ,  C23C16/277 ,  C23C16/507 ,  C23C8/36 ,  H01J37/321 ,  H01J37/32458 ,  H01J37/32522

摘要： A method and apparatus for treating a work surface, wherein there is provided a chamber having a longitudinal axis and longitudinally extending electrically conductive sidewalls, at least one sidewall having at least one longitudinally extending gap that interrupts a current path through the sidewalls transverse to the longitudinal axis, and wherein the chamber is sealed to allow pressure inside the chamber to be controlled. Also provided is an axially-extending array of current-carrying conductors which at least partially encircle the chamber, are transverse to the longitudinal axis, and establish a magnetic field parallel to the longitudinal axis of the chamber, and a power supply connected to the conductor array and adapted to provide high-frequency current in the conductors to magnetically induce ionization of the gaseous material in the chamber and form a plasma sheath that surrounds and extends along the longitudinal axis and conforms to the sidewalls of the chamber, and wherein the work surface is exposed to the plasma sheath and extends in the direction of the longitudinal axis.

摘要翻译： 一种用于处理工作表面的方法和设备，其中设置有具有纵向轴线和纵向延伸的导电侧壁的室，至少一个侧壁具有至少一个纵向延伸的间隙，其中断通过横向于纵向的侧壁的电流路径 轴，并且其中所述室被密封以允许控制所述室内的压力。 还提供了轴向延伸的载流导体阵列，其至少部分地环绕腔室，横向于纵向轴线，并且建立平行于腔室的纵向轴线的磁场，以及连接到导体的电源 阵列并且适于在导体中提供高频电流以磁性地诱导腔室中的气态材料的电离，并形成等离子体护套，其围绕并沿着纵向轴线延伸并且与腔的侧壁一致并且其中工作表面 暴露于等离子体护套并沿着纵向轴线的方向延伸。