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公开(公告)号：US20070238052A1
公开(公告)日：2007-10-11
申请号：US11786319
申请日：2007-04-11
IPC分类号： G03C5/00
CPC分类号： G03F7/11 , G03F7/038 , G03F7/039 , G03F7/091 , G03F7/162 , G03F7/168 , G03F7/20 , G03F7/32 , G03F7/322 , G03F7/38 , G03F7/40 , H01L21/0275 , H01L21/0276
摘要： In a first aspect, methods are provided that comprise: (a) applying a curable composition on a substrate; (b) applying a hardmask composition above the curable composition; (c) applying a photoresist composition layer above the hard mask composition, wherein one or more of the compositions are removed in an ash-free process. In a second aspect, methods are provided that comprise (a) applying an organic composition on a substrate; (b) applying a photoresist composition layer above the organic composition, wherein the organic composition comprises a material that produce an alkaline-soluble group upon thermal and/or radiation treatment. Related compositions also are provided.
摘要翻译： 在第一方面，提供了包括以下步骤的方法：（a）将可固化组合物施加在基材上; （b）在硬化组合物上施加硬掩模组合物; （c）在硬掩模组合物上施加光致抗蚀剂组合物层，其中在无灰过程中除去一种或多种组合物。 在第二方面，提供了包括（a）在基材上施用有机组合物的方法; （b）在有机组合物上施加光致抗蚀剂组合物层，其中有机组合物包括在热和/或辐射处理时产生碱溶性基团的材料。 还提供了相关的组合物。
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公开(公告)号：US08455178B2
公开(公告)日：2013-06-04
申请号：US11904028
申请日：2007-09-25
CPC分类号： G03F7/091 , G03F7/0392
摘要： Underlying coating compositions are provided that comprise one or more resins comprising one or more modified imide groups. These coating compositions are particularly useful as antireflective layers for an overcoated photoresist layer. Preferred systems can be thermally treated to increase hydrophilicity of the composition coating layer to inhibit undesired intermixing with an overcoated organic composition layer, while rendering the composition coating layer removable with aqueous alkaline photoresist developer.
摘要翻译： 提供了包含一种或多种包含一种或多种改性酰亚胺基团的树脂的底涂层组合物。 这些涂料组合物特别可用作外涂光致抗蚀剂层的抗反射层。 优选的体系可以被热处理以增加组合物涂层的亲水性，以抑制与外涂有机组合物层的不期望的混合，同时使含水碱性光致抗蚀剂显影剂可除去组合物涂层。
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公开(公告)号：US09323154B2
公开(公告)日：2016-04-26
申请号：US11786319
申请日：2007-04-11
IPC分类号： G03F7/11 , G03F7/32 , G03F7/40 , G03F7/09 , H01L21/027
CPC分类号： G03F7/11 , G03F7/038 , G03F7/039 , G03F7/091 , G03F7/162 , G03F7/168 , G03F7/20 , G03F7/32 , G03F7/322 , G03F7/38 , G03F7/40 , H01L21/0275 , H01L21/0276
摘要： In a first aspect, methods are provided that comprise: (a) applying a curable composition on a substrate; (b) applying a hardmask composition above the curable composition; (c) applying a photoresist composition layer above the hard mask composition, wherein one or more of the compositions are removed in an ash-free process. In a second aspect, methods are provided that comprise (a) applying an organic composition on a substrate; (b) applying a photoresist composition layer above the organic composition, wherein the organic composition comprises a material that produce an alkaline-soluble group upon thermal and/or radiation treatment. Related compositions also are provided.
摘要翻译： 在第一方面，提供了包括以下步骤的方法：（a）将可固化组合物施加在基材上; （b）在硬化组合物上施加硬掩模组合物; （c）在硬掩模组合物上施加光致抗蚀剂组合物层，其中在无灰过程中除去一种或多种组合物。 在第二方面，提供了包括（a）在基材上施用有机组合物的方法; （b）在有机组合物上施加光致抗蚀剂组合物层，其中有机组合物包括在热和/或辐射处理时产生碱溶性基团的材料。 还提供了相关的组合物。
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公开(公告)号：US20080073754A1
公开(公告)日：2008-03-27
申请号：US11904028
申请日：2007-09-25
IPC分类号： H01L21/469 , H01L23/58
CPC分类号： G03F7/091 , G03F7/0392
摘要： Underlying coating compositions are provided that comprise one or more resins comprising one or more modified imide groups. These coating compositions are particularly useful as antireflective layers for an overcoated photoresist layer. Preferred systems can be thermally treated to increase hydrophilicity of the composition coating layer to inhibit undesired intermixing with an overcoated organic composition layer, while rendering the composition coating layer removable with aqueous alkaline photoresist developer.
摘要翻译： 提供了包含一种或多种包含一种或多种改性酰亚胺基团的树脂的底涂层组合物。 这些涂料组合物特别可用作外涂光致抗蚀剂层的抗反射层。 优选的体系可以被热处理以增加组合物涂层的亲水性，以抑制与外涂有机组合物层的不期望的混合，同时使含水碱性光致抗蚀剂显影剂可除去组合物涂层。
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公开(公告)号：US09244352B2
公开(公告)日：2016-01-26
申请号：US12782397
申请日：2010-05-18
申请人： Anthony Zampini , Gerald B. Wayton , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
发明人： Anthony Zampini , Gerald B. Wayton , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
IPC分类号： G03F7/11 , G03F7/004 , H01L21/027 , C09D167/02 , G03F7/09
CPC分类号： G03F7/11 , C09D167/02 , G03F7/0045 , G03F7/091 , H01L21/0271
摘要： Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.
摘要翻译： 提供用于外涂光致抗蚀剂的涂料组合物，其中涂料组合物包含含有氰尿酸酯基团和疏水基团的树脂。 涂料组合物可以增强外涂光致抗蚀剂浮雕图像的分辨率。
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公开(公告)号：US08968981B2
公开(公告)日：2015-03-03
申请号：US13341456
申请日：2011-12-30
申请人： Vipul Jain , Owendi Ongayi , Suzanne Coley , Anthony Zampini
发明人： Vipul Jain , Owendi Ongayi , Suzanne Coley , Anthony Zampini
摘要： Organic coating compositions, particularly antireflective compositions, that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and can serve as a planarizing, conformal or via-fill layer.
摘要翻译： 有机涂料组合物，特别是抗反射组合物，其包含包含一个或多个对苯甲酸部分的组分。 本发明的优选组合物可以减少来自衬底的辐射辐射反射回外涂光致抗蚀剂层的反射，并且可以用作平坦化，保形或通孔填充层。
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公开(公告)号：US20190354015A1
公开(公告)日：2019-11-21
申请号：US16525526
申请日：2019-07-29
申请人： Owendi Ongayi , Vipul Jain , Suzanne Coley , Anthony Zampini
发明人： Owendi Ongayi , Vipul Jain , Suzanne Coley , Anthony Zampini
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
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公开(公告)号：US10365562B2
公开(公告)日：2019-07-30
申请号：US13340989
申请日：2011-12-30
申请人： Owendi Ongayi , Vipul Jain , Suzanne Coley , Anthony Zampini
发明人： Owendi Ongayi , Vipul Jain , Suzanne Coley , Anthony Zampini
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
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公开(公告)号：US20130004893A1
公开(公告)日：2013-01-03
申请号：US13341456
申请日：2011-12-30
申请人： Vipul Jain , Owendi Ongayi , Suzanne Coley , Anthony Zampini
发明人： Vipul Jain , Owendi Ongayi , Suzanne Coley , Anthony Zampini
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
摘要翻译： 提供了有机涂料组合物，特别是抗反射涂料组合物，其包含包含一种或多种对映异构酸部分的组分。 本发明的优选组合物可用于减少来自衬底的曝光辐射反射回外涂光致抗蚀剂层的反射和/或作为平坦化，保形或通孔填充层的功能。
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公开(公告)号：US20110033801A1
公开(公告)日：2011-02-10
申请号：US12782397
申请日：2010-05-18
申请人： Anthony Zampini , Gerald B. Wayton , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
发明人： Anthony Zampini , Gerald B. Wayton , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
IPC分类号： G03F7/004 , C09D177/00 , G03F7/20
CPC分类号： G03F7/11 , C09D167/02 , G03F7/0045 , G03F7/091 , H01L21/0271
摘要： Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.
摘要翻译： 提供用于外涂光致抗蚀剂的涂料组合物，其中涂料组合物包含含有氰尿酸酯基团和疏水基团的树脂。 涂料组合物可以增强外涂光致抗蚀剂浮雕图像的分辨率。
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