公开(公告)号：US11180849B2

公开(公告)日：2021-11-23

申请号：US16546170

申请日：2019-08-20

Applicant: Applied Materials, Inc.

Inventor： Subramanya P. Herle ,  Vicente M. Lim ,  Basavaraj Pattanshetty ,  Ajay More ,  Marco Mohr ,  Bjoern Sticksel-Weis ,  Nilesh Chimanrao Bagul ,  Visweswaren Sivaramakrishnan

IPC: C23C16/455 ,  C23C16/448 ,  C23C14/24 ,  C23C16/50 ,  C23C14/08

Abstract: An apparatus for direct liquid injection (DLI) of chemical precursors into a processing chamber is provided. The apparatus includes a vaporizer assembly having an injection valve for receiving a liquid reactant, vaporizing the liquid reactant, and delivering the vaporized liquid reactant. The injection valve includes a valve body encompassing an interior region therein, a gas inlet port, a liquid inlet port, and a vapor outlet port all in fluid communication with the interior region. The vaporizer assembly further includes a first inlet line having a first end fluidly coupled with the liquid inlet port and a second end to be connected to a liquid source. The vaporizer assembly further includes a second inlet line with a first end fluidly coupled with the gas inlet port, a second end fluidly coupled with a carrier gas source, and a heater positioned between the first end and the second end.