公开(公告)号：US11056319B2

公开(公告)日：2021-07-06

申请号：US16524646

申请日：2019-07-29

Applicant: APPLIED Materials, Inc.

Inventor： Costel Biloiu ,  Appu Naveen Thomas ,  Tyler Rockwell ,  Frank Sinclair ,  Christopher Campbell

IPC: H01J37/32 ,  H01J37/08

Abstract: An ion beam processing apparatus may include a plasma chamber, and a plasma plate, disposed alongside the plasma chamber, where the plasma plate defines a first extraction aperture. The apparatus may include a beam blocker, disposed within the plasma chamber and facing the extraction aperture. The apparatus may further include a non-planar electrode, disposed adjacent the beam blocker and outside of the plasma chamber; and an extraction plate, disposed outside the plasma plate, and defining a second extraction aperture, aligned with the first extraction aperture.

公开(公告)号：US20230197422A1

公开(公告)日：2023-06-22

申请号：US17556390

申请日：2021-12-20

Applicant: Applied Materials, Inc.

Inventor： Kevin T. Ryan ,  Appu Naveen Thomas ,  Adam Calkins ,  Jay R. Wallace ,  Tyler Rockwell ,  Solomon Belangedi Basame ,  Kevin M. Daniels ,  Kevin Richard Verrier

IPC: H01J37/32

CPC classification number: H01J37/32807 ,  H01J37/32422 ,  H01J37/32623

Abstract: A fastening assembly for fastening a beam blocker to an extraction plate, the fastening assembly including a mounting pin having a shaft portion, a base portion at a first end of the shaft portion, and a head portion at a second end of the shaft portion, a centering sleeve radially surrounding the shaft portion and axially abutting the base portion, the centering sleeve being radially compressible between the shaft portion and the extraction plate and between the shaft portion and the beam blocker, an annular spacer surrounding the centering sleeve and axially abutting the beam blocker, with the centering sleeve extending partially into the spacer, and a latching cap surrounding the shaft portion and axially abutting the spacer, with the shaft portion extending through a through hole of the latching cap, the through hole being smaller than the head portion in a direction perpendicular to an axis of mounting pin.

公开(公告)号：US20210035779A1

公开(公告)日：2021-02-04

申请号：US16524646

申请日：2019-07-29

Applicant: APPLIED Materials, Inc.

Inventor： Costel Biloiu ,  Appu Naveen Thomas ,  Tyler Rockwell ,  Frank Sinclair ,  Christopher Campbell

IPC: H01J37/32 ,  H01J37/08

Abstract: An ion beam processing apparatus may include a plasma chamber, and a plasma plate, disposed alongside the plasma chamber, where the plasma plate defines a first extraction aperture. The apparatus may include a beam blocker, disposed within the plasma chamber and facing the extraction aperture. The apparatus may further include a non-planar electrode, disposed adjacent the beam blocker and outside of the plasma chamber; and an extraction plate, disposed outside the plasma plate, and defining a second extraction aperture, aligned with the first extraction aperture.