公开(公告)号：US20150187563A1

公开(公告)日：2015-07-02

申请号：US14580621

申请日：2014-12-23

Applicant: Applied Materials, Inc.

Inventor： BRIAN SAXTON UNDERWOOD ,  Abhijit Basu Mallick ,  Mukund Srinivasan ,  Juan Carlos Rocha-Alvarez

IPC: H01L21/02 ,  H01L21/324

CPC classification number: H01L21/0262 ,  C23C16/401 ,  C23C16/482 ,  C23C16/54 ,  C23C16/56 ,  H01J11/36 ,  H01L21/02529 ,  H01L21/02532 ,  H01L21/02658 ,  H01L21/02664 ,  H01L21/324

Abstract: A method and apparatus for forming a flowable film are described. The method includes providing an oxygen free precursor gas mixture to a processing chamber containing a substrate. The oxygen free precursor gas is activated by exposure to UV radiation in the processing chamber. Molecular fragments resulting from the UV activation are encouraged to deposit on the substrate to form a flowable film on the substrate. The substrate may be cooled to encourage deposition. The film may be hardened by heating and/or by further exposure to UV radiation.

Abstract translation: 描述了一种用于形成可流动膜的方法和装置。 该方法包括向含有基底的处理室提供无氧的前体气体混合物。 无氧前体气体通过在处理室中暴露于UV辐射而被活化。 鼓励由UV激活产生的分子片段沉积在基底上以在基底上形成可流动的膜。 衬底可以被冷却以促进沉积。 可以通过加热和/或通过进一步暴露于UV辐射来使膜硬化。