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公开(公告)号:US12165934B2
公开(公告)日:2024-12-10
申请号:US16938510
申请日:2020-07-24
Applicant: Applied Materials, Inc.
Inventor: Zuoming Zhu , Shu-Kwan Lau , Ala Moradian , Enle Choo , Flora Fong-Song Chang , Vilen K Nestorov , Zhiyuan Ye , Bindusagar Marath Sankarathodi , Maxim D. Shaposhnikov , Surendra Singh Srivastava , Zhepeng Cong , Patricia M. Liu , Errol C. Sanchez , Jenny C. Lin , Schubert S. Chu , Balakrishnam R. Jampana
Abstract: A method for processing a substrate within a processing chamber comprises receiving a first radiation signal corresponding to a film on a target element disposed within the processing chamber, analyzing the first radiation signal, and controlling the processing of the substrate based on the analyzed first radiation signal. The processing chamber includes a substrate support configured to support the substrate within a processing volume and a controller coupled to a first sensing device configured to receive the first radiation signal.