公开(公告)号：US12078547B2

公开(公告)日：2024-09-03

申请号：US17487993

申请日：2021-09-28

Applicant: Applied Materials, Inc.

Inventor： Bruce E. Adams ,  Samuel C. Howells ,  Alvaro Garcia ,  Barry P. Craver ,  Tony Jefferson Gnanaprakasa ,  Lei Lian

IPC: G01J5/58 ,  H01J37/32 ,  H01L21/66

CPC classification number: G01J5/58 ,  H01J37/32522 ,  H01L22/12 ,  G01J2005/583 ,  H01J2237/24585 ,  H01J2237/334

Abstract: A method and apparatus for determining the temperature of a substrate within a processing chamber are described herein. The methods and apparatus described herein utilize an etalon assembly and a heterodyning effect to determine a first temperature of a substrate. The first temperature of the substrate is determined without physically contacting the substrate. A separate temperature sensor also measures a second temperature of the substrate and/or the substrate support at a similar location. The first temperature and the second temperature are utilized to calibrate one of the temperature sensors disposed within the substrate support, a model of the processes performed within the processing chamber, or to adjust a process parameter of the process performed within the processing chamber.