公开(公告)号：US20240363317A1

公开(公告)日：2024-10-31

申请号：US18138811

申请日：2023-04-25

申请人： Applied Materials, Inc.

发明人： Vicknesh Sahmuganathan ,  Sze Chieh Tan ,  Kok Keong Lim ,  Song Seng Low ,  Yi Kun Kelvin Goh ,  Abdul Rahman Bin Abu Bakar ,  Syed Muhammad Darwis ,  Cheng Hong Tan ,  John Sudijono ,  Han Yan Koh

IPC分类号： H01J37/32 ,  C23C16/511 ,  C23C16/56 ,  H01L21/02

CPC分类号： H01J37/32862 ,  C23C16/511 ,  C23C16/56 ,  H01J37/3222 ,  H01J37/32229 ,  H01J37/32816 ,  H01L21/02274 ,  H01J2237/332

摘要： Methods and apparatus for cleaning a dielectric tube are described. The dielectric tube is exposed to a cleaning gas comprising a fluorine-containing compound and a microwave plasma is generated. The dielectric tube is cleaned to restore transparency and increase electronic coupling between the microwave waveguide and the plasma through the dielectric tube.