公开(公告)号：US10907252B2

公开(公告)日：2021-02-02

申请号：US16168462

申请日：2018-10-23

Applicant: Applied Materials, Inc.

Inventor： Yuxing Zhang ,  Daniel Hwung ,  Ashutosh Agarwal ,  Kaushik Alayavalli ,  Kalyanjit Ghosh

IPC: C23C16/455 ,  H01J37/32 ,  C23C16/44

Abstract: Embodiments herein relate to gas distribution apparatuses. In one aspect, the disclosure herein relates to a showerhead including a body having an upper surface and a lower surface. A thermal choke is disposed adjacent a perimeter of the body. The thermal choke includes a plurality of interleaved channels. One or more apertures are disposed between the upper surface and the lower surface of the body.

公开(公告)号：US10889894B2

公开(公告)日：2021-01-12

申请号：US16510845

申请日：2019-07-12

Applicant: Applied Materials, Inc.

Inventor： Daniel Hwung ,  Yuxing Zhang ,  Kalyanjit Ghosh ,  Kaushik Alayavalli ,  Amit Kumar Bansal

IPC: C23C16/40 ,  C23C16/455 ,  H01L21/67

Abstract: A faceplate for a processing chamber is disclosed. The faceplate has a body with a plurality of apertures formed therethrough. A flexure is formed in the body partially circumscribing the plurality of apertures. A cutout is formed through the body on a common radius with the flexure. One or more bores extend from a radially inner surface of the cutout to an outer surface of the body. A heater is disposed between flexure and the plurality of apertures. The flexure and the cutout are thermal chokes which limit heat transfer thereacross from the heater.

公开(公告)号：US10600624B2

公开(公告)日：2020-03-24

申请号：US16230766

申请日：2018-12-21

Applicant: Applied Materials, Inc.

Inventor： Kalyanjit Ghosh ,  Sanjeev Baluja ,  Mayur G. Kulkarni ,  Shailendra Srivastava ,  Tejas Ulavi ,  Yusheng Alvin Zhou ,  Amit Kumar Bansal ,  Priyanka Dash ,  Zhijun Jiang ,  Ganesh Balasubramanian ,  Qiang Ma ,  Kaushik Alayavalli ,  Yuxing Zhang ,  Daniel Hwung ,  Shawyon Jafari

IPC: H01J37/32 ,  C23C16/52 ,  C23C16/455 ,  C23C16/40 ,  C23C16/44 ,  C23C16/50 ,  C23C16/458

Abstract: Systems and methods for depositing a film in a PECVD chamber while reducing residue buildup in the chamber. In some embodiments disclosed herein, a processing chamber includes a chamber body, a substrate support, a showerhead, and one or more heaters configured to heat the showerhead. In some embodiments, the processing chamber includes a controller.