公开(公告)号：US20190271916A1

公开(公告)日：2019-09-05

申请号：US16400563

申请日：2019-05-01

Applicant: Applied Materials, Inc.

Inventor： Uwe HOLLERBACH ,  Thomas L. LAIDIG ,  Mark HUNT ,  Don STARSES

IPC: G03F7/20

Abstract: A real time software and array control software application platform which maintains the ability to manage the synchronization between substrate alignments and image projection systems during maskless lithography patterning in a manufacturing process is disclosed. The application coordinates and controls the image projection systems such that discrepancies in and misalignments of the substrate may be determined and accounted for in real time. The image projection systems may run in parallel and may be controlled by a central processor.

公开(公告)号：US20160282849A1

公开(公告)日：2016-09-29

申请号：US15078419

申请日：2016-03-23

Applicant: Applied Materials, Inc.

Inventor： Uwe HOLLERBACH ,  Thomas L. LAIDIG ,  Mark HUNT ,  Don STARSES

IPC: G05B19/4099

CPC classification number: G03F7/70783 ,  G03F7/70258 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70508 ,  G05B2219/45028

Abstract: A real time software and array control software application platform which maintains the ability to manage the synchronization between substrate alignments and image projection systems during maskless lithography patterning in a manufacturing process is disclosed. The application coordinates and controls the image projection systems such that discrepancies in and misalignments of the substrate may be determined and accounted for in real time. The image projection systems may run in parallel and may be controlled by a central processor.

Abstract translation: 公开了一种实时软件和阵列控制软件应用平台，其在制造过程中在无掩模光刻图案化期间保持管理衬底对准和图像投影系统之间的同步的能力。 应用程序协调和控制图像投影系统，使得可以确定并且实时地考虑基板的偏差和不对准。 图像投影系统可以并行运行并且可以由中央处理器来控制。