公开(公告)号：US20170084880A1

公开(公告)日：2017-03-23

申请号：US15273181

申请日：2016-09-22

Applicant: Applied Materials, Inc.

Inventor： Shinichi KURITA ,  Ikuo MORI ,  Robin L. TINER

IPC: H01L51/56 ,  H01L21/68 ,  C23C16/04 ,  C23C16/455 ,  C23C16/458 ,  H01L21/683 ,  H01L21/67

CPC classification number: H01L51/56 ,  C23C14/042 ,  C23C16/042 ,  H01L21/67103 ,  H01L21/6719 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/681 ,  H01L21/682

Abstract: A process chamber for processing a plurality of substrates is provided. The process chamber includes a chamber body having a single substrate transfer opening, a first substrate support mesa disposed in the chamber body, and a second substrate support mesa disposed in the chamber body. Each substrate support mesa is configured to support a substrate during processing. The centers of the first substrate support mesa, the second substrate support mesa, and the opening are linearly aligned.