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公开(公告)号：US20240025009A1
公开(公告)日：2024-01-25
申请号：US18377073
申请日：2023-10-05
发明人： Aniruddh Jagdish KHANNA , Jason G. FUNG , Puneet Narendra JAWALI , Rajeev BAJAJ , Adam Wade MANZONIE , Nandan BARADANAHALLI KENCHAPPA , Veera Raghava Reddy KAKIREDDY , Joonho AN , Jaeseok KIM , Mayu YAMAMURA
CPC分类号： B24B37/20 , B24B37/042
摘要： Polishing pads having discrete and selectively arranged regions of varying porosity within a continuous phase of polymer material are provided herein. In one embodiment a polishing pad features a plurality of polishing elements each comprising a polishing surface and sidewalls extending downwardly from the polishing surface to define a plurality of channels disposed between the polishing elements, wherein one or more of the polishing elements is formed of a continuous phase of polymer material having one or more first regions comprising a first porosity and a second region comprising a second porosity, wherein the second porosity is less than the first porosity.
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公开(公告)号：US20210187693A1
公开(公告)日：2021-06-24
申请号：US17036623
申请日：2020-09-29
发明人： Aniruddh Jagdish KHANNA , Jason G. FUNG , Puneet Narendra JAWALI , Rajeev BAJAJ , Adam Wade MANZONIE , Nandan BARADANAHALLI KENCHAPPA , Veera Raghava Reddy KAKIREDDY , Joonho AN , Jaeseok KIM , Mayu YAMAMURA
摘要： Polishing pads having discrete and selectively arranged regions of varying porosity within a continuous phase of polymer material are provided herein. In one embodiment a polishing pad features a plurality of polishing elements each comprising a polishing surface and sidewalls extending downwardly from the polishing surface to define a plurality of channels disposed between the polishing elements, wherein one or more of the polishing elements is formed of a continuous phase of polymer material having one or more first regions comprising a first porosity and a second region comprising a second porosity, wherein the second porosity is less than the first porosity.
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