公开(公告)号：US12109641B2

公开(公告)日：2024-10-08

申请号：US17455288

申请日：2021-11-17

Applicant: Applied Materials, Inc.

Inventor： Kang Luo ,  Ludovic Godet ,  Daihua Zhang ,  Nai-Wen Pi ,  Jinrui Guo ,  Rami Hourani

IPC: B23K10/00 ,  F21V8/00

CPC classification number: B23K10/00 ,  G02B6/0016 ,  G02B6/0036

Abstract: The present disclosure generally relates to a method and apparatus for forming a substrate having a graduated refractive index. A method of forming a waveguide structure includes expelling plasma from an applicator having a head toward a plurality of grating structures formed on a substrate. The plasma is formed in the head at atmospheric pressure. The method further includes changing a depth of the plurality of grating structures with the plasma by removing grating material from the plurality of grating structures.

公开(公告)号：US11873554B2

公开(公告)日：2024-01-16

申请号：US17655849

申请日：2022-03-22

Applicant: Applied Materials, Inc.

Inventor： Nai-Wen Pi ,  Jinxin Fu ,  Kang Luo ,  Ludovic Godet

IPC: C23C14/48 ,  C23C14/02 ,  C23C14/00 ,  C03C23/00 ,  C23C14/58 ,  G02B6/10

CPC classification number: C23C14/48 ,  C03C23/0095 ,  C23C14/0031 ,  C23C14/021 ,  C23C14/5873 ,  G02B6/10

Abstract: Embodiments described herein provide for optical devices with methods of forming optical device substrates having at least one area of increased refractive index or scratch resistance. One method includes disposing an etch material on a discrete area of an optical device substrate or an optical device layer, disposing a diffusion material in the discrete area, and removing excess diffusion material to form an optical material in the optical device substrate or the optical device layer having a refractive index greater than or equal to 2.0 or a hardness greater than or equal to 5.5 Mohs.