PROCESSING CHAMBER CALIBRATION
    2.
    发明公开

    公开(公告)号:US20230222264A1

    公开(公告)日:2023-07-13

    申请号:US17571370

    申请日:2022-01-07

    CPC classification number: G06F30/27 H01L21/67276 H01L21/67155 H01L21/67248

    Abstract: A method includes receiving, from sensors, sensor data associated with processing a substrate via a processing chamber of substrate processing equipment. The sensor data includes a first subset received from one or more first sensors and a second subset received from one or more second sensors, the first subset being mapped to the second subset. The method further includes identifying model input data and model output data. The model output data is output from a physics-based model based on model input data. The method further includes training a machine learning model with data input including the first subset and the model input data, and target output data including the second subset and the model output data to tune calibration parameters of the machine learning model. The calibration parameters are to be used by the physics-based model to perform corrective actions associated with the processing chamber.

Patent Agency Ranking