公开(公告)号：US20250114740A1

公开(公告)日：2025-04-10

申请号：US18377138

申请日：2023-10-05

Applicant: Applied Materials, Inc.

Inventor： Ryan T. DOWNEY ,  Shaun W. CRAWFORD

IPC: B01D53/18 ,  B01D53/14 ,  B01D53/32 ,  C23C16/44

Abstract: Disclosed herein are an auxiliary abatement device for abating effluent gases, an abatement system including the auxiliary abatement device, and an abatement method for the abatement system. The auxiliary abatement device includes a first chamber comprising a first inlet configured to receive the effluent gases; and a second chamber configured to treat the effluent gases and comprising a second inlet configured to receive a reagent, a first outlet configured to output treated effluent gases, and a second outlet configured to output a byproduct produced by treating the effluent gases. The first chamber and the second chamber are coupled by a conduit. The abatement system includes a plasma unit and an auxiliary abatement device to partially treat the effluent gases. The abatement system utilizes a primary abatement unit disposed downstream of the plasma unit and the auxiliary abatement device to treat the effluent gases in bulk.

公开(公告)号：US20240077890A1

公开(公告)日：2024-03-07

申请号：US17901670

申请日：2022-09-01

Applicant: Applied Materials, Inc.

Inventor： Maxime CAYER ,  John L. KOENIG ,  Tony H. TONG ,  Shaun W. CRAWFORD ,  James L'HEUREUX ,  Andreas NEUBER ,  Ching-Hong HSIEH

IPC: G05D7/06 ,  B24B37/005 ,  B24B37/34 ,  G05B19/4155

CPC classification number: G05D7/0652 ,  B24B37/005 ,  B24B37/34 ,  G05B19/4155 ,  G05B2219/37371

Abstract: The present disclosure generally relates to methods and system used to collect waste fluids. A system controller is disclosed to control the operation of at least a portion of the system. The controller has a CPU. The fabrication facility includes a first processing system having fluid dispensed therein for processing a material on a part. A first drain is configured to collect the processing fluid as waste fluid after processing the part. The fabrication facility also includes a waste collection system fluidly coupled to the system drain. The waste collection system has two or more valves configured to couple the system drain and two or more facility drains. Each facility drain is uniquely coupled to one of the two or more valves. The CPU is configured to operate the valves between an open and a closed state in response to the fluid entering the system drain.