公开(公告)号：US20250109931A1

公开(公告)日：2025-04-03

申请号：US18375726

申请日：2023-10-02

Applicant: Applied Materials, Inc.

Inventor： Sock Hoon LIM ,  Ramie MADEJA ,  Wee Teng FAN

IPC: G01B5/14 ,  B05C21/00 ,  B25J9/16

Abstract: Methods and apparatus for verifying alignment between an opaque shadow ring and a substrate are provided. In some embodiments, the apparatus includes a tool comprising: a transparent ring having an inner edge defining a central opening and an outer edge and having a top side and a bottom side; a gauge mark on or in the transparent ring spaced between the inner edge and the outer edge, the gauge mark extending around the inner edge; and a pin extending from the bottom side of the transparent ring and located between the gauge mark and the outer edge.

公开(公告)号：US20230378006A1

公开(公告)日：2023-11-23

申请号：US17751511

申请日：2022-05-23

Applicant: Applied Materials, Inc.

Inventor： Shuran SHENG ,  Eric HOLLAR ,  Sock Hoon LIM ,  Yu YANG ,  Ralph P. ANTONIO ,  Gu LIU

IPC: H01L21/66 ,  H01L21/02 ,  G01N21/95 ,  G01J3/44

CPC classification number: H01L22/34 ,  H01L22/12 ,  H01L21/02041 ,  G01N21/9501 ,  G01J3/44 ,  G06N20/00

Abstract: Methods and systems for monitoring wafer processing results continuously and in real-time. In some embodiments, a system may comprise at least one non-active chamber with at least one feedthrough access port which is configured to interact with a metrology apparatus. The feedthrough access port has a surface exposed to an inner volume of the non-active chamber and has a fluorine-based coating covering the surface. The non-active chamber has a wafer access port to one or more other chambers. The metrology apparatus is positioned external to the non-active chamber and is oriented to detect metrology data through one of the feedthrough access ports. A data collection apparatus is connected to the metrology apparatus and configured to continuously receive data from the metrology apparatus.