公开(公告)号：US20240395561A1

公开(公告)日：2024-11-28

申请号：US18637181

申请日：2024-04-16

Applicant: Applied Materials, Inc.

Inventor： Han WANG ,  Chao LI ,  Yu YANG ,  Gene LEE

IPC: H01L21/311 ,  H01J37/32

Abstract: A method for patterning a boron-containing hard mask includes patterning an oxide hard mask formed on a boron-containing hard mask, and patterning the boron-containing hard mask using the patterned oxide hard mask, wherein the oxide hard mask comprises silicon oxide (SiO2), the boron-containing hard mask is doped with one or more metal elements, and the patterning of the boron-containing hard mask comprises etching the boron-containing hard mask through openings of the patterned oxide hard mask using an etching gas mixture comprising chlorine (Cl2), hydrogen bromide (HBr), and oxygen (O2).

公开(公告)号：US20230378006A1

公开(公告)日：2023-11-23

申请号：US17751511

申请日：2022-05-23

Applicant: Applied Materials, Inc.

Inventor： Shuran SHENG ,  Eric HOLLAR ,  Sock Hoon LIM ,  Yu YANG ,  Ralph P. ANTONIO ,  Gu LIU

IPC: H01L21/66 ,  H01L21/02 ,  G01N21/95 ,  G01J3/44

CPC classification number: H01L22/34 ,  H01L22/12 ,  H01L21/02041 ,  G01N21/9501 ,  G01J3/44 ,  G06N20/00

Abstract: Methods and systems for monitoring wafer processing results continuously and in real-time. In some embodiments, a system may comprise at least one non-active chamber with at least one feedthrough access port which is configured to interact with a metrology apparatus. The feedthrough access port has a surface exposed to an inner volume of the non-active chamber and has a fluorine-based coating covering the surface. The non-active chamber has a wafer access port to one or more other chambers. The metrology apparatus is positioned external to the non-active chamber and is oriented to detect metrology data through one of the feedthrough access ports. A data collection apparatus is connected to the metrology apparatus and configured to continuously receive data from the metrology apparatus.