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公开(公告)号：US20170110292A1
公开(公告)日：2017-04-20
申请号：US15393828
申请日：2016-12-29
Applicant: Applied Materials, Inc.
Inventor： Vladimir KNYAZIK , Kyle TANTIWONG , Samer BANNA , Waheb BISHARA
IPC: H01J37/32
CPC classification number: H01J37/32449 , F26B21/004 , H01J37/3244
Abstract: An apparatus for providing processing gases to a process chamber with improved uniformity is disclosed. One embodiment provides a gas delivery assembly. The gas delivery assembly includes a hub, a nozzle, and one or more gas diffusers disposed in the nozzle. The nozzle has a cylindrical body with a side wall and a top surface. A plurality of injection passages are formed inside the nozzle to deliver processing gases into the process chamber via a plurality of outlets disposed in the side wall. The injection passages are configured to direct process gases out of each outlet disposed in the side wall in a direction which is not radially aligned with a centerline of the hub.
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2.发明申请公开(公告)号：US20140237840A1
公开(公告)日：2014-08-28
申请号：US13959801
申请日：2013-08-06
Applicant: Applied Materials, Inc.
Inventor： Vladimir KNYAZIK , Kyle TANTIWONG , Samer BANNA , Waheb BISHARA
CPC classification number: H01J37/32449 , F26B21/004 , H01J37/3244
Abstract: Embodiments of the present invention relate to an apparatus for providing processing gases to a process chamber with improved uniformity. One embodiment of the present invention provides a gas delivery assembly. The gas delivery assembly includes a hub, a nozzle, and one or more gas diffusers disposed in the nozzle. The nozzle has a cylindrical body with a side wall and a top surface. A plurality of injection passages are formed inside the nozzle to deliver processing gases into the process chamber via a plurality of outlets disposed in the side wall. The injection passages are configured to direct process gases out of each outlet disposed in the side wall in a direction which is not radially aligned with a centerline of the hub.
Abstract translation: 本发明的实施例涉及一种用于向处理室提供具有改进的均匀性的处理气体的装置。 本发明的一个实施例提供一种气体输送组件。 气体输送组件包括轮毂，喷嘴和设置在喷嘴中的一个或多个气体扩散器。 喷嘴具有带有侧壁和顶面的圆柱体。 在喷嘴内部形成多个喷射通道，通过设置在侧壁中的多个出口将处理气体输送到处理室中。 喷射通道构造成将处理气体从布置在侧壁中的每个出口沿着不与轮毂的中心线径向对准的方向引导。
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3.发明申请公开(公告)号：US20200279066A1
公开(公告)日：2020-09-03
申请号：US16876991
申请日：2020-05-18
Applicant: Applied Materials, Inc.
Inventor： Samer BANNA , Dermot CANTWELL , Waheb BISHARA
Abstract: This disclosure describes methods and systems for building a spatial model to predict performance of processing chamber, and using the spatial model to converge faster to a desired process during the process development phase. Specifically, a machine-learning engine obtains an empirical process model for a given process for a given processing chamber. The empirical process model is calibrated by using the in-line metrology data as reference. A predictive model is built by refining the empirical process model by a machine-learning engine that receives customized metrology data and outputs one or more spatial maps of the wafer for one or more dimensions of interest across the wafer without physically processing any further wafers, i.e. by performing spatial digital design of experiment (Spatial DoE).
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