公开(公告)号：US20250161858A1

公开(公告)日：2025-05-22

申请号：US18953898

申请日：2024-11-20

Applicant: Applied Materials, Inc.

Inventor： Chaitanya Anjaneyalu PRASAD ,  Wenfei ZHANG ,  Maryam SARKARAT ,  Naman APURVA ,  Christopher S. OLSEN

IPC: B01D46/54 ,  B01D39/20 ,  B01D46/42 ,  C23C8/04 ,  C23C8/16 ,  H01L21/02

Abstract: A method for selective oxidation of a substrate. The substrate is disposed in a chamber. A hydrogen containing gas is introduced to the chamber. The hydrogen containing gas is directed through a filter to the chamber. The filter is configured to filter particles greater than about 1 nm. The chamber is pressurized to a pressure of about 250 Torr to about 800 Torr while maintaining the hydrogen containing gas in the chamber. The chamber is heated to a predetermined temperature for a predetermined period of time while maintaining the hydrogen containing gas in the chamber. The substrate is selectively oxidized.

公开(公告)号：US20220262657A1

公开(公告)日：2022-08-18

申请号：US17630492

申请日：2020-06-30

Applicant: Applied Materials, Inc.

Inventor： Rohit MAHAKALI ,  Wenfei ZHANG ,  Chaitanya Anjaneyalu PRASAD

IPC: H01L21/67 ,  H01L21/687

Abstract: A method and apparatus for improved temperature control of a substrate is disclosed. In one embodiment, a pedestal is disclosed that includes a top plate, and a base plate coupled to the top plate, wherein the top plate comprises a multi-zone heater and the base plate comprises a plurality of grooves formed in a bottom surface thereof.

公开(公告)号：US20220154338A1

公开(公告)日：2022-05-19

申请号：US17511639

申请日：2021-10-27

Applicant: Applied Materials, Inc.

Inventor： Christopher S. OLSEN ,  Lara HAWRYLCHAK ,  Tobin KAUFMAN-OSBORN ,  Wenfei ZHANG

IPC: C23C16/455

Abstract: Embodiments described herein generally relate to a gas assembly disposed between a mainframe door and process chamber. The gas assembly provides multi-zone gas cross-flow distribution into a processing volume. Each of the zones are independently controlled. The zones each include a single nozzle, the zones each include a plenum fluidly coupled to multiple nozzles, or a combination thereof. The nozzles, such as plenums included with nozzles, are disposed within the manifold between the first major surface and the second major surface of the manifold. An outlet of the nozzles are in fluid communication with the second major surface of the manifold, and in fluid communication with a volume of the process chamber. The multiple, independently controlled zones provide controllability of mass flow for flow sensitive chemical processes. The gas assembly include an adapter plate configured to be coupled to a vacuum mainframe robot.