公开(公告)号：US20230390811A1

公开(公告)日：2023-12-07

申请号：US17833408

申请日：2022-06-06

Applicant: Applied Materials, Inc.

Inventor： Khokan Chandra Paul ,  Truong Van Nguyen ,  Kelvin Chan ,  Diwakar Kedlaya ,  Anantha K. Subramani ,  Abdul Aziz Khaja ,  Vijet Patil ,  Yusheng Fang ,  Liangfa Hu ,  Prashant Kumar Kulshreshtha

IPC: B08B7/00 ,  H01J37/32 ,  B08B5/00 ,  B08B9/032

CPC classification number: B08B7/0035 ,  H01J37/32449 ,  H01J37/32357 ,  H01J37/32862 ,  B08B5/00 ,  B08B9/0328 ,  H01J2237/334 ,  H01J2237/332 ,  B08B2209/032

Abstract: Exemplary semiconductor processing systems may include a processing chamber defining a processing region. The systems may include a foreline coupled with the processing chamber, the foreline defining a fluid conduit. The systems may include a radical generator having an inlet and an outlet. The outlet may be fluidly coupled with the foreline. The systems may include a gas source fluidly coupled with the inlet of the radical generator. The systems may include a throttle valve coupled with the foreline downstream of the radical generator.