公开(公告)号：US20230023363A1

公开(公告)日：2023-01-26

申请号：US17382280

申请日：2021-07-21

Applicant: Applied Materials Israel Ltd.

Inventor： Michael CHEMAMA ,  Ron MEIRY ,  Moshe ELIASOF ,  Lior YARON ,  Guy EYTAN ,  Konstantin CHIRKO ,  Rafael BISTRITZER

IPC: G01N23/2206 ,  H01L21/66 ,  G01N23/2251 ,  H01J37/22 ,  H01J37/28

Abstract: There is provided a system and method of measuring a lateral recess in a semiconductor specimen, comprising: obtaining a first image acquired by collecting SEs emitted from the surface of the specimen, and a second image acquired by collecting BSEs scattered from an interior region of the specimen between the surface and a target second layer, the specimen scanned using an electron beam with a landing energy selected to penetrate to a depth corresponding to the target second layer; generating a first GL waveform based on the first image, and a second GL waveform based on the second image; estimating a first width of the first layers based on the first GL waveform, and a second width with respect to at least the target second layer based on the second GL; and measuring a lateral recess based on the first width and the second width.

公开(公告)号：US20220082376A1

公开(公告)日：2022-03-17

申请号：US17024578

申请日：2020-09-17

Applicant: Applied Materials Israel Ltd.

Inventor： Rafael BISTRITZER ,  Anna LEVANT ,  Moshe ELIASOF ,  Michael CHEMAMA ,  Konstantin CHIRKO

IPC: G01B15/02 ,  G01N23/2251 ,  H01J37/147

Abstract: There is provided a system and a method comprising obtaining a first (respectively second) image of an area of the semiconductor specimen acquired by an electron beam examination tool at a first (respectively second) illumination angle, determining a plurality of height values informative of a height profile of the specimen in the area, the determination comprising solving an optimization problem which comprises a plurality of functions, each function being representative of a difference between data informative of a grey level intensity at a first location in the first image and data informative of a grey level intensity at a second location in the second image, wherein, for each function, the second location is determined with respect to the first location, or conversely, when solving the optimization problem, wherein a distance between the first and the second locations depends on the height profile, and the first and second illumination angles.