公开(公告)号：US20060066855A1

公开(公告)日：2006-03-30

申请号：US11203418

申请日：2005-08-15

申请人： Arie Boef ,  Arno Bleeker ,  Youri Laurentius Maria Van Dommelen ,  Mircea Dusa ,  Antoine Kiers ,  Paul Luehrmann ,  Henricus Pellemans ,  Maurits Schaar ,  Cedric Grouwstra ,  Markus Van Kraaij

发明人： Arie Boef ,  Arno Bleeker ,  Youri Laurentius Maria Van Dommelen ,  Mircea Dusa ,  Antoine Kiers ,  Paul Luehrmann ,  Henricus Pellemans ,  Maurits Schaar ,  Cedric Grouwstra ,  Markus Van Kraaij

IPC分类号： G01B11/00

CPC分类号： G01N21/8806 ,  G03F7/70341 ,  G03F7/70633 ,  G03F7/7065 ,  G03F9/7034

摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.

公开(公告)号：US20060132731A1

公开(公告)日：2006-06-22

申请号：US11015767

申请日：2004-12-20

申请人： Hans Jansen ,  Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Marco Stavenga ,  Bob Streefkerk ,  Jan Cornelis Hoeven ,  Cedric Grouwstra

发明人： Hans Jansen ,  Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Johannes Mertens ,  Johannes Mulkens ,  Marco Stavenga ,  Bob Streefkerk ,  Jan Cornelis Hoeven ,  Cedric Grouwstra

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70925

摘要： A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

公开(公告)号：US20080002162A1

公开(公告)日：2008-01-03

申请号：US11656560

申请日：2007-01-23

申请人： Hans Jansen ,  Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Mertens ,  Johannes Mulkens ,  Marco Stavenga ,  Bob Streefkerk ,  Jan Van Der Hoeven ,  Cedric Grouwstra

发明人： Hans Jansen ,  Johannes Baselmans ,  Sjoerd Donders ,  Christiaan Hoogendam ,  Jeroen Mertens ,  Johannes Mulkens ,  Marco Stavenga ,  Bob Streefkerk ,  Jan Van Der Hoeven ,  Cedric Grouwstra

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70925

摘要： A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

摘要翻译： 公开了一种清洗浸没式光刻设备内部的方法和装置。 特别地，可以使用光刻设备的液体供应系统将清洁流体引入到投影系统和光刻设备的基板台之间的空间中。 另外或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波清洗液体。