公开(公告)号：US08508736B2

公开(公告)日：2013-08-13

申请号：US12751479

申请日：2010-03-31

申请人： Arie Jeffrey Den Boef ,  Harry Sewell ,  Keith William Andresen ,  Earl William Ebert, Jr. ,  Sanjeev Kumar Singh

发明人： Arie Jeffrey Den Boef ,  Harry Sewell ,  Keith William Andresen ,  Earl William Ebert, Jr. ,  Sanjeev Kumar Singh

IPC分类号： G01B11/00

CPC分类号： G03F7/70141 ,  G01B11/14 ,  G02F1/116 ,  G03F7/70191 ,  G03F9/7065

摘要： A lithographic apparatus has an alignment system including a radiation source configured to convert narrow-band radiation into continuous, flat and broad-band radiation. An acoustically tunable narrow pass-band filter filters the broad-band radiation into narrow-band linearly polarized radiation. The narrow-band radiation may be focused on alignment targets of a wafer so as to enable alignment of the wafer. In an embodiment, the filter is configured to modulate an intensity and wavelength of radiation produced by the radiation source and to have multiple simultaneous pass-bands. The radiation source generates radiation that has high spatial coherence and low temporal coherence.

摘要翻译： 光刻设备具有对准系统，其包括被配置为将窄带辐射转换成连续，平坦和宽带辐射的辐射源。 声可调窄带通滤波器将宽带辐射滤波成窄带线偏振辐射。 窄带辐射可以聚焦在晶片的对准目标上，以便能够对准晶片。 在一个实施例中，滤波器被配置为调制由辐射源产生的辐射的强度和波长并且具有多个同时的通带。 辐射源产生具有高空间相干性和低时间相干性的辐射。

公开(公告)号：US20110085726A1

公开(公告)日：2011-04-14

申请号：US12751479

申请日：2010-03-31

申请人： Arie Jeffrey Den Boef ,  Harry Sewell ,  Keith William Andresen ,  Earl William Ebert, JR. ,  Sanjeev Kumar Singh

发明人： Arie Jeffrey Den Boef ,  Harry Sewell ,  Keith William Andresen ,  Earl William Ebert, JR. ,  Sanjeev Kumar Singh

IPC分类号： G06K9/00

CPC分类号： G03F7/70141 ,  G01B11/14 ,  G02F1/116 ,  G03F7/70191 ,  G03F9/7065

摘要： A lithographic apparatus has an alignment system including a radiation source configured to convert narrow-band radiation into continuous, flat and broad-band radiation. An acoustically tunable narrow pass-band filter filters the broad-band radiation into narrow-band linearly polarized radiation. The narrow-band radiation may be focused on alignment targets of a wafer so as to enable alignment of the wafer. In an embodiment, the filter is configured to modulate an intensity and wavelength of radiation produced by the radiation source and to have multiple simultaneous pass-bands. The radiation source generates radiation that has high spatial coherence and low temporal coherence.

摘要翻译： 光刻设备具有对准系统，其包括被配置为将窄带辐射转换成连续，平坦和宽带辐射的辐射源。 声可调窄带通滤波器将宽带辐射滤波成窄带线偏振辐射。 窄带辐射可以聚焦在晶片的对准目标上，以便能够对准晶片。 在一个实施例中，滤波器被配置为调制由辐射源产生的辐射的强度和波长并且具有多个同时的通带。 辐射源产生具有高空间相干性和低时间相干性的辐射。