公开(公告)号：US07504011B2

公开(公告)日：2009-03-17

申请号：US11256196

申请日：2005-10-24

申请人： Armin Schmidt ,  Gerald Janicke ,  Roland Weidl ,  Hendryk Richert ,  Bernd E. Gruenler ,  Hans-Jurgen Tiller ,  Uwe Kriltz

发明人： Armin Schmidt ,  Gerald Janicke ,  Roland Weidl ,  Hendryk Richert ,  Bernd E. Gruenler ,  Hans-Jurgen Tiller ,  Uwe Kriltz

IPC分类号： C23C14/35

CPC分类号： H01J37/3497 ,  H01J37/3405

摘要： A sputtering target comprising an outer target tube, an inner support tube supporting a magnet carrier extending along substantially the entire length of the inner support tube; and a water cooling circuit including at least one passageway within the inner support tube with an inlet at one end thereof adapted to receive cooling water from an external source, at least one outlet aperture at an opposite end thereof opening to a cooling chamber radially between the inner support tube and the outer target tube; and a plurality of spiral vane segments attached to an outer surface of the inner support tube.

摘要翻译： 一种溅射靶，包括外目标管，支撑沿着内支撑管的整个长度延伸的磁体载体的内支撑管; 以及水冷却回路，其包括在所述内部支撑管内的至少一个通道，其一端处的入口适于从外部源接收冷却水;至少一个在其相对端处的出口孔， 内支撑管和外目标管; 以及附接到内部支撑管的外表面的多个螺旋叶片段。