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1.发明申请Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region 审中-公开在无掩模光刻系统中补偿印刷图案的缝合干扰的方法和系统，利用曝光区域与重叠区域中的空间图像的衰减重叠公开(公告)号：US20070146672A1
公开(公告)日：2007-06-28
申请号：US11593076
申请日：2006-11-06
IPC分类号： G03B27/54
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.
摘要翻译： 提供了一种使用空间光调制器（SLM）在感光表面上印刷图案的方法和系统。 示例性方法包括在感光表面上限定两个或更多个曝光区域，曝光区域沿着曝光区域的相应边缘部分重叠以在它们之间形成重叠区域。 暴露两个或更多个曝光区域以在其中打印图像，曝光延伸穿过重叠区域。 然后在重叠区域内的曝光被衰减。
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2.发明申请Methods and systems to compensate for a stitching disturbance of a printed pattern 有权用于补偿印刷图案的缝合干扰的方法和系统公开(公告)号：US20080094596A1
公开(公告)日：2008-04-24
申请号：US12000523
申请日：2007-12-13
IPC分类号： G03B27/42
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided of using a patterning device. An exemplary method includes defining a first region on a surface, the first region being associated with a first element of the patterning device, defining a second region on the surface, the second region being associated with a second element of the patterning device, activating the first element to expose the overlapping region, and deactivating the second element when the first element is active. The first region and the second region overlap in an overlapping region.
摘要翻译： 提供了使用图案形成装置的方法和系统。 示例性方法包括限定表面上的第一区域，第一区域与图案形成装置的第一元件相关联，限定表面上的第二区域，第二区域与图案形成装置的第二元件相关联， 第一元件以暴露所述重叠区域，以及当所述第一元件处于活动状态时停用所述第二元件。 第一区域和第二区域在重叠区域中重叠。
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3.发明申请Methods and systems to compensate for a stitching disturbance of a printed pattern 有权用于补偿印刷图案的缝合干扰的方法和系统公开(公告)号：US20080094595A1
公开(公告)日：2008-04-24
申请号：US12000522
申请日：2007-12-13
IPC分类号： G03B27/42
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided of using a patterning device. An exemplary method includes performing a first exposure of a surface corresponding to image data, determining an image deficiency within a region of the first image, adjusting the image data to compensate for the image deficiency, and performing a second exposure of the surface corresponding to the adjusted image data during a second pass of the patterning device with respect to the surface. The first exposure occurs during a first pass of the patterning device with respect to the surface to produce a first image on the surface.
摘要翻译： 提供了使用图案形成装置的方法和系统。 示例性方法包括执行与图像数据相对应的表面的第一曝光，确定第一图像的区域内的图像不足，调整图像数据以补偿图像不足，以及执行对应于图像数据的表面的第二次曝光 在图案形成装置相对于表面的第二遍期间的调整图像数据。 第一曝光在图案形成装置相对于表面的第一遍期间发生，以在表面上产生第一图像。
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4.发明申请Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region 有权在无掩模光刻系统中补偿印刷图案的缝合干扰的方法和系统，利用曝光区域与重叠区域中的空间图像的衰减重叠公开(公告)号：US20050170267A1
公开(公告)日：2005-08-04
申请号：US11098561
申请日：2005-04-05
IPC分类号： G02B26/08 , G02F1/01 , G03B21/18 , G03B27/00 , G03B27/32 , G03B27/68 , G03C5/00 , G03F7/20 , G03F9/00 , G06F17/50 , H01L21/027
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.
摘要翻译： 提供了一种使用空间光调制器（SLM）在感光表面上印刷图案的方法和系统。 示例性方法包括在感光表面上限定两个或更多个曝光区域，曝光区域沿着曝光区域的相应边缘部分重叠以在它们之间形成重叠区域。 暴露两个或更多个曝光区域以在其中打印图像，曝光延伸穿过重叠区域。 然后在重叠区域内的曝光被衰减。
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5.发明申请公开(公告)号：US20050068514A1
公开(公告)日：2005-03-31
申请号：US10674070
申请日：2003-09-30
IPC分类号： G02B26/08 , G02F1/01 , G03B21/18 , G03B27/00 , G03B27/32 , G03B27/68 , G03C5/00 , G03F7/20 , G03F9/00 , G06F17/50 , H01L21/027
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.
摘要翻译： 提供了一种使用空间光调制器（SLM）在感光表面上印刷图案的方法和系统。 示例性方法包括在感光表面上限定两个或更多个曝光区域，曝光区域沿着曝光区域的相应边缘部分重叠以在它们之间形成重叠区域。 暴露两个或更多个曝光区域以在其中打印图像，曝光延伸穿过重叠区域。 然后在重叠区域内的曝光被衰减。
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6.发明授权Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region 有权在无掩模光刻系统中补偿印刷图案的缝合干扰的方法和系统，利用曝光区域与重叠区域中的空间图像的衰减重叠公开(公告)号：US07133121B2
公开(公告)日：2006-11-07
申请号：US11098561
申请日：2005-04-05
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.
摘要翻译： 提供了一种使用空间光调制器（SLM）在感光表面上印刷图案的方法和系统。 示例性方法包括在感光表面上限定两个或更多个曝光区域，曝光区域沿着曝光区域的相应边缘部分重叠以在它们之间形成重叠区域。 暴露两个或更多个曝光区域以在其中打印图像，曝光延伸穿过重叠区域。 然后在重叠区域内的曝光被衰减。
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7.发明授权Methods and systems to compensate for a stitching disturbance of a printed pattern 有权用于补偿印刷图案的缝合干扰的方法和系统公开(公告)号：US07773199B2
公开(公告)日：2010-08-10
申请号：US12000523
申请日：2007-12-13
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided of using a patterning device. An exemplary method includes defining a first region on a surface, the first region being associated with a first element of the patterning device, defining a second region on the surface, the second region being associated with a second element of the patterning device, activating the first element to expose the overlapping region, and deactivating the second element when the first element is active. The first region and the second region overlap in an overlapping region.
摘要翻译： 提供了使用图案形成装置的方法和系统。 示例性方法包括限定表面上的第一区域，第一区域与图案形成装置的第一元件相关联，限定表面上的第二区域，第二区域与图案形成装置的第二元件相关联， 第一元件以暴露所述重叠区域，以及当所述第一元件处于活动状态时停用所述第二元件。 第一区域和第二区域在重叠区域中重叠。
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公开(公告)号：US06876440B1
公开(公告)日：2005-04-05
申请号：US10674070
申请日：2003-09-30
IPC分类号： G02B26/08 , G02F1/01 , G03B21/18 , G03B27/00 , G03B27/32 , G03B27/68 , G03C5/00 , G03F7/20 , G03F9/00 , G06F17/50 , H01L21/027
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.
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9.发明授权Methods and systems to compensate for a stitching disturbance of a printed pattern 有权用于补偿印刷图案的缝合干扰的方法和系统公开(公告)号：US07630054B2
公开(公告)日：2009-12-08
申请号：US12000522
申请日：2007-12-13
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided of using a patterning device. An exemplary method includes performing a first exposure of a surface corresponding to image data, determining an image deficiency within a region of the first image, adjusting the image data to compensate for the image deficiency, and performing a second exposure of the surface corresponding to the adjusted image data during a second pass of the patterning device with respect to the surface. The first exposure occurs during a first pass of the patterning device with respect to the surface to produce a first image on the surface.
摘要翻译： 提供了使用图案形成装置的方法和系统。 示例性方法包括执行与图像数据相对应的表面的第一曝光，确定第一图像的区域内的图像不足，调整图像数据以补偿图像不足，以及执行对应于图像数据的表面的第二次曝光 在图案形成装置相对于表面的第二遍期间的调整图像数据。 第一曝光在图案形成装置相对于表面的第一遍期间发生，以在表面上产生第一图像。
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10.发明申请Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones 有权用于补偿不使用曝光区重叠的无掩模光刻系统中印刷图案的缝合干扰的方法和系统公开(公告)号：US20050068467A1
公开(公告)日：2005-03-31
申请号：US10673922
申请日：2003-09-30
申请人： Arno Bleeker , Wenceslao Cebuhar , Azat Latypov
发明人： Arno Bleeker , Wenceslao Cebuhar , Azat Latypov
IPC分类号： G02F1/1335 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70291 , G03F7/70475
摘要： A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in accordance with predetermined image data, wherein the first exposure occurs during a first pass and produces a first image within the area. The image data is adjusted to compensate for identified image deficiencies image deficiencies, the image deficiencies being within a region of the first image. A second exposure, of the photosensitive surface, is performed in accordance with the adjusted image data during a second pass.
摘要翻译： 提供了一种用于在感光表面的区域内形成图案的方法和系统。 一种示例性方法包括根据预定图像数据执行感光表面的第一曝光，其中第一曝光在第一次通过期间发生并在该区域内产生第一图像。 调整图像数据以补偿识别的图像缺陷图像缺陷，图像缺陷在第一图像的区域内。 在第二次通过期间，根据调整后的图像数据执行感光表面的第二次曝光。
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