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    Methods and systems to compensate for a stitching disturbance of a printed pattern
    3.
    发明申请
    Methods and systems to compensate for a stitching disturbance of a printed pattern 有权
    用于补偿印刷图案的缝合干扰的方法和系统

    公开(公告)号：US20080094595A1

    公开(公告)日：2008-04-24

    申请号：US12000522

    申请日：2007-12-13

    申请人： Arno Bleeker ,  Wenceslao Cebuhar ,  Justin Kreuzer ,  Azat Latypov ,  Yuli Vladimirsky

    发明人： Arno Bleeker ,  Wenceslao Cebuhar ,  Justin Kreuzer ,  Azat Latypov ,  Yuli Vladimirsky

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70475 ,  G03B21/18 ,  G03B27/42 ,  G03F7/70091 ,  G03F7/70291 ,  G03F7/70466

    摘要： A method and system are provided of using a patterning device. An exemplary method includes performing a first exposure of a surface corresponding to image data, determining an image deficiency within a region of the first image, adjusting the image data to compensate for the image deficiency, and performing a second exposure of the surface corresponding to the adjusted image data during a second pass of the patterning device with respect to the surface. The first exposure occurs during a first pass of the patterning device with respect to the surface to produce a first image on the surface.

    摘要翻译： 提供了使用图案形成装置的方法和系统。 示例性方法包括执行与图像数据相对应的表面的第一曝光，确定第一图像的区域内的图像不足，调整图像数据以补偿图像不足，以及执行对应于图像数据的表面的第二次曝光 在图案形成装置相对于表面的第二遍期间的调整图像数据。 第一曝光在图案形成装置相对于表面的第一遍期间发生，以在表面上产生第一图像。

    Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones
    4.
    发明申请
    Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones 有权
    用于补偿不使用曝光区重叠的无掩模光刻系统中印刷图案的缝合干扰的方法和系统

    公开(公告)号：US20050068467A1

    公开(公告)日：2005-03-31

    申请号：US10673922

    申请日：2003-09-30

    申请人： Arno Bleeker ,  Wenceslao Cebuhar ,  Azat Latypov

    发明人： Arno Bleeker ,  Wenceslao Cebuhar ,  Azat Latypov

    IPC分类号： G02F1/1335 ,  G03F7/20 ,  H01L21/027

    CPC分类号： G03F7/70291 ,  G03F7/70475

    摘要： A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in accordance with predetermined image data, wherein the first exposure occurs during a first pass and produces a first image within the area. The image data is adjusted to compensate for identified image deficiencies image deficiencies, the image deficiencies being within a region of the first image. A second exposure, of the photosensitive surface, is performed in accordance with the adjusted image data during a second pass.

    摘要翻译： 提供了一种用于在感光表面的区域内形成图案的方法和系统。 一种示例性方法包括根据预定图像数据执行感光表面的第一曝光，其中第一曝光在第一次通过期间发生并在该区域内产生第一图像。 调整图像数据以补偿识别的图像缺陷图像缺陷，图像缺陷在第一图像的区域内。 在第二次通过期间，根据调整后的图像数据执行感光表面的第二次曝光。

    System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode
    7.
    发明申请
    System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode 有权

    公开(公告)号：US20060170617A1

    公开(公告)日：2006-08-03

    申请号：US11046236

    申请日：2005-01-31

    申请人： Azat Latypov ,  Wenceslao Cebuhar ,  Jason Hintersteiner

    发明人： Azat Latypov ,  Wenceslao Cebuhar ,  Jason Hintersteiner

    IPC分类号： G09G3/00

    CPC分类号： G03F7/70116

    摘要： A system and method for patterning a beam of radiation based on a pupil field distribution. In an embodiment, the distribution of the field in an area of the pupil plane affecting an image and an illumination mode are selected so as to render an image with desired characteristics. Additionally and/or alternatively, an illumination mode is selected so as to render an image with desired characteristics. The distribution of the field in an area of the pupil plane affecting an image is then realized using the spatial light modulator The system and method include using an illumination system, a pattern generator, and a projector. The illumination system supplies a beam of radiation. The pattern generator patterns the beam of radiation based on a data set corresponding to a field distribution in a pupil plane. The projector projects the patterned beam onto a target portion of an object.

    Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography
    8.
    发明申请
    Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography 有权
    使用时间和/或功率调制来实现光掩模光刻中的剂量灰度

    公开(公告)号：US20060114546A1

    公开(公告)日：2006-06-01

    申请号：US11328179

    申请日：2006-01-10

    申请人： Wenceslao Cebuhar ,  Jason Hintersteiner ,  Azat Latypov ,  Gerald Volpe

    发明人： Wenceslao Cebuhar ,  Jason Hintersteiner ,  Azat Latypov ,  Gerald Volpe

    IPC分类号： G02B26/00

    CPC分类号： G03F7/70558 ,  G03F7/70208 ,  G03F7/70283 ,  G03F7/70291

    摘要： In lithography applications, it is desirable to control, for example, a position or width of a printed line. An effective method of controlling these patterns and their resolution is by having as many grayscale levels as possible. The present invention comprises methods of grayscaling wherein modulation of the exposure time increases the number of grayscale levels on an object. In addition, the present invention comprises methods of grayscaling wherein modulating the power of an exposure beam provides additional grayscale levels.

    摘要翻译： 在光刻应用中，期望控制例如印刷线的位置或宽度。 控制这些图案及其分辨率的有效方法是尽可能多地获得灰度级。 本发明包括灰度调色方法，其中曝光时间的调制增加了对象上的灰度级数。 此外，本发明包括灰度调节方法，其中调制曝光光束的功率提供了额外的灰度级。