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1.发明授权
公开(公告)号：US5837345A
公开(公告)日：1998-11-17
申请号：US611955
申请日：1996-03-06
申请人： Atsuo Nishino , Akio Uesugi , Hidehito Sasaki , Kiyotaka Fukino , Hirokazu Sakaki , Yoshinori Hotta
发明人： Atsuo Nishino , Akio Uesugi , Hidehito Sasaki , Kiyotaka Fukino , Hirokazu Sakaki , Yoshinori Hotta
CPC分类号： B41N3/03 , Y10T428/24149 , Y10T428/24165 , Y10T428/24355 , Y10T428/24479 , Y10T428/24694 , Y10T428/24942
摘要： A support for a lithographic printing plate having a corrugated surface processed by roughening, wherein the corrugation on the support surface comprises big corrugation having an average pitch of from not less than 5 .mu.m to not more than 30 .mu.m, and middle corrugation superimposed on the big corrugation, the middle corrugation comprising honeycomb pits having an average diameter of from not less than 0.5 to not more than 3.0 .mu.m, and the support surface has a surface inclination distribution which comprises an inclination of not less than 30 degrees in a proportion of from not less than 5% to not more than 20% as determined by an atomic force microscope. A process for the preparation of the support and an electrolytic treatment apparatus for the process are also described.
摘要翻译： 具有通过粗糙化处理的波纹状表面的平版印刷版的支撑体，其中，所述支撑面上的波纹包括平均间距为5μm以上且30μm以下的较大波纹， 大的波纹，中间波纹包括平均直径不小于0.5至不大于3.0μm的蜂窝状凹坑，并且支撑表面具有表面倾斜分布，其包括比例不小于30度的倾斜度 由原子力显微镜测定为不小于5％至不超过20％。 还描述了用于制备载体的方法和用于该方法的电解处理装置。
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2.发明授权公开(公告)号：US06232037B1
公开(公告)日：2001-05-15
申请号：US08948669
申请日：1997-10-10
申请人： Akio Uesugi , Masahiro Endo , Hirokazu Sakaki
发明人： Akio Uesugi , Masahiro Endo , Hirokazu Sakaki
IPC分类号： G03F709
摘要： A lithographic printing plate having an average curvature in a rolling direction of 1.5×10−3 mm−1 or less, a curvature distribution in a crosswise direction of 1.5×10−3 mm−1 or less, and a curvature in a direction perpendicular to said rolling direction of 1.0×10−3 mm−1 or less and a method for producing the printing plate are disclosed. A method for producing a support for a lithographic printing plate is also disclosed, which comprises roughening a surface of an aluminum web having a center line average surface roughness of 0.15 to 0.35 &mgr;m and a maximum surface roughness of 1 to 3.5 &mgr;m by at least one of mechanical surface roughening, chemical etching and electrochemical surface roughening, and then applying anodization thereto.
摘要翻译： 平版印刷版，其轧制方向的平均曲率为1.5×10 -3 mm -1以下，横方向的曲率分布为1.5×10 -3 mm -1以下，以及与上述 轧制方向为1.0×10 -3 mm -1以下，公开了印刷版的制造方法。 还公开了一种用于制备平版印刷版支撑体的方法，其包括将中心线平均表面粗糙度为0.15至0.35μm，最大表面粗糙度为1至3.5μm的铝幅材的表面粗糙化至少一个 机械表面粗糙化，化学蚀刻和电化学表面粗糙化，然后对其进行阳极氧化。
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3.发明授权Process for producing presensitized lithographic printing plate with liquid honed aluminum support surface 失效用液体珩磨的铝支撑表面生产预敏平版印刷版的方法
公开(公告)号：US4746591A
公开(公告)日：1988-05-24
申请号：US903907
申请日：1986-09-04
申请人： Hirokazu Sakaki , Akira Shirai , Akio Uesugi , Tsutomu Kakei
发明人： Hirokazu Sakaki , Akira Shirai , Akio Uesugi , Tsutomu Kakei
IPC分类号： B41F27/14 , B41N3/00 , B41N3/03 , B41N3/04 , C25D11/04 , C25D11/08 , C25F3/04 , G03C1/94 , G03C1/54 , G03C1/96
摘要： A process for preparing a lithographic support, and the printing plate made therefrom, are described, wherein the process comprises the steps of (a) liquid-honing a surface of an aluminum sheet, and (b) electrochemically graining the surface of the aluminum sheet in an electrolyte comprises hydrochloric acid, nitric acid, or a mixture thereof.
摘要翻译： 描述了制备平版印刷载体的方法和由其制成的印刷板，其中该方法包括以下步骤：（a）对铝板的表面进行珩磨，和（b）电化学地将铝板的表面 在电解液中包含盐酸，硝酸或它们的混合物。
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4.发明授权Aluminum alloy support for planographic printing plate and method for producing the same 失效用于平版印刷版的铝合金支撑体及其制造方法
公开(公告)号：US5779824A
公开(公告)日：1998-07-14
申请号：US504676
申请日：1995-07-20
申请人： Hirokazu Sawada , Hirokazu Sakaki , Tsutomu Kakei , Akio Uesugi , Masaya Matsuki
发明人： Hirokazu Sawada , Hirokazu Sakaki , Tsutomu Kakei , Akio Uesugi , Masaya Matsuki
摘要： An aluminum alloy support for a planographic printing plate is disclosed, which is an aluminum alloy plate comprising 0
摘要翻译： 公开了一种用于平版印刷版的铝合金支撑体，其是包含0
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5.发明授权
公开(公告)号：US6156135A
公开(公告)日：2000-12-05
申请号：US41300
申请日：1998-03-12
摘要： An aluminum substrate for lithographic printing plates which forms uniform pits on electrolytic etching without undergoing dissolution, the substrate being obtained by electrolytic etching an aluminum plate prepared by continuous casting in a twin roll mold process, rolling, and annealing, in which the annealing is carried out in such a manner that the resulting aluminum plate may have a total electric current density of not more than 1.85.times.10.sup.-2 C/dm.sup.2 when scanned at a potential from -100 mV up to 1500 mV.
摘要翻译： 一种用于平版印刷版的铝基板，其在电解蚀刻中形成均匀的凹坑而不经历溶解，所述基板通过电解蚀刻通过连续铸造制备的铝板而获得，所述铝板通过双辊模制工艺，轧制和退火进行，其中进行退火 以使得当在-100mV至1500mV的电位下扫描时，所得铝板的总电流密度可以不大于1.85×10 -2 C / dm 2。
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6.发明授权Aluminum alloy substrate for lithographic printing plate and process of producing same 失效用于平版印刷版的铝合金基板及其制造方法
公开(公告)号：US5762729A
公开(公告)日：1998-06-09
申请号：US826299
申请日：1997-03-27
摘要： A continuously cast and rolled aluminum alloy substrate for an electrolytically grainable lithographic printing plate, consisting of 0.20 to 0.80 wt. % of Fe and the balance of Al, grain-refining elements and unavoidable impurities including 0.3 wt. % or less of Si and 0.05 wt. % or less of Cu, the amount of Fe present in solid solution being not more than 250 ppm, the amount of Si present in solid solution being not more than 150 ppm, and the amount of Cu present in solid solution being not more than 120 ppm.
摘要翻译： 一种用于电解可晶化平版印刷版的连续铸造和轧制铝合金基底，由0.20至0.80重量％ Fe的％，余量的Al，晶粒细化元素和不可避免的杂质包括0.3wt。 ％以下的Si和0.05重量％ Cu以下，固溶体中存在的Fe的量不大于250ppm，固溶体中存在的Si的量不大于150ppm，固溶体中存在的Cu的量不大于120 ppm。
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7.发明授权
公开(公告)号：US5830630A
公开(公告)日：1998-11-03
申请号：US735581
申请日：1996-10-23
申请人： Satoshi Hoshi , Hirokazu Sakaki , Yoshinori Hotta
发明人： Satoshi Hoshi , Hirokazu Sakaki , Yoshinori Hotta
CPC分类号： B41N1/083 , B22D11/06 , G03C1/77 , G03F7/0285 , G03F7/07 , G03F7/0952
摘要： A light-sensitive sheet comprises an aluminum alloy support and a light-sensitive layer. The aluminum alloy support contains grains of secondary phase. The maximum grain size of the grains of secondary phase essentially is less than 5 .mu.m. Silver halide light-sensitive materials having the aluminum alloy support are also disclosed.
摘要翻译： 感光片包括铝合金支架和感光层。 铝合金支架含有第二相晶粒。 第二相晶粒的最大晶粒尺寸基本上小于5μm。 还公开了具有铝合金支撑体的卤化银感光材料。
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8.发明授权
公开(公告)号：US5562784A
公开(公告)日：1996-10-08
申请号：US350820
申请日：1994-12-07
摘要： An aluminum alloy substrate for an electrolytically grainable lithographic printing plate, consisting of an aluminum alloy cold-rolled sheet, produced by a continuous casting and rolling process, comprising 0.20 to 0.80 wt % of Fe with the balance consisting of aluminum, grain refining elements, and unavoidable impurities including 0.3 wt % or less of Si and 0.05 wt % or less of Cu, grains in a surface layer portion having a width of not more than 150 .mu.m in a direction parallel to the sheet surface and normal to the direction of cold rolling and a length, in a direction parallel to the direction of cold rolling, of not more than 8 times the width.
摘要翻译： 一种用于电解可晶化平版印刷版的铝合金基板，由连续铸造和轧制方法生产的铝合金冷轧板组成，包括0.20至0.80重量％的Fe，余量由铝，晶粒细化元素， 以及包含0.3重量％以下的Si和0.05重量％以下的Cu的不可避免的杂质，在与片材表面平行的方向上具有不大于150μm的宽度的表层部分的晶粒，并且垂直于 在与冷轧方向平行的方向上的冷轧和长度不大于宽度的8倍。
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公开(公告)号：US5114825A
公开(公告)日：1992-05-19
申请号：US361430
申请日：1989-06-05
摘要： An aluminum alloy substrate for presensitized plates for use in making lithographic printing plates comprises an aluminum alloy plate composed of not less than 0.05% by weight and less than 0.5% by weight of Si; 0.2 to 0.7% by weight of Fe; 0.3 to 1.5% by weight of Mn; less than 0.5% by weight of Cu; and the balance of aluminum and unavoidable impurities, the surface of the aluminum alloy plate being subjected to electrolytic graining treatment. The aluminum alloy substrates for PS plates are favorable for appropriate electrolytic graining treatment and show good printing properties and sufficient strength suitable for high-speed printing operation.
摘要翻译： 用于制造平版印刷版的用于预感板的铝合金基板包括由不小于0.05重量％且小于0.5重量％的Si组成的铝合金板; 0.2〜0.7重量％的Fe; 0.3〜1.5重量％的Mn; 小于0.5重量％的Cu; 铝和不可避免的杂质的平衡，对铝合金板的表面进行电解砂化处理。 用于PS板的铝合金基板有利于适当的电解粒化处理，并且显示出良好的印刷性能和足够的强度适合于高速印刷操作。
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10.发明授权
公开(公告)号：US4259434A
公开(公告)日：1981-03-31
申请号：US145105
申请日：1980-04-30
CPC分类号： G03F7/322
摘要： A development method which comprises imagewise exposing a positive acting light-sensitive planographic printing plate comprising an aluminum support and a light-sensitive layer of an o-quinonediazide compound formed thereon, and then developing the exposed plate with a developer, comprising an aqueous solution of an alkali metal silicate, adding a supplementary solution comprising an aqueous solution of an alkali metal silicate to the developer to compensate for the degradation of the developer brought about by development and/or by carbon dioxide in the air; wherein the developer comprises an aqueous solution of an alkali metal salt having an [SiO.sub.2 ]/[M] ratio of from 0.5 to 0.75 and an SiO.sub.2 concentration of from 1 to 4% by weight based on the total weight of the developer, where [SiO.sub.2 ] represents the concentration of SiO.sub.2 per unit volume expressed as gram-molecules, and [M] represents the concentration of the alkali metal per unit volume expressed as gram-atoms, and the supplementary solution comprises an aqueous solution of an alkali metal silicate having an [SiO.sub.2 ]/[M] ratio of from 0.25 to 0.75.
摘要翻译： 一种显影方法，其包括成像曝光包含铝载体和形成在其上的邻醌二叠氮化合物的感光层的正性光敏平版印刷版，然后用显影剂将曝光的板显影， 碱金属硅酸盐，将含有碱金属硅酸盐水溶液的补充溶液加入到显影剂中以补偿由显影产生的显影剂和/或二氧化碳在空气中的降解; 其中显影剂包含基于显影剂总重量的[SiO 2] / [M]比为0.5至0.75和SiO 2浓度为1至4重量％的碱金属盐的水溶液，其中[ SiO 2]表示以克分子表示的每单位体积的SiO 2浓度，[M]表示以克原子表示的每单位体积的碱金属的浓度，补充溶液包含碱金属硅酸盐的水溶液， 0.25〜0.75的[SiO 2] / [M]比。
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