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1.发明授权
公开(公告)号：US4259434A
公开(公告)日：1981-03-31
申请号：US145105
申请日：1980-04-30
CPC分类号： G03F7/322
摘要： A development method which comprises imagewise exposing a positive acting light-sensitive planographic printing plate comprising an aluminum support and a light-sensitive layer of an o-quinonediazide compound formed thereon, and then developing the exposed plate with a developer, comprising an aqueous solution of an alkali metal silicate, adding a supplementary solution comprising an aqueous solution of an alkali metal silicate to the developer to compensate for the degradation of the developer brought about by development and/or by carbon dioxide in the air; wherein the developer comprises an aqueous solution of an alkali metal salt having an [SiO.sub.2 ]/[M] ratio of from 0.5 to 0.75 and an SiO.sub.2 concentration of from 1 to 4% by weight based on the total weight of the developer, where [SiO.sub.2 ] represents the concentration of SiO.sub.2 per unit volume expressed as gram-molecules, and [M] represents the concentration of the alkali metal per unit volume expressed as gram-atoms, and the supplementary solution comprises an aqueous solution of an alkali metal silicate having an [SiO.sub.2 ]/[M] ratio of from 0.25 to 0.75.
摘要翻译： 一种显影方法，其包括成像曝光包含铝载体和形成在其上的邻醌二叠氮化合物的感光层的正性光敏平版印刷版，然后用显影剂将曝光的板显影， 碱金属硅酸盐，将含有碱金属硅酸盐水溶液的补充溶液加入到显影剂中以补偿由显影产生的显影剂和/或二氧化碳在空气中的降解; 其中显影剂包含基于显影剂总重量的[SiO 2] / [M]比为0.5至0.75和SiO 2浓度为1至4重量％的碱金属盐的水溶液，其中[ SiO 2]表示以克分子表示的每单位体积的SiO 2浓度，[M]表示以克原子表示的每单位体积的碱金属的浓度，补充溶液包含碱金属硅酸盐的水溶液， 0.25〜0.75的[SiO 2] / [M]比。
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公开(公告)号：US5114825A
公开(公告)日：1992-05-19
申请号：US361430
申请日：1989-06-05
摘要： An aluminum alloy substrate for presensitized plates for use in making lithographic printing plates comprises an aluminum alloy plate composed of not less than 0.05% by weight and less than 0.5% by weight of Si; 0.2 to 0.7% by weight of Fe; 0.3 to 1.5% by weight of Mn; less than 0.5% by weight of Cu; and the balance of aluminum and unavoidable impurities, the surface of the aluminum alloy plate being subjected to electrolytic graining treatment. The aluminum alloy substrates for PS plates are favorable for appropriate electrolytic graining treatment and show good printing properties and sufficient strength suitable for high-speed printing operation.
摘要翻译： 用于制造平版印刷版的用于预感板的铝合金基板包括由不小于0.05重量％且小于0.5重量％的Si组成的铝合金板; 0.2〜0.7重量％的Fe; 0.3〜1.5重量％的Mn; 小于0.5重量％的Cu; 铝和不可避免的杂质的平衡，对铝合金板的表面进行电解砂化处理。 用于PS板的铝合金基板有利于适当的电解粒化处理，并且显示出良好的印刷性能和足够的强度适合于高速印刷操作。
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公开(公告)号：US4082040A
公开(公告)日：1978-04-04
申请号：US710038
申请日：1976-07-30
申请人： Toshiro Yamashina , Hirokazu Sakaki
发明人： Toshiro Yamashina , Hirokazu Sakaki
CPC分类号： C23C14/0617 , B41N1/006 , Y10S430/136
摘要： A lithographic printing plate comprising a support and a layer of aluminum nitride formed thereon, said layer of aluminum nitride having a thickness of from about 100 A to about 10,000 A.
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4.发明授权公开(公告)号：US06232037B1
公开(公告)日：2001-05-15
申请号：US08948669
申请日：1997-10-10
申请人： Akio Uesugi , Masahiro Endo , Hirokazu Sakaki
发明人： Akio Uesugi , Masahiro Endo , Hirokazu Sakaki
IPC分类号： G03F709
摘要： A lithographic printing plate having an average curvature in a rolling direction of 1.5×10−3 mm−1 or less, a curvature distribution in a crosswise direction of 1.5×10−3 mm−1 or less, and a curvature in a direction perpendicular to said rolling direction of 1.0×10−3 mm−1 or less and a method for producing the printing plate are disclosed. A method for producing a support for a lithographic printing plate is also disclosed, which comprises roughening a surface of an aluminum web having a center line average surface roughness of 0.15 to 0.35 &mgr;m and a maximum surface roughness of 1 to 3.5 &mgr;m by at least one of mechanical surface roughening, chemical etching and electrochemical surface roughening, and then applying anodization thereto.
摘要翻译： 平版印刷版，其轧制方向的平均曲率为1.5×10 -3 mm -1以下，横方向的曲率分布为1.5×10 -3 mm -1以下，以及与上述 轧制方向为1.0×10 -3 mm -1以下，公开了印刷版的制造方法。 还公开了一种用于制备平版印刷版支撑体的方法，其包括将中心线平均表面粗糙度为0.15至0.35μm，最大表面粗糙度为1至3.5μm的铝幅材的表面粗糙化至少一个 机械表面粗糙化，化学蚀刻和电化学表面粗糙化，然后对其进行阳极氧化。
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公开(公告)号：US06194082B1
公开(公告)日：2001-02-27
申请号：US09407960
申请日：1999-09-29
申请人： Hirokazu Sawada , Hirokazu Sakaki
发明人： Hirokazu Sawada , Hirokazu Sakaki
IPC分类号： B22D2500
CPC分类号： B41N1/083 , Y10T428/12458 , Y10T428/12993
摘要： A support for a lithographic printing plate in which uniform pits are efficiently formed by electrochemically graining treatment, always independently of electrolytic conditions to give excellent printing performance, which comprises an aluminum alloy plate containing 0.05% to 0.5% by weight of Fe, 0.03% to 0.15% of Si, 0.006% to 0.03% by weight of Cu and 0.010% to 0.040% by weight of Ti, wherein the Cu concentration of a surface layer portion of from a surface to a depth of 2 &mgr;m of the aluminum alloy plate is at least 20 ppm higher than that of a region deeper than the surface layer portion.
摘要翻译： 平版印刷版的支持体，其通过电化学粗化处理有效地形成均匀的凹坑，总是独立于电解条件以提供优异的印刷性能，其包括含有0.05重量％至0.5重量％的Fe的铝合金板，0.03重量％ Si：0.15％，Cu：0.006〜0.03重量％，Ti：0.010〜0.040重量％，其中，铝合金板的表面〜2μm深度的表层部的Cu浓度为 比表面层部分的深度高至少20ppm。
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6.发明授权Aluminum alloy support material and process for producing a support for a lithographic printing plate 失效铝合金支撑材料和用于制造平版印刷版支撑体的方法
公开(公告)号：US5076899A
公开(公告)日：1991-12-31
申请号：US520898
申请日：1990-05-09
摘要： An aluminum alloy support material for a lithographic printing plate which consists essentially, on a weight basis, of 0.5-2.0 % Mn, 0.05-1.0 % Si, 0.15-1.0 % Fe, 0-0.10 % Ti, and a balance of Al and inevitable impurities. The support material has a specific resistance satisfying the following inequality:Specific resistance (.mu..OMEGA.mm).ltoreq.14+16[% Ti] as measured in liquid nitrogen at 77 K, and a particular size distribution of precipitates therein. The support is produced from an ingot of an aluminum alloy having the above composition by homogenizing, hot rolling, cold rolling, intermediate annealing, and finish cold rolling under specific conditions followed by electrochemical graining. The support has fine, uniform pits formed by electrochemical graining and improved strength and printability.
摘要翻译： 一种用于平版印刷版的铝合金支撑材料，其基本上以重量计包含0.5-2.0％的Mn，0.05-1.0％的Si，0.15-1.0％的Fe，0-0.10％的Ti，余量的Al和 不可避免的杂质。 载体材料具有满足以下不等式的电阻率：在77K的液氮中测定的比电阻（μOMEGA mm）
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7.发明授权
公开(公告)号：US4476006A
公开(公告)日：1984-10-09
申请号：US415075
申请日：1982-09-07
申请人： Hisao Ohba , Kazutaka Oda , Hirokazu Sakaki , Akira Shirai , Azusa Ohashi
发明人： Hisao Ohba , Kazutaka Oda , Hirokazu Sakaki , Akira Shirai , Azusa Ohashi
CPC分类号： B41N3/034 , H05K3/382 , H05K3/44 , Y10S205/921
摘要： A support for a lithographic plate and process for producing a support for such a plate are described, which process comprises:mechanically roughening the surface of an aluminum plate,chemically etching about 5 to 20 g/m.sup.2 of aluminum from the surface of the plate, andapplying an alternating wave-form electric current to the plate in an acidic aqueous solution such that the quantity of electricity generated with the plate as the anode is equal to or greater than the quantity of electricity generated with the plate as the cathode, electrolysis being carried out such that the current density when the plate is the anode is not less than about 20 A/dm.sup.2 and the quantity of electricity generated with the plate as the anode is about 200 coulombs/dm.sup.2 or less.
摘要翻译： 描述了用于平版印刷版的支撑体和用于制造这种板的支撑体的方法，该方法包括：机械地粗糙化铝板的表面，从板的表面化学蚀刻约5至20g / m 2的铝， 并在酸性水溶液中向板中施加交替波形电流，使得以作为阳极的板产生的电量等于或大于以板为阴极产生的电量，电解为 使得当板是阳极时的电流密度不小于约20A / dm 2，并且作为阳极的板产生的电量为约200库仑/ dm 2或更低。
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8.发明授权公开(公告)号：US06387198B1
公开(公告)日：2002-05-14
申请号：US09245237
申请日：1999-02-05
申请人： Hideki Suzuki , Yasuhisa Nishikawa , Tomohide Yamagishi , Kazumitsu Mizushima , Hirokazu Sawada , Hirokazu Sakaki
发明人： Hideki Suzuki , Yasuhisa Nishikawa , Tomohide Yamagishi , Kazumitsu Mizushima , Hirokazu Sawada , Hirokazu Sakaki
IPC分类号： C22F104
摘要： In order to produce an aluminum alloy substrate for a lithographic printing plate wherein grain structure refining and homogenizing are promoted, and the uniformity of the appearance of the grained surface is particularly improved, the process of the present invention comprises the steps of: homogenizing an aluminum alloy ingot comprising 0.10 to 0.40 wt % of Fe, 0.03 to 0.30 wt % of Si, 0.004 to 0.050 wt % of Cu, 0.01 to 0.05 wt % of Ti, 0.0001 to 0.02 wt % of B and the balance of Al and unavoidable impurities, at temperatures of 350 to 480° C., successively hot-rolling the ingot with a plurality of passes in such a manner that the aluminum alloy is not recrystallized prior to the hot rolling of the final pass and recrystallized at least in the surface layer of the hot-rolled plate by only the hot rolling thereof to form a recrystallized structure having an average recrystallized grain size of less than 50 &mgr;m in a direction normal to the rolling direction, and cold-rolling the hot-rolled plate. The reduction of the plate in the hot rolling of the final pass is desirably at least 55%.
摘要翻译： 为了生产促进晶粒细化和均质化的平版印刷版的铝合金基板，并且特别提高了晶粒表面的外观的均匀性，本发明的方法包括以下步骤：使铝均匀化 含有0.10〜0.40重量％的Fe，0.03〜0.30重量％的Si，0.004〜0.050重量％的Cu，0.01〜0.05重量％的Ti，0.0001〜0.02重量％的B，余量的Al和不可避免的杂质 ，在350〜480℃的温度下，以多次通过依次热轧锭，使铝合金在最后通过热轧之前不再结晶，至少在表面层中再结晶 的热轧板，在与轧制方向正交的方向上形成平均再结晶晶粒尺寸小于50μm的再结晶组织，并将该热轧板 ed板 最终通过的热轧中的板的还原期望为至少55％。
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9.发明授权Aluminum alloy support for lithographic printing plate and process for producing substrate for support 失效用于平版印刷版的铝合金支架和用于制造支撑用基板的工艺公开(公告)号：US06337136B1
公开(公告)日：2002-01-08
申请号：US09363127
申请日：1999-07-28
申请人： Hideki Suzuki , Ichiro Okamoto , Kazumitsu Mizushima , Tadashi Asahi , Hirokazu Sawada , Hirokazu Sakaki
发明人： Hideki Suzuki , Ichiro Okamoto , Kazumitsu Mizushima , Tadashi Asahi , Hirokazu Sawada , Hirokazu Sakaki
IPC分类号： B32B1501
摘要： The present invention provides a support for a lithographic printing plate prepared by cold rolling a sheet while intermediate annealing is omitted to save energy and the number of the cold rolling steps are decreased to simplify the sheet production steps and to give a desired strength of the sheet, and by inhibiting precipitation of Si particles in the substrate to give extremely excellent resistance to ink staining in the nonimage areas during printing, and a process for producing a substrate therefore. The production process comprises homogenization heat-treating an aluminum alloy slab comprising 0.10 to 0.40 wt % of Fe, 0.03 to 0.15 wt % of Si, 0.004 to 0.03 wt % of Cu, and the balance of Al and unavoidable impurities, hot rolling the heat-treated slab, and cold-rolling the hot-rolled strip without intermediate annealing, the cold rolling including a final pass after which the sheet temperature becomes at least the recovery temperature of the sheet and the following rapid cooling, whereby an aluminum alloy substrate for a lithographic printing plate having a content of precipitated Si of up to 30 ppm and a tensile strength of from 145 to 180 MPa is produced. When the aluminum alloy is electrolytically grained and anodically oxidized, the resultant anodic oxide film can contain up to 200/mm2 of precipitated Si particles having an average particle size of at least 0.5 &mgr;m.
摘要翻译： 本发明提供了对通过冷轧片材制备的平版印刷版的支持，同时省略了中间退火以节省能量，并且减少了冷轧步骤的数量以简化片材生产步骤并提供片材的期望强度 并且通过抑制衬底中的Si颗粒的沉淀，从而在印刷期间对非图像区域中的油墨染色产生非常优异的耐性，因此制造衬底的方法。 该制造方法包括对铝合金板进行均质化热处理，其包含0.10〜0.40重量％的Fe，0.03〜0.15重量％的Si，0.004〜0.03重量％的Cu，余量为Al和不可避免的杂质，热轧热 并且在不进行中间退火的情况下冷轧热轧带材，冷轧包括最终通过，其中片材温度至少为片材的回收温度和随后的快速冷却，由此形成用于 产生沉淀Si含量高达30ppm，拉伸强度为145-180MPa的平版印刷版。 当铝合金电解晶粒化并阳极氧化时，所得到的阳极氧化膜可含有至多200 / mm2的平均粒度至少为0.5μm的沉淀Si颗粒。
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10.发明授权
公开(公告)号：US6156135A
公开(公告)日：2000-12-05
申请号：US41300
申请日：1998-03-12
摘要： An aluminum substrate for lithographic printing plates which forms uniform pits on electrolytic etching without undergoing dissolution, the substrate being obtained by electrolytic etching an aluminum plate prepared by continuous casting in a twin roll mold process, rolling, and annealing, in which the annealing is carried out in such a manner that the resulting aluminum plate may have a total electric current density of not more than 1.85.times.10.sup.-2 C/dm.sup.2 when scanned at a potential from -100 mV up to 1500 mV.
摘要翻译： 一种用于平版印刷版的铝基板，其在电解蚀刻中形成均匀的凹坑而不经历溶解，所述基板通过电解蚀刻通过连续铸造制备的铝板而获得，所述铝板通过双辊模制工艺，轧制和退火进行，其中进行退火 以使得当在-100mV至1500mV的电位下扫描时，所得铝板的总电流密度可以不大于1.85×10 -2 C / dm 2。
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