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20 条记录 (耗时 0.039 秒)

    Wire-cut electrical discharge machine with electric shock preventer
    6.
    发明授权
    Wire-cut electrical discharge machine with electric shock preventer 失效
    线切割放电机带防电击器

    公开(公告)号：US4880957A

    公开(公告)日：1989-11-14

    申请号：US298606

    申请日：1988-11-29

    申请人： Toshiyuki Aso ,  Hiroshi Hosoda

    发明人： Toshiyuki Aso ,  Hiroshi Hosoda

    IPC分类号： B23H7/02 ,  B23H11/00

    CPC分类号： B23H7/02

    摘要： A wire-cut electrical discharge machine having a device for preventing an accident due to an electrical shock, wherein a guide roller (34a) disposed just before a collection box (38) for collecting a used electrode wire (30) passed through an electrospark machining area (36) is attached to a base plate (56) made of a conductive material, the base plate being fixed to a machine body (26) through an insulating plate (58), and a current leaking to the base plate caused by a disturbance of the running of the electrode wire is led to a safety circuit (50) through a lead wire (52), and a current leakage signal is output whereby an electric power supply of a electric power source (51) is rapidly stopped to prevent an accident due to an electric shock.

    Preventives or Remedies for Hepatopathy
    7.
    发明申请
    Preventives or Remedies for Hepatopathy 审中-公开
    预防或治疗肝病

    公开(公告)号：US20070219114A1

    公开(公告)日：2007-09-20

    申请号：US10554875

    申请日：2004-04-30

    申请人： Kenji Kangawa ,  Hiroshi Hosoda

    发明人： Kenji Kangawa ,  Hiroshi Hosoda

    IPC分类号： A61K38/02

    CPC分类号： A61K31/00 ,  A61K38/25

    摘要： The present invention relates to a preventive or a therapeutic agent for hepatopathy, comprising, as an effective ingredient, a polypeptide derivative having an activity of binding to growth hormone secretagogue receptor and thus elevating intracellular calcium ion concentration, and having one amino acid sequence selected from the group consisting of amino acid sequences represented by SEQ ID NOS: 1 to 22, or an amino acid sequence in which one to several amino acids are deleted, substituted or added at the amino acid residues other that the first to forth amino acid residues from the amino-terminus in the said amino acid sequence, or a pharmacologically acceptable salt thereof. The preventive or the therapeutic agent for hepatopathy in accordance with the present invention is useful as a drug suitable for treating or preventing hepatic diseases such as hepatitis, liver cirrhosis and hepatic insufficiency. Further, the preventive or the therapeutic agent for hepatopathy in accordance with the present invention is also useful as an agent of promoting hepatic regeneration and hepatic function recovery after hepatectomy.

    摘要翻译： 本发明涉及用于肝病的预防或治疗剂，其包含作为有效成分的具有与生长激素促分泌素受体结合的活性的多肽衍生物，从而提高细胞内钙离子浓度，并且具有一个选自以下的氨基酸序列 由SEQ ID NO：1至22表示的氨基酸序列组成的组，或其中一至几个氨基酸缺失，氨基酸残基取代或加入的氨基酸序列，其中第一至第四氨基酸残基来自 所述氨基酸序列中的氨基末端或其药理学上可接受的盐。 根据本发明的肝病预防或治疗剂可用作适合于治疗或预防肝病，肝硬化和肝功能不全等肝病的药物。 此外，根据本发明的肝病的预防或治疗剂也可用作肝切除术后促进肝再生和肝功能恢复的药剂。

    Positive photoresist compositions and multilayer resist materials using the same
    8.
    发明授权
    Positive photoresist compositions and multilayer resist materials using the same 失效
    正型光致抗蚀剂组合物和使用其的多层抗蚀剂材料

    公开(公告)号：US5728504A

    公开(公告)日：1998-03-17

    申请号：US652389

    申请日：1996-05-23

    申请人： Hiroshi Hosoda ,  Satoshi Niikura ,  Atsushi Sawano ,  Tatsuya Hashiguchi ,  Kazuyuki Nitta ,  Hidekatsu Kohara ,  Toshimasa Nakayama

    发明人： Hiroshi Hosoda ,  Satoshi Niikura ,  Atsushi Sawano ,  Tatsuya Hashiguchi ,  Kazuyuki Nitta ,  Hidekatsu Kohara ,  Toshimasa Nakayama

    IPC分类号： G03F7/11 ,  G03F7/022 ,  G03F7/26 ,  H01L21/027 ,  G03F7/023

    CPC分类号： G03F7/022

    摘要： A positive photoresist composition comprising (A) an alkali-soluble resin and (B) a light-sensitive component comprising at least one compound represented by the following general formula (I): ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are each independently a hydrogen atom, an alkyl group having 1-3 carbon atoms or an alkoxy group having 1-3 carbon atoms; R.sup.4 is a hydrogen atom or an alkyl group having 1-3 carbon atoms; a, b and c are an integer of 1-3; l, m and n are an integer of 1-3, in which at least part of the hydroxyl groups present are esterified with a quinonediazidosulfonic acid and a sulfonic acid which has a group represented by the following formula (II): --SO.sub.2 --R.sup.5 (II) where R.sup.5 is a substituted or unsubstituted alkyl group, an alkenyl group or a substituted or unsubstituted aryl group, thereby forming a mixed ester, and a multilayer resist material in which a positive photoresist layer formed of said positive photoresist composition is provided on an anti-reflective coating over a substrate are capable of forming high-resolution resist patterns with good cross-sectional profiles and permit a wider margin of exposure and better depth-of-focus characteristics.

    摘要翻译： 一种正性光致抗蚀剂组合物，其包含（A）碱溶性树脂和（B）包含至少一种由以下通式（I）表示的化合物的光敏性组分：其中R 1，R 2和R 3是 各自独立地为氢原子，具有1-3个碳原子的烷基或具有1-3个碳原子的烷氧基; R4是氢原子或具有1-3个碳原子的烷基; a，b和c为1-3的整数; l，m和n是1-3的整数，其中存在的羟基的至少一部分与醌二叠氮磺酸和具有下式（II）表示的基团的磺酸酯化：-SO 2 -R 5 （II）其中R5是取代或未取代的烷基，烯基或取代或未取代的芳基，从而形成混合酯，以及多层抗蚀剂材料，其中由所述正性光致抗蚀剂组合物形成的正性光致抗蚀剂层设置在 衬底上的抗反射涂层能够形成具有良好横截面轮廓的高分辨率抗蚀剂图案，并允许更宽的曝光余量和更好的聚焦深度特性。

    Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound
    9.
    发明授权
    Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound 失效
    含有三苯甲烷化合物的1,2-萘醌二叠氮化物酯化产物的正性感光性树脂组合物

    公开(公告)号：US5401605A

    公开(公告)日：1995-03-28

    申请号：US282772

    申请日：1994-07-29

    申请人： Kousuke Doi ,  Hiroshi Hosoda ,  Kouichi Takahashi ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

    发明人： Kousuke Doi ,  Hiroshi Hosoda ,  Kouichi Takahashi ,  Nobuo Tokutake ,  Hidekatsu Kohara ,  Toshimasa Nakayama

    IPC分类号： G03F7/022 ,  G03F7/023

    CPC分类号： G03F7/022

    摘要： Proposed is a positive-working photosensitive resin composition suitable as a photoresist in the photolithographic patterning work for the manufacture of, for example, semiconductor devices having excellent storage stability and capable of giving a patterned resist layer having excellent contrast of the images, orthogonality of the cross sectional profile of line patterns and heat resistance along with a satisfactorily high photosensitivity and large focusing latitude. The composition comprises, in admixture with an alkali-soluble novolac resin as a film-forming agent, a photosensitizing agent which is an esterification product of a specific tris(hydroxyphenyl) methane compound of which two of the hydroxyphenyl groups each have a cyclohexyl group bonded thereto at a specified position with at least one naphthoquinone-1,2-diazide sulfonyl group as the esterifying group.

    摘要翻译： 提出了在光刻图案工作中适合作为光致抗蚀剂的正性感光性树脂组合物，用于制造例如具有优异的储存稳定性的半导体器件，并且能够给出具有优异的图像对比度的图案化抗蚀剂层， 线图形的横截面轮廓和耐热性以及令人满意的高光敏性和大的聚焦纬度。 该组合物与作为成膜剂的碱溶性酚醛清漆树脂的混合物包含作为其中两个羟基苯基各自具有环己基基团的特定三（羟基苯基）甲烷化合物的酯化产物的光敏剂 在指定位置与至少一个萘醌-1,2-二叠氮基磺酰基作为酯化基。