摘要:
In a manufacturing method of a semiconductor device, a substrate including single crystalline silicon is prepared, a reformed layer that continuously extends is formed in the substrate, and the reformed layer is removed by etching. The forming the reformed layer includes polycrystallizing a portion of the single crystalline silicon by irradiating the substrate with a pulsed laser beam while moving a focal point of the laser beam in the substrate.
摘要:
A design system (1) is provided with a function of acquiring a design specification of an object to be designed and an evaluation index for evaluating a value of the object to be designed in the design specification; a function of acquiring profile data of the object to be designed; a function (design order determining section (12)) of extracting entity design elements and important design variables from the profile data and prioritizing the entity design elements and the important design variables so as to construct a design workflow; a function (evaluation approach construction section (13)) of constructing an evaluation formula for performance/evaluation of a design result of each of the entity design elements in conformity with the design workflow; a function of finding an appropriate solution by performing automatic optimization while evaluating the design result with use of the evaluation index in accordance with the design workflow with which the evaluation formula is associated; and a function of outputting the appropriate solution thus found. This allows the object to be designed to be parametrically handled, and makes it possible to create a design workflow for efficiently finding an optimum design solution by properly combining a series of design elements and to find an appropriate solution with the use of the design workflow.
摘要:
A design workflow construction apparatus is provided for supporting design of an object having a plurality of design elements. In constructing the design workflow, the apparatus uses input variables, design variables, and intermediate variables. The design workflow construction apparatus includes means for acquiring object design elements and means for determining an order of designing the object design elements. The apparatus also includes means for determining the important design variables.
摘要:
A moving-image-data acquiring unit acquires, when a failure occurs in other moving-image distributing apparatus, a plurality of moving-image data transmitted from a part of the encoders to the other moving-image distributing apparatus. An imaging-target-information acquiring unit acquires location information of an imaging target from a management server that manages the location information of the imaging target. An encoder selecting unit selects the encoder to take charge in place of the other moving-image distributing apparatus, based on encoder location information included in the moving-image data and the location information of the imaging target.
摘要:
A moving-image-data acquiring unit acquires, when a failure occurs in other moving-image distributing apparatus, a plurality of moving-image data transmitted from a part of the encoders to the other moving-image distributing apparatus. An imaging-target-information acquiring unit acquires location information of an imaging target from a management server that manages the location information of the imaging target. An encoder selecting unit selects the encoder to take charge in place of the other moving-image distributing apparatus, based on encoder location information included in the moving-image data and the location information of the imaging target.