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    METHOD OF FORMING PATTERNED LAYER, METHOD OF FORMING PATTERNED PHOTORESIST LAYER, AND ACTIVE DEVICE ARRAY SUBSTRATE
    1.
    发明申请
    METHOD OF FORMING PATTERNED LAYER, METHOD OF FORMING PATTERNED PHOTORESIST LAYER, AND ACTIVE DEVICE ARRAY SUBSTRATE 审中-公开
    形成图案的方法，形成图案光栅层的方法和主动装置阵列基板

    公开(公告)号：US20150253672A1

    公开(公告)日：2015-09-10

    申请号：US14722166

    申请日：2015-05-27

    申请人： Au Optronics Corporation

    发明人： Hsiang-Chih Hsiao ,  Ta-Wen Liao ,  Tzu-Min Yang ,  Shan-Fang Chen ,  Ya-Ping Chang ,  Chi-Hung Yang ,  Chung-Yuan Liao

    IPC分类号： G03F7/20 ,  G02F1/1343 ,  G02F1/1335

    CPC分类号： G03F7/20 ,  G02F1/133526 ,  G02F1/134309 ,  G03B27/58 ,  G03F1/14 ,  G03F7/70208 ,  Y10T428/24802

    摘要： An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.

    摘要翻译： 提供了一种曝光装置，其适用于在层上曝光光致抗蚀剂层以形成多个带状曝光图案。 曝光装置包括光源，透镜组和掩模。 透镜组设置在光致抗蚀剂层和光源之间，并且包括彼此平行的多个条状透镜，其中任何两个相邻带状透镜之间的重叠区域被定义为透镜连接区域，而除透镜之外的其它区域 连接区域被定义为透镜区域。 掩模设置在光致抗蚀剂层和透镜组之间，并且包括多个屏蔽图案，其中屏蔽图案的轮廓对应于带状暴露图案，每个屏蔽图案具有带状开口和条形开口的延伸方向 基本上平行于屏蔽图案的延伸方向。

    Exposure apparatus, method of forming patterned layer, method of forming patterned photoresist layer, active device array substrate and patterned layer
    2.
    发明授权
    Exposure apparatus, method of forming patterned layer, method of forming patterned photoresist layer, active device array substrate and patterned layer 有权
    曝光装置，形成图案层的方法，形成图案化光致抗蚀剂层的方法，有源器件阵列衬底和图案化层

    公开(公告)号：US09122162B2

    公开(公告)日：2015-09-01

    申请号：US13831760

    申请日：2013-03-15

    申请人： Au Optronics Corporation

    发明人： Hsiang-Chih Hsiao ,  Ta-Wen Liao ,  Tzu-Min Yang ,  Shan-Fang Chen ,  Ya-Ping Chang ,  Chi-Hung Yang ,  Chung-Yuan Liao

    IPC分类号： G02F1/1343 ,  G03F7/20 ,  G03B27/58 ,  G03F1/00

    CPC分类号： G03F7/20 ,  G02F1/133526 ,  G02F1/134309 ,  G03B27/58 ,  G03F1/14 ,  G03F7/70208 ,  Y10T428/24802

    摘要： An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.

    摘要翻译： 提供了一种曝光装置，其适用于在层上曝光光致抗蚀剂层以形成多个带状曝光图案。 曝光装置包括光源，透镜组和掩模。 透镜组设置在光致抗蚀剂层和光源之间，并且包括彼此平行的多个条状透镜，其中任何两个相邻带状透镜之间的重叠区域被定义为透镜连接区域，而除透镜之外的其它区域 连接区域被定义为透镜区域。 掩模设置在光致抗蚀剂层和透镜组之间，并且包括多个屏蔽图案，其中屏蔽图案的轮廓对应于带状暴露图案，每个屏蔽图案具有带状开口和条形开口的延伸方向 基本上平行于屏蔽图案的延伸方向。

    Method of forming patterned layer, method of forming patterned photoresist layer, and active device array substrate
    3.
    发明授权
    Method of forming patterned layer, method of forming patterned photoresist layer, and active device array substrate 有权
    形成图案层的方法，形成图案化光致抗蚀剂层的方法和有源器件阵列衬底

    公开(公告)号：US09341950B2

    公开(公告)日：2016-05-17

    申请号：US14722166

    申请日：2015-05-27

    申请人： Au Optronics Corporation

    发明人： Hsiang-Chih Hsiao ,  Ta-Wen Liao ,  Tzu-Min Yang ,  Shan-Fang Chen ,  Ya-Ping Chang ,  Chi-Hung Yang ,  Chung-Yuan Liao

    IPC分类号： G02F1/1343 ,  G03F7/20 ,  G03B27/58 ,  G03F1/00 ,  G02F1/1335

    CPC分类号： G03F7/20 ,  G02F1/133526 ,  G02F1/134309 ,  G03B27/58 ,  G03F1/14 ,  G03F7/70208 ,  Y10T428/24802

    摘要： An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.

    摘要翻译： 提供了一种曝光装置，其适用于在层上曝光光致抗蚀剂层以形成多个带状曝光图案。 曝光装置包括光源，透镜组和掩模。 透镜组设置在光致抗蚀剂层和光源之间，并且包括彼此平行的多个条状透镜，其中任何两个相邻带状透镜之间的重叠区域被定义为透镜连接区域，而除透镜之外的其它区域 连接区域被定义为透镜区域。 掩模设置在光致抗蚀剂层和透镜组之间，并且包括多个屏蔽图案，其中屏蔽图案的轮廓对应于带状暴露图案，每个屏蔽图案具有带状开口和条形开口的延伸方向 基本上平行于屏蔽图案的延伸方向。

    EXPOSURE APPARATUS, METHOD OF FORMING PATTERNED LAYER, METHOD OF FORMING PATTERNED PHOTORESIST LAYER, ACTIVE DEVICE ARRAY SUBSTRATE AND PATTERNED LAYER
    4.
    发明申请
    EXPOSURE APPARATUS, METHOD OF FORMING PATTERNED LAYER, METHOD OF FORMING PATTERNED PHOTORESIST LAYER, ACTIVE DEVICE ARRAY SUBSTRATE AND PATTERNED LAYER 审中-公开
    曝光装置，形成图案的方法，形成图案光栅层的方法，主动装置阵列和图案层

    公开(公告)号：US20130235316A1

    公开(公告)日：2013-09-12

    申请号：US13831760

    申请日：2013-03-15

    申请人： AU OPTRONICS CORPORATION

    发明人： Hsiang-Chih Hsiao ,  Ta-Wen Liao ,  Tzu-Min Yang ,  Shan-Fang Chen ,  Ya-Ping Chang ,  Chi-Hung Yang ,  Chung-Yuan Liao

    IPC分类号： G03F7/20 ,  G02F1/1343

    CPC分类号： G03F7/20 ,  G02F1/133526 ,  G02F1/134309 ,  G03B27/58 ,  G03F1/14 ,  G03F7/70208 ,  Y10T428/24802

    摘要： An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.

    摘要翻译： 提供了一种曝光装置，其适用于在层上曝光光致抗蚀剂层以形成多个带状曝光图案。 曝光装置包括光源，透镜组和掩模。 透镜组设置在光致抗蚀剂层和光源之间，并且包括彼此平行的多个条状透镜，其中任何两个相邻带状透镜之间的重叠区域被定义为透镜连接区域，而除透镜之外的其它区域 连接区域被定义为透镜区域。 掩模设置在光致抗蚀剂层和透镜组之间，并且包括多个屏蔽图案，其中屏蔽图案的轮廓对应于带状暴露图案，每个屏蔽图案具有带状开口和条形开口的延伸方向 基本上平行于屏蔽图案的延伸方向。