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1.发明申请ABRASIVE MEANS, USE OF ALKALI METAL FLUOROALUMINATES OR ALKALINE EARTH FLUOROALUMINATES FOR STABILIZING POLYMERS AGAINST CHANGE IN COLOR BY THE ACTION OF HEAT, AND MIXTURE CONSISTING OF POTASSIUM TETRAFLUOROALUMINATE AND DIPOTASSIUM PENTAFLUOROALUMINATE AND OF OTHER ABRASIVE-ACTIVE FILLERS 审中-公开研磨方法，使用碱金属氟代铝酸盐或碱土金属氟化铝来稳定聚合物，通过热处理和颜料混合形成四氯氟铝酸钠和二氧化钛和其他活性填料的混合物公开(公告)号：US20090241432A1
公开(公告)日：2009-10-01
申请号：US11909395
申请日：2006-03-21
申请人： Axel Pakusch , Anja Pischtiak , Thomas Schwarze
发明人： Axel Pakusch , Anja Pischtiak , Thomas Schwarze
IPC分类号： C09K3/14
摘要： The invention relates to an abrasive means with abrasive-active fillers. The abrasive means is comprised, in general, of a support, abrasive grit and of a binder system. In order to improve the abrasive action and the serviceable life of the abrasive means, the binding agent system contains synthetic alkali metal fluoroaluminates, and/or alkaline earth metal fluoroaluminates, in particular, alkali metal tetrafluoroaluminate, preferably potassium tetrafluoroaluminate, together with at least one additional abrasive-active filler.
摘要翻译： 本发明涉及一种具有磨料活性填料的研磨装置。 研磨装置通常由支撑体，磨料砂砾和粘合剂体系组成。 为了改善研磨剂的研磨作用和使用寿命，粘合剂体系包含合成的碱金属氟铝酸盐和/或碱土金属氟铝酸盐，特别是碱金属四氟铝酸盐，优选四氟铝酸钾，以及至少一种 额外的磨料活性填料。
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公开(公告)号：US20090068844A1
公开(公告)日：2009-03-12
申请号：US12296139
申请日：2007-04-06
IPC分类号： H01L21/3065 , B08B5/00 , B08B7/00 , H01L21/306 , C11D3/02 , C23F1/08 , C09K13/00
CPC分类号： C23F4/00 , B08B7/00 , B08B7/0035 , C23C16/4405 , H01J37/32431 , H01L21/31116 , H01L21/32136
摘要： Mixtures of fluorine and inert gases like nitrogen and/or argon can be used for etching of semiconductors, solar panels and flat panels (TFTs and LCDs), and for cleaning of semiconductor surfaces and plasma chambers. Preferably, fluorine is comprised in an amount of 15 to 25 vol.-% in binary mixtures. The gas mixtures can be used as substitute or drop-in for respective mixtures comprising NF3 and permit a very flexible operation of plasma apparatus. For example, apparatus tuned for NF3/Ar mixtures can be operated without further tuning using fluorine and argon, optionally together with nitrogen. The fluorine content is preferably in the range of 1 to 5 vol.-%, if ternary mixtures of fluorine, nitrogen and argon are used.
摘要翻译： 氟和惰性气体如氮气和/或氩气的混合物可用于半导体，太阳能电池板和平板（TFT和LCD）的蚀刻以及半导体表面和等离子体室的清洗。 优选地，氟以二元混合物计含量为15至25体积％。 气体混合物可以用作包含NF 3的相应混合物的替代或滴加，并允许等离子体装置的非常灵活的操作。 例如，调节NF3 / Ar混合物的设备可以在不进一步调节的情况下使用氟和氩，任选与氮一起进行操作。 如果使用氟，氮和氩的三元混合物，氟含量优选在1至5体积％的范围内。
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