Separation of gases containing SF6
    3.
    发明授权
    Separation of gases containing SF6 失效
    含SF6的气体分离

    公开(公告)号:US06454837B1

    公开(公告)日:2002-09-24

    申请号:US09763185

    申请日:2001-02-20

    Abstract: Gas mixtures of SF6 and N2, which have been used, for example, as an insulating filler gas for underground cables, for insulating-gas window panes or as a filler gas for car tires and SF6/air mixtures which have been used as a protective gas when casting magnesium can be separated if they are contacted with hydrophobic zeolites of a certain pore size as selective adsorption agent for sulfur hexafluoride. For a relatively high SF6 concentration, the mixture is preferably first subjected to a membrane separation process and the permeate is contacted with the adsorption agent. The invention also relates to an apparatus for carrying out the process. The process may also be used for separating SF6 from exhaust gases.

    Abstract translation: SF6和N2的气体混合物已被用作例如用于地下电缆的绝缘填充气体,绝缘气体窗玻璃或用作汽车轮胎和SF6 /空气混合物的填充气体,其已被用作保护 如果铸造镁的气体与一定孔径的疏水性沸石接触,则可分离出气体作为六氟化硫的选择性吸附剂。 对于相对高的SF 6浓度,优选首先对该混合物进行膜分离处理,并使渗透物与吸附剂接触。 本发明还涉及一种用于执行该过程的装置。 该方法也可用于将SF6与废气分离。

    Process for the decoloration and detoxification of aqueous effluents
    5.
    发明授权
    Process for the decoloration and detoxification of aqueous effluents 失效
    含水废水脱色和脱毒的方法

    公开(公告)号:US06083398A

    公开(公告)日:2000-07-04

    申请号:US979790

    申请日:1997-11-26

    CPC classification number: C02F1/722 C02F1/32 Y10S210/917

    Abstract: Process for the decoloration and the toxification of highly polluted (COD.gtoreq.1000 mg/l) resistant aqueous effluents by an oxidation treatment of the effluents by hydrogen peroxide, continuously and in a homogeneous phase, at a pH of 2 to 5 in the presence of Fe ions and under irradiation by means of UV radiation. The AvOx/COD ratio by weight is not less than 0.5:1 and the AvOx/concentration of Fe ions ratio by weight is not less than 50:1.

    Abstract translation: 通过过氧化氢,连续和均匀相氧化处理流出物,在pH为2〜5的条件下,对高度污染(COD> / = 1000mg / l)耐水性废水进行脱色和毒性化处理 存在Fe离子并通过紫外线辐照照射。 AvOx / COD重量比不小于0.5:1,并且FeOe / Fe离子浓度的重量比不小于50:1。

    Purge box for fluorine supply
    6.
    发明申请
    Purge box for fluorine supply 审中-公开
    氟供应清洗箱

    公开(公告)号:US20130105006A1

    公开(公告)日:2013-05-02

    申请号:US13808397

    申请日:2011-06-30

    CPC classification number: F17D1/00 C01B7/20 Y10T137/6851

    Abstract: A purge system built with a purge box, pipes, valves, and a manifold panel. Apart from ventilation systems in ordinary gas cabinets, it is characterized by minimizing hazards through safe exhaust of toxic and reactive gases and through prevention of explosion and fire with complete cutoff of air (oxygen, in particular) in case of contamination and leakage arising in such pipes, valves and manifold panel involved in purging inert gases (Ar and N2). The purge box can preferably block external air from a joint area connecting gas pipes and a gas container, such as a cylinder, which is prone to leakage and contamination due to frequent attachments and detachments. In addition, a supply valve of the hazardous reactive chemical is closed, to avoid further releases. Physical and chemical damages resulting from attaching and detaching a cylinder mounted on a gas supply facility including existing or separate gas cabinets can be prevented.

    Abstract translation: 用清洗箱,管道,阀门和歧管面板构建的净化系统。 除了普通气柜的通风系统外,其特点是通过安全排放有毒和反应性气体,并通过防止爆炸和火灾,特别是在发生污染和泄漏的情况下,特别是空气(特别是氧气) 管道,阀门和歧管面板涉及吹扫惰性气体(Ar和N2)。 吹扫箱可以优选地从连接气体管道的连接区域和诸如气缸的气体容器(其容易由于频繁的附接和分离而容易渗漏和污染)的气体容器阻挡外部空气。 此外,危险反应化学品的供应阀关闭,以避免进一步释放。 可以防止由于安装和拆卸安装在包括现有或单独的气柜的气体供应设备的气缸而导致的物理和化学损坏。

    Etching Process
    7.
    发明申请
    Etching Process 审中-公开
    蚀刻工艺

    公开(公告)号:US20090068844A1

    公开(公告)日:2009-03-12

    申请号:US12296139

    申请日:2007-04-06

    Abstract: Mixtures of fluorine and inert gases like nitrogen and/or argon can be used for etching of semiconductors, solar panels and flat panels (TFTs and LCDs), and for cleaning of semiconductor surfaces and plasma chambers. Preferably, fluorine is comprised in an amount of 15 to 25 vol.-% in binary mixtures. The gas mixtures can be used as substitute or drop-in for respective mixtures comprising NF3 and permit a very flexible operation of plasma apparatus. For example, apparatus tuned for NF3/Ar mixtures can be operated without further tuning using fluorine and argon, optionally together with nitrogen. The fluorine content is preferably in the range of 1 to 5 vol.-%, if ternary mixtures of fluorine, nitrogen and argon are used.

    Abstract translation: 氟和惰性气体如氮气和/或氩气的混合物可用于半导体,太阳能电池板和平板(TFT和LCD)的蚀刻以及半导体表面和等离子体室的清洗。 优选地,氟以二元混合物计含量为15至25体积%。 气体混合物可以用作包含NF 3的相应混合物的替代或滴加,并允许等离子体装置的非常灵活的操作。 例如,调节NF3 / Ar混合物的设备可以在不进一步调节的情况下使用氟和氩,任选与氮一起进行操作。 如果使用氟,氮和氩的三元混合物,氟含量优选在1至5体积%的范围内。

    Preparation of homogeneous gas mixtures with SF.sub.6
    9.
    发明授权
    Preparation of homogeneous gas mixtures with SF.sub.6 有权
    用SF6制备均匀气体混合物

    公开(公告)号:US6105631A

    公开(公告)日:2000-08-22

    申请号:US319016

    申请日:1999-08-03

    Abstract: Homogeneous compressed gas mixtures with SF.sub.6 and a gas with a density at least 4 grams per liter lower can be prepared by using a mixing station with at least the following elements: a gas premixer in which the separate gases are brought together; a static mixer and/or a buffer tank connected thereto; a compressor connected to the buffer tank or static mixer; and when a buffer tank is used, a return line from the compressor output to the buffer tank. Mixtures of SF.sub.6 and N.sub.2, useful for example as insulating gas for current conducting underground cables, can be produced by this process, which is capable of processing large flow rates. Mass flowmeters ensure high precision and reliability. Also disclosed is a mobile mixing station for implementing this process.

    Abstract translation: PCT No.PCT / DE97 / 02710 Sec。 371日期1999年8月3日 102(e)日期1999年8月3日PCT 1997年11月19日PCT公布。 第WO98 / 23363号公报 日期1998年6月4日可以通过使用具有至少以下元素的混合站来制备具有SF 6和密度至少为4克/升低的气体的各种压缩气体混合物:将气体分离在一起的气体预混合器 ; 静态混合器和/或与其连接的缓冲罐; 压缩机连接到缓冲罐或静态混合器; 并且当使用缓冲罐时,从压缩机输出到缓冲罐的返回管线。 可以通过这种能够处理大流量的方法生产SF6和N2的混合物,例如用作导电地下电缆的绝缘气体。 质量流量计确保高精度和可靠性。 还公开了一种用于实现该过程的移动混合站。

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