公开(公告)号：US3740224A

公开(公告)日：1973-06-19

申请号：US3740224D

申请日：1971-07-13

Applicant: BASF AG

Inventor： BARZYNSKI H ,  KRAUCH C

IPC: C08F283/10 ,  C08F291/18 ,  C08L71/02 ,  G03F7/032 ,  G03F7/02 ,  G03C1/68

CPC classification number: G03F7/032 ,  C08F283/10 ,  C08F291/18 ,  C08L71/02 ,  C08L2666/04 ,  C08L2666/28

Abstract: PHOTOSENSITIVE COMPOSITIONS BASED ON ETHYLENE OXIDE POLYMERS, POLYCARBOXYLIC ACIDS, OLEFINICALLY UNSATURATED MONOMERS AND ADDITIONS OF PHOTOINITIATORS AND POLYMERIZATION INHIBITORS. THE PHOTOSENSITIVE COMPOSITIONS OF THE INVENTION ARE SUITABLE FOR THE PREPARATION OF PRINTING PLATES.

公开(公告)号：US3849137A

公开(公告)日：1974-11-19

申请号：US29514672

申请日：1972-10-05

Applicant: BASF AG

Inventor： BARZYNSKI H ,  VOLKERT O ,  JUN M ,  SAENGER D

IPC: C09K3/00 ,  C08F8/00 ,  C08F8/14 ,  C08F8/30 ,  C08F20/00 ,  C08F20/34 ,  C08F26/06 ,  G03C1/72 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027 ,  G03C1/70

CPC classification number: G03F7/039 ,  C08F8/14 ,  C08F20/34 ,  C08F26/06 ,  C08F220/02 ,  C08F222/00

Abstract: Photosensitive coating materials comprising polymers containing o-nitrocarbinol ester groups, particularly of polymers and copolymers of o-nitrocarbinol esters of ethylenically unsaturated carboxylic acids, which as a result of exposure become soluble in an alkaline solvent used as developer in which they were not soluble prior to exposure. Such materials are used in particular for coating lithographic printing plates and as photoresists.

Abstract translation: 包含含有邻硝基甲醇酯基团的聚合物的光敏涂层材料，特别是烯属不饱和羧酸的邻硝基甲醇酯的聚合物和共聚物，其作为暴露的结果变得可溶于用作显色剂的碱性溶剂，其中它们以前不溶于其中 曝光 这种材料特别用于涂布平版印刷版和光致抗蚀剂。