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公开(公告)号：US10961264B2
公开(公告)日：2021-03-30
申请号：US15779306
申请日：2016-12-01
Applicant: BASF SE
Inventor： Tobias Lang , Zoltan Baan , Philip Muelheims , Anton Flajs , Hartmut Denecke
IPC: C07F9/22
Abstract: Provided herein is a process for isolating at least one (thio)phosphoric acid derivative, which has a boiling point of at least 70° C., from a product mixture including the at least one (thio)phosphoric acid derivative, at least one salt selected from ammonium salts and alkali metal chlorides, at least one polar solvent selected from the group consisting of ester solvents and ether solvents, and optionally at least one HCl scavenger; wherein the process is based on first dissolving the (thio)phosphoric acid derivative to be able to remove the at least one salt, and then causing solids formation of the (thio)phosphoric acid derivative.
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公开(公告)号：US10541446B2
公开(公告)日：2020-01-21
申请号：US15623205
申请日：2017-06-14
Applicant: BASF SE
Inventor： Frederick Francois Chesneau , Zoltan Baan , Boris Gaspar , Michael Schmidt , Arnd Garsuch , Hannes Wolf , Klaus Leitner , Christian Saffert , Wolfgang Klaus , Melanie Kuhl
IPC: H01M10/0567 , H01M10/0525 , H01M10/0568 , H01M4/505 , H01M4/525 , H01M4/587 , H01M10/0569 , H01M2/16 , H01M4/131 , H01M4/133 , H01M4/62 , H01M4/66 , H01M4/02 , H01M4/04 , H01M4/1391
Abstract: An electrolyte composition (A) containing(i) at least one aprotic organic solvent;(ii) at least one conducting salt;(iii) at least one compound of formula (I) wherein X1 and X2 are independently from each other selected from N(R1), P(R1), O, and S, Y1 and Y2 are independently from each other selected from (O), (S), (PR2) and (NR2); and electrochemical cells containing electrolyte composition (A).
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公开(公告)号：US20170369385A1
公开(公告)日：2017-12-28
申请号：US15538963
申请日：2015-12-22
Applicant: BASF SE
Inventor： Markus Schmid , Wolfram Zerulla , Gregor Pasda , Alexander Wissemeier , Tobias Lang , Karl-Heinrich Schneider , Zoltan Baan , Maarten Staal , Ansgar Gereon Altenhoff , Kian Molawi , Sophia Ebert , Olivier Fleischel
Abstract: A composition comprising: (A) a mixture comprising at least one (thio)phosphoric acid triamide according to the general formula (I) R1R2N—P(X)(NH2)2, wherein X is oxygen or sulfur; R1 is a C1 to C20 alkyl, C3 to C20 cycloalkyl, C6 to C20 aryl, or dialkylaminocarbonyl group; R2 is H, or R1 and R2 together with the nitrogen atom linking them define a 5- or 6-membered saturated or unsaturated heterocyclic radical, which optionally comprises 1 or 2 further heteroatoms selected from the group consisting of nitrogen, oxygen, and sulfur, and (L1) at least one amine selected from the group consisting of (L10), (L11), (L12), (L13), (L14), (L15), (L16), (L17), (L18), (L19), (L20), (L21), (L22), (L23), (L24), and (L29).
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4.发明申请COMPOSITION FOR MANUFACTURING INTEGRATED CIRCUIT DEVICES, OPTICAL DEVICES, MICROMACHINES AND MECHANICAL PRECISION DEVICES 审中-公开用于制造集成电路装置，光学装置，微型计算机和机械精密装置的组合物公开(公告)号：US20150192854A1
公开(公告)日：2015-07-09
申请号：US14413252
申请日：2013-07-12
Applicant: BASF SE
Inventor： Andreas Klipp , Andrei Honciuc , Sabrina Montero Pancera , Zoltan Baan
CPC classification number: G03F7/32 , G03F7/2002 , G03F7/2041 , G03F7/322
Abstract: A composition comprising a quaternary ammonium compound for developing photoresists applied to semiconductor substrates is provided. A method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices is also provided. The pattern collapse can be avoided by prevent swelling of the photoresist by using the improved composition.
Abstract translation: 提供一种包含用于显影应用于半导体衬底的光致抗蚀剂的季铵化合物的组合物。 还提供了一种用于制造集成电路器件，光学器件，微机械和机械精密器件的方法。 可以通过使用改进的组合物防止光致抗蚀剂的溶胀来避免图案塌陷。
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公开(公告)号：US10954256B2
公开(公告)日：2021-03-23
申请号：US15763651
申请日：2016-09-30
Applicant: BASF SE
Inventor： Tobias Lang , Karl-Heinrich Schneider , Zoltan Baan , Philip Muelheims , Steffen Tschirschwitz , Sascha Shuxia Zhu
Abstract: Provided herein is a use of a high-boiling solvent in a mixture comprising a (thio)phosphoric acid derivative and a process including the addition of a high-boiling solvent to a mixture comprising a (thio)phosphoric acid derivative to recover the (thio)phosphoric acid from the mixture by an evaporation process.
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Patent Agency Ranking
公开(公告)号：US20200157018A1
公开(公告)日：2020-05-21
申请号：US16748890
申请日：2020-01-22
Applicant: BASF SE
Inventor： Markus Schmid , Wolfram Zerulla , Gregor Pasda , Alexander Wissemeier , Tobias Lang , Karl-Heinrich Schneider , Zoltan Baan , Maarten Staal , Ansgar Gereon Altenhoff , Kian Molawi , Sophia Ebert , Olivier Fleischel
Abstract: A composition comprising: (A) a mixture comprising at least one (thio)phosphoric acid triamide according to the general formula (I) R1R2N—P(X)(NH2)2, wherein X is oxygen or sulfur; R1 is a C1 to C20 alkyl, C3 to C20 cycloalkyl, C6 to C20 aryl, or dialkylaminocarbonyl group; R2 is H, or R1 and R2 together with the nitrogen atom linking them define a 5- or 6-membered saturated or unsaturated heterocyclic radical, which optionally comprises 1 or 2 further heteroatoms selected from the group consisting of nitrogen, oxygen, and sulfur, and (L1) at least one amine selected from the group consisting of (L10), (L11), (L12), (L13), (L14), (L15), (L16), (L17), (L18), (L19), (L20), (L21), (L22), (L23), (L24), and (L29).
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公开(公告)号：US10577290B2
公开(公告)日：2020-03-03
申请号：US15538963
申请日：2015-12-22
Applicant: BASF SE
Inventor： Markus Schmid , Wolfram Zerulla , Gregor Pasda , Alexander Wissemeier , Tobias Lang , Karl-Heinrich Schneider , Zoltan Baan , Maarten Staal , Ansgar Gereon Altenhoff , Kian Molawi , Sophia Ebert , Olivier Fleischel
Abstract: A composition comprising: (A) a mixture comprising at least one (thio)phosphoric acid triamide according to the general formula (I) R1R2N—P(X)(NH2)2, wherein X is oxygen or sulfur; R1 is a C1 to C20 alkyl, C3 to C20 cycloalkyl, C6 to C20 aryl, or dialkylaminocarbonyl group; R2 is H, or R1 and R2 together with the nitrogen atom linking them define a 5- or 6-membered saturated or unsaturated heterocyclic radical, which optionally comprises 1 or 2 further heteroatoms selected from the group consisting of nitrogen, oxygen, and sulfur, and (L1) at least one amine selected from the group consisting of (L10), (L11), (L12), (L13), (L14), (L15), (L16), (L17), (L18), (L19), (L20), (L21), (L22), (L23), (L24), and (L29).
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公开(公告)号：US09761909B2
公开(公告)日：2017-09-12
申请号：US14905630
申请日：2014-07-07
Applicant: BASF SE
Inventor： Frederick Francois Chesneau , Zoltan Baan , Boris Gaspar , Michael Schmidt , Arnd Garsuch , Hannes Wolf , Klaus Leitner , Christian Saffert , Wolfgang Klaus , Melanie Kuhl
IPC: H01M10/0567 , H01M10/0525 , H01M10/0568 , H01M4/505 , H01M4/525 , H01M4/587 , H01M10/0569 , H01M2/16 , H01M4/131 , H01M4/133 , H01M4/62 , H01M4/66 , H01M4/02 , H01M4/04 , H01M4/1391
CPC classification number: H01M10/0567 , H01M2/1613 , H01M4/0404 , H01M4/131 , H01M4/133 , H01M4/1391 , H01M4/505 , H01M4/525 , H01M4/587 , H01M4/625 , H01M4/661 , H01M10/0525 , H01M10/0568 , H01M10/0569 , H01M2004/027 , H01M2004/028 , H01M2220/10 , H01M2220/20 , H01M2220/30
Abstract: An electrolyte composition (A) containing (i) at least one aprotic organic solvent; (ii) at least one conducting salt; (iii) at least one compound of formula (I) wherein X1 and X2 are independently from each other selected from N(R1), P(R1), O, and S, Y1 and Y2 are independently from each other selected from (O), (S), (PR2) and (NR2); and electrochemical cells containing electrolyte composition (A).
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公开(公告)号：US11384033B2
公开(公告)日：2022-07-12
申请号：US16748890
申请日：2020-01-22
Applicant: BASF SE
Inventor： Markus Schmid , Wolfram Zerulla , Gregor Pasda , Alexander Wissemeier , Tobias Lang , Karl-Heinrich Schneider , Zoltan Baan , Maarten Staal , Ansgar Gereon Altenhoff , Kian Molawi , Sophia Ebert , Olivier Fleischel
Abstract: A composition comprising: (A) a mixture comprising at least one (thio)phosphoric acid triamide according to the general formula (I) R1R2N—P(X)(NH2)2, wherein X is oxygen or sulfur; R1 is a C1 to C20 alkyl, C3 to C20 cycloalkyl, C6 to C20 aryl, or dialkylaminocarbonyl group; R2 is H, or R1 and R2 together with the nitrogen atom linking them define a 5- or 6-membered saturated or unsaturated heterocyclic radical, which optionally comprises 1 or 2 further heteroatoms selected from the group consisting of nitrogen, oxygen, and sulfur, and (L1) at least one amine selected from the group consisting of (L10), (L11), (L12), (L13), (L14), (L15), (L16), (L17), (L18), (L19), (L20), (L21), (L22), (L23), (L24), and (L29).
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公开(公告)号：US20180319826A1
公开(公告)日：2018-11-08
申请号：US15779306
申请日：2016-12-01
Applicant: BASF SE
Inventor： Tobias Lang , Zoltan Baan , Philip Muelheims , Anton Flajs , Hartmut Denecke
IPC: C07F9/22
CPC classification number: C07F9/224
Abstract: Provided herein is a process for isolating at least one (thio)phosphoric acid derivative, which has a boiling point of at least 70° C., from a product mixture including the at least one (thio)phosphoric acid derivative, at least one salt selected from ammonium salts and alkali metal chlorides, at least one polar solvent selected from the group consisting of ester solvents and ether solvents, and optionally at least one HCl scavenger; wherein the process is based on first dissolving the (thio)phosphoric acid derivative to be able to remove the at least one salt, and then causing solids formation of the (thio)phosphoric acid derivative.
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