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公开(公告)号：US20170047204A1
公开(公告)日：2017-02-16
申请号：US15335584
申请日：2016-10-27
Applicant: BB PLASMA DESIGN AB
Inventor： Ladislav BARDOS , Hana BARANKOVA
CPC classification number: H01J37/3405 , C23C14/3407 , C23C14/35 , C23C14/352 , H01J37/32596 , H01J37/3402 , H01J37/342 , H01J37/3423 , H01J37/3438 , H01J37/345
Abstract: A magnetron plasma apparatus boosted by hollow cathode plasma includes at least one electrically connected pair of a first hollow cathode plate and a second hollow cathode plate placed opposite to each other at a separation distance of at least 0.1 mm and having an opening following an outer edge of a sputter erosion zone on a magnetron target so that a magnetron magnetic field forms a perpendicular magnetic component inside a hollow cathode slit between plates and, wherein the plates and are connected to a first electric power generator together with the magnetron target to generate a magnetically enhanced hollow cathode plasma in at least one of a first working gas distributed in the hollow cathode slit and a second working gas admitted outside the slit in contact with a magnetron plasma generated in at least one of the first working gas and the second working gas.
Abstract translation: 由空心阴极等离子体增强的磁控管等离子体装置包括至少一个电连接的一对第一中空阴极板和第二中空阴极板，该第一空心阴极板和第二中空阴极板以至少0.1mm的间隔距离彼此相对放置， 在磁控管靶上形成溅射侵蚀区，使得磁控管磁场在板之间的中空阴极狭缝内形成垂直的磁性部件，并且其中板与磁控管靶一起连接到第一发电机，以产生磁性 分散在中空阴极狭缝中的第一工作气体中的至少一个中的增强的空心阴极等离子体以及与在第一工作气体和第二工作气体中的至少一个中产生的磁控管等离子体接触的狭缝外部的第二工作气体。
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公开(公告)号：US20220181129A1
公开(公告)日：2022-06-09
申请号：US17445247
申请日：2021-08-17
Applicant: BB PLASMA DESIGN AB
Inventor： Ladislav BARDOS , Hana BARANKOVA
Abstract: A magnetron plasma apparatus boosted by hollow cathode plasma includes at least one electrically connected pair of a first hollow cathode plate and a second hollow cathode plate placed opposite to each other at a separation distance of at least 0.1 mm and having an opening following an outer edge of a sputter erosion zone on a magnetron target so that a magnetron magnetic field forms a perpendicular magnetic component inside a hollow cathode slit between plates and, wherein the plates and are connected to a first electric power generator together with the magnetron target to generate a magnetically enhanced hollow cathode plasma in at least one of a first working gas distributed in the hollow cathode slit and a second working gas admitted outside the slit in contact with a magnetron plasma generated in at least one of the first working gas and the second working gas.
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公开(公告)号：US20180012738A9
公开(公告)日：2018-01-11
申请号：US15335584
申请日：2016-10-27
Applicant: BB PLASMA DESIGN AB
Inventor： Ladislav BARDOS , Hana BARANKOVA
CPC classification number: H01J37/3405 , C23C14/3407 , C23C14/35 , C23C14/352 , H01J37/32596 , H01J37/3402 , H01J37/342 , H01J37/3423 , H01J37/3438 , H01J37/345
Abstract: A magnetron plasma apparatus boosted by hollow cathode plasma includes at least one electrically connected pair of a first hollow cathode plate and a second hollow cathode plate placed opposite to each other at a separation distance of at least 0.1 mm and having an opening following an outer edge of a sputter erosion zone on a magnetron target so that a magnetron magnetic field forms a perpendicular magnetic component inside a hollow cathode slit between plates and, wherein the plates and are connected to a first electric power generator together with the magnetron target to generate a magnetically enhanced hollow cathode plasma in at least one of a first working gas distributed in the hollow cathode slit and a second working gas admitted outside the slit in contact with a magnetron plasma generated in at least one of the first working gas and the second working gas.
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