DISPLAY SUBSTRATE, MANUFACTURING METHOD AND DRIVING METHOD THEREOF, AND DISPLAY DEVICE

    公开(公告)号:US20170162629A1

    公开(公告)日:2017-06-08

    申请号:US15307090

    申请日:2016-03-31

    Abstract: A display substrate, a manufacturing method and a driving method thereof, and a display device are provided. The display substrate includes a substrate, a gate layer disposed on the substrate, a gate insulating layer disposed on the gate layer, a pixel defining layer disposed on the gate insulating layer, the pixel defining layer includes a plurality of defining regions, a light emitting layer in the defining regions of the pixel defining layer disposed on the gate insulating layer, wherein the light emitting layer includes an electron excitation layer, a light excitation layer and a hole excitation layer, and a source/drain layer disposed on the light emitting layer. According to an embodiment of the present disclosure, light emission and control of light emission can be realized merely by a three-layer structure of a gate layer, a light emitting layer and a source/drain layer, and compared with the OLED light emitting structure of the prior art, the layer structure is simpler, the light emitted is less blocked, and luminous efficiency is higher.

    ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE
    2.
    发明申请
    ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE 审中-公开
    阵列基板及其制造方法及显示装置

    公开(公告)号:US20170047355A1

    公开(公告)日:2017-02-16

    申请号:US14915618

    申请日:2015-09-18

    Inventor: Xuyuan LI Jun CHENG

    Abstract: The present disclosure provides an array substrate, including multiple metallic pattern layers which are insulated and spaced from each other. Each metallic pattern layer comprises a metallic piece made of a metallic material. An oxide film is formed on a lateral face of the metallic piece in at least one of the multiple metallic pattern layers and made of an oxide of the metallic material forming the metallic piece. The present disclosure further provides a display device and a method for manufacturing an array substrate.

    Abstract translation: 本公开提供了阵列基板,包括彼此绝缘和间隔开的多个金属图案层。 每个金属图案层包括由金属材料制成的金属片。 在多个金属图案层中的至少一个金属片的侧面上形成氧化膜,并由形成金属片的金属材料的氧化物构成。 本公开还提供了一种显示装置和用于制造阵列基板的方法。

    Pixel Defining Layer and Manufacturing Method Thereof, Display Panel and Display Device
    3.
    发明申请
    Pixel Defining Layer and Manufacturing Method Thereof, Display Panel and Display Device 有权
    像素定义层及其制造方法,显示面板和显示设备

    公开(公告)号:US20160351635A1

    公开(公告)日:2016-12-01

    申请号:US14912267

    申请日:2015-10-20

    Inventor: Xuyuan LI

    Abstract: The present invention discloses a pixel defining layer and a manufacturing method thereof, a display panel and a display device. The pixel defining layer comprises a first pixel defining layer and a second pixel defining layer stacked on the first pixel defining layer, wherein the first pixel defining layer has a plurality of first openings corresponding to light-emitting regions of respective sub-pixels in one-to-one correspondence, the second pixel defining layer has a plurality of second openings corresponding to the first openings in one-to-one correspondence, a cross section of the first opening is in a regular trapezoidal shape which is narrow at top and wide at bottom, and a cross section of the second opening is in an inverted trapezoidal shape which is wide at top and narrow at bottom. The present invention can effectively avoid the short between the anode and the cathode and the open of the cathode.

    Abstract translation: 本发明公开了一种像素限定层及其制造方法,显示面板和显示装置。 所述像素限定层包括第一像素限定层和层叠在所述第一像素限定层上的第二像素限定层,其中所述第一像素限定层具有对应于各个子像素的发光区域的多个第一开口, 所述第二像素限定层具有与所述第一开口对应的多个第二开口,一对一对应,所述第一开口的横截面为规则梯形,其顶部窄,宽 底部,并且第二开口的横截面为倒立的梯形形状,其顶部宽并且在底部较窄。 本发明可以有效地避免阳极和阴极之间的短路以及阴极的开路。

    Thin-Film Transistor and Manufacturing Method Thereof, Array Substrate and Manufacturing Method Thereof, and Display Apparatus
    4.
    发明申请
    Thin-Film Transistor and Manufacturing Method Thereof, Array Substrate and Manufacturing Method Thereof, and Display Apparatus 有权
    薄膜晶体管及其制造方法,阵列基板及其制造方法以及显示装置

    公开(公告)号:US20160343864A1

    公开(公告)日:2016-11-24

    申请号:US14785816

    申请日:2015-06-19

    Abstract: A thin-film transistor and a manufacturing method thereof, an array substrate and a manufacturing method thereof, and a display apparatus are provided. The method for manufacturing the TFT includes: forming a gate electrode, a gate insulating layer, a metal oxide semiconductor active layer, a source electrode and a drain electrode on a substrate; the forming the metal oxide semiconductor active layer includes: forming the metal oxide semiconductor active layer by electrochemical reaction. The method for manufacturing the TFT is applied in the production of the TFT and the array substrate and the display apparatus comprising the TFTs and provides a new method for forming the metal oxide semiconductor active layer.

    Abstract translation: 提供薄膜晶体管及其制造方法,阵列基板及其制造方法以及显示装置。 TFT的制造方法包括:在基板上形成栅电极,栅极绝缘层,金属氧化物半导体有源层,源电极和漏电极; 形成金属氧化物半导体活性层包括:通过电化学反应形成金属氧化物半导体活性层。 制造TFT的方法适用于TFT和阵列基板的制造以及包括TFT的显示装置,并提供了形成金属氧化物半导体活性层的新方法。

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