公开(公告)号：US20240253152A1

公开(公告)日：2024-08-01

申请号：US18561660

申请日：2022-05-19

Applicant: BOEGLI-GRAVURES SA

Inventor： Charles BOEGLI ,  Gabriel DUMITRU ,  Alain DROZ ,  Mario TONIN

IPC: B23K26/04 ,  B23K26/03 ,  B23K26/06 ,  B23K26/067 ,  B23K26/362 ,  B42D25/328 ,  B42D25/435

CPC classification number: B23K26/048 ,  B23K26/032 ,  B23K26/0648 ,  B23K26/067 ,  B23K26/362 ,  B42D25/328 ,  B42D25/435

Abstract: A device for engraving a diffraction grating on a workpiece, comprises an optical set-up comprising a laser, a beam forming device, a beam splitting device, and a focusing head. The laser is configured to output a laser beam. The beam forming device is configured to control a diameter of and a light intensity distribution in the laser beam, and output a primary laser beam. The beam splitting device is configured for a splitting of the primary laser beam into a plurality of split beams for the engraving. The focusing head comprises a microscope objective lens (109) configured to focus the respective split beams in respective foci on the workpiece, an auto-focusing system configured to produce a positioning signal for adjusting and maintaining a distance between the microscope objective lens and the workpiece in order to maintain the respective foci of the split beams on the workpiece and output the positioning signal; and a micro-actuator configured to receive the positioning signal and adjust the distance between the microscope objective lens and the workpiece, whereby the auto-focusing system and the micro-actuator are operationally connected in a closed-loop. The device for engraving further comprises a positioning device configured to perform a relative positioning between the workpiece in the respective foci of the split beams, and the optical set-up; and a controller configured to control the positioning device and the laser according to engraving instructions for the diffraction grating.

公开(公告)号：US20250041972A1

公开(公告)日：2025-02-06

申请号：US18722465

申请日：2022-12-21

Applicant: BOEGLI-GRAVURES SA

Inventor： Charles BOEGLI ,  Gabriel DUMITRU ,  Mario TONIN

IPC: B23K26/359 ,  B23K26/064

Abstract: A method for obtaining engraving instructions to control a system comprising a Spatial Light Modulator (SLM), the engraving instructions being configured to control the system to represent a pixelized image on a solid piece by means of an engraving beam. The engraving beam is formed by an adjustable number of focal spots aligned on an orientation axis, thereby defining a brush, and is generated by means of a laser and the SLM. The pixelized image comprises at least a first delimited surface to which is attributed a first appearance, the first appearance corresponding to a set of a first angle of orientation of the brush and a first period corresponding to a distance separating one focal spot from a next focal spot in the brush, the first delimited surface to be filled with engraved structures arranged as first linear segments by means of the engraving beam, the first linear segments being perpendicular to the first orientation of the brush. The method comprises uploading of the pixelized image of the first delimited surface into a memory of the system; uploading a table of appearances comprising at least for the first appearance a set with the first angle of orientation and the first period; uploading parameters for available brush widths at least for the first appearance, the parameters comprising a list of at least one brush with a determined number of focal spots. The method further comprises rotating the first delimited surface as a function of an angle of rotation corresponding to the first angle of orientation; re-pixelization of the rotated first delimited surface; determining of a start position and an end position of each of the linear segments in order to sweep the rotated first delimited surface with the brush having the widest possible width in successive and adjacent stripes; determining of a first remaining surface not yet swept of the rotated first delimited surface and repeating the step of determining of a start position and an end position of the linear segments having a smaller width corresponding to an available brush that is smaller than the previously used brush; generating a computer-generated hologram for each available width of available brushes used with the first angle of orientation; and sending engraving instructions to a further memory of the system.