Photoconductive imaging members
    1.
    发明授权
    Photoconductive imaging members 有权
    光导成像构件

    公开(公告)号:US06287737B1

    公开(公告)日:2001-09-11

    申请号:US09579491

    申请日:2000-05-30

    IPC分类号: G03G5047

    摘要: A photoconductive imaging member comprised of a supporting substrate, a hole blocking layer thereover, a photogenerating layer and a charge transport layer, and wherein the hole blocking layer is comprised of a crosslinked polymer derived from the reaction of a silyl-functionalized hydroxyalkyl polymer of Formula (I) with an organosilane of Formula (II) and water wherein A, B, D, and F represent the segments of the polymer backbone; E is an electron transporting moiety; X is selected from the group consisting of halide, cyano, alkoxy, acyloxy, and aryloxy; a, b, c, and d are mole fractions of the repeating monomer units such that the sum of a+b+c+d is equal to 1; R is alkyl, substituted alkyl, aryl, or substituted aryl; and R1, R2, and R3 are independently selected from the group consisting of alkyl, aryl, alkoxy, aryloxy, acyloxy, halogen, cyano, and amino, subject to the provision that two of R1, R2, and R3 are independently selected from the group consisting of alkoxy, aryloxy, acyloxy, and halide.

    摘要翻译: 一种感光成像构件,包括支撑衬底,其上的空穴阻挡层,光生代层和电荷输送层,并且其中空穴阻挡层由衍生自式(I)的甲硅烷基官能化羟烷基聚合物的交联聚合物组成, (I)与式(II)的有机硅烷和水,其中A,B,D和F表示聚合物主链的链段; E是电子传输部分; X选自卤素,氰基,烷氧基,酰氧基和芳氧基; a,b,c和d是重复单体单元的摩尔分数,使得+ b + c + d的和等于1; R是烷基,取代的烷基,芳基或取代的芳基; 并且R 1,R 2和R 3独立地选自烷基,芳基,烷氧基,芳氧基,酰氧基,卤素,氰基和氨基,条件是R 1,R 2和R 3中的两个独立地选自 烷氧基,芳氧基,酰氧基和卤化物组成的组。

    Photoconductive imaging members
    3.
    发明授权
    Photoconductive imaging members 失效
    光导成像构件

    公开(公告)号:US06495300B1

    公开(公告)日:2002-12-17

    申请号:US09895453

    申请日:2001-07-02

    IPC分类号: G03G5047

    摘要: A photoconductive imaging member containing an optional supporting substrate, a photogenerating layer, a charge transport layer, and an overcoating layer comprised of a crosslinked composite polysiloxane-silica generated from the reaction of a silyl-functionalized hydroxyalkyl polymer of Formula (I) with an organosilane of Formula (II) in the presence of silica particles and water wherein A, B, D, and F represent the segments of the polymer backbone; E is a hole transporting moiety; X is selected from the group consisting of halide, cyano, alkoxy, acyloxy, and aryloxy; a, b, c, and d each represent mole fractions of the repeating monomer units such that the sum of a+b+c+d is equal to about 1; R is alkyl, substituted alkyl, aryl, or substituted aryl, and R1, R2, and R3 are independently selected from the group consisting of alkyl, aryl, alkoxy, aryloxy, acyloxy, halide, cyano, and amino, subject to the provision that two of R1, R2, and R3 are each independently selected from the group consisting of alkoxy, aryloxy, acyloxy, and halide.

    摘要翻译: 含有任选的支撑基底,光生成层,电荷输送层和外涂层的光导成像构件,其由通式(I)的甲硅烷基官能化羟烷基聚合物与有机硅烷反应生成的交联复合聚硅氧烷 - 二氧化硅 在二氧化硅颗粒和水的存在下,式(II)中,A,B,D和F表示聚合物主链的链段; E是空穴传输部分; X选自卤素,氰基,烷氧基,酰氧基和芳氧基; a,b,c和d各自表示重复单体单元的摩尔分数,使得a + b + c + d的和等于约1; R是烷基,取代的烷基,芳基或取代的芳基,并且R 1,R 2和R 3独立地选自烷基,芳基,烷氧基,芳氧基,酰氧基,卤素,氰基和氨基,条件是 R 1,R 2和R 3中的两个各自独立地选自烷氧基,芳氧基,酰氧基和卤化物。

    Charge generating layer containing acceptor molecule
    7.
    发明授权
    Charge generating layer containing acceptor molecule 失效
    含有受体分子的电荷产生层

    公开(公告)号:US5922498A

    公开(公告)日:1999-07-13

    申请号:US234256

    申请日:1999-01-20

    摘要: An electrophotographic imaging member includinga supporting substrate,an undercoat layer doped with an acceptor moleculea charge generating layer comprisingphotoconductive pigment particles,film forming binder andan acceptor molecule dissolved in the film forming binder, the acceptor molecule represented by the formula ##STR1## wherein R is an alkyl group containing 1 to 20 carbon atoms, and a charge transport layer,the charge generating layer being located between the substrate and the charge transport layer. A process for fabricating this imaging member is also disclosed.

    摘要翻译: 一种电子照相成像构件,包括支撑衬底,掺杂有受体分子的底涂层,包含光导性颜料颗粒的电荷产生层,成膜粘合剂和溶解在成膜粘合剂中的受体分子,由下式表示的受体分子其中R为 含有1至20个碳原子的烷基和电荷传输层,电荷产生层位于基底和电荷输送层之间。 还公开了一种用于制造该成像构件的工艺。