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    System for search and analysis of systematic defects in integrated circuits
    3.
    发明授权
    System for search and analysis of systematic defects in integrated circuits 失效
    集成电路系统缺陷的搜索和分析系统

    公开(公告)号：US07552417B2

    公开(公告)日：2009-06-23

    申请号：US12132710

    申请日：2008-06-04

    申请人： Bette L. Bergman Reuter ,  David L. DeMaris ,  Mark A. Lavin ,  William C. Leipold ,  Daniel N. Maynard ,  Maharaj Mukherjee

    发明人： Bette L. Bergman Reuter ,  David L. DeMaris ,  Mark A. Lavin ,  William C. Leipold ,  Daniel N. Maynard ,  Maharaj Mukherjee

    IPC分类号： G06F17/50

    CPC分类号： G06T7/001 ,  G06T2207/30148

    摘要： Disclosed is a method of locating systematic defects in integrated circuits. The invention first performs a preliminary extracting and index processing of the circuit design and then performs feature searching. When performing the preliminary extracting and index processing the invention establishes a window grid for the circuit design and merges basis patterns with shapes in the circuit design within each window of the window grid. The invention transforms shapes in a each window into feature vectors by finding intersections between the basis patterns and the shapes in the windows. Then, the invention clusters the feature vectors to produce an index of feature vectors. After performing the extracting and index processing, the invention performs the process of feature searching by first identifying a defect region window of the circuit layout and similarly merging basis patterns with shapes in the defect region window. This merging process can include rotating and mirroring the shapes in the defect region. The invention similarly transforms shapes in the defect region window into defect vectors by finding intersections between basis patterns and the shapes in the defect region. Then, the invention can easily find feature vectors that are similar to the defect vector using, for example, representative feature vectors from the index of feature vectors. Then, the similarities and differences between the defect vectors and the feature vectors can be analyzed.

    摘要翻译： 公开了一种定位集成电路系统缺陷的方法。 本发明首先进行电路设计的初步提取和索引处理，然后执行特征搜索。 当执行初步提取和索引处理时，本发明建立了用于电路设计的窗口网格，并且将窗体网格的每个窗口内的电路设计中的形状与基本图案合并。 本发明通过在窗口中找到基本图案和形状之间的交点来将每个窗口中的形状转换为特征向量。 然后，本发明聚集特征向量以产生特征向量的索引。 在执行提取和索引处理之后，本发明通过首先识别电路布局的缺陷区域窗口并且将基本模式与缺陷区域窗口中的形状类似地合并来执行特征搜索的处理。 该合并过程可以包括旋转和镜像缺陷区域中的形状。 本发明类似地通过在缺陷区域中找到基础图案和形状之间的交点来将缺陷区域窗口中的形状转换为缺陷向量。 然后，本发明可以使用例如来自特征向量的索引的代表性特征向量容易地找到与缺陷向量相似的特征向量。 然后，可以分析缺陷向量和特征向量之间的相似性和差异。

    System for search and analysis of systematic defects in integrated circuits
    4.
    发明授权
    System for search and analysis of systematic defects in integrated circuits 有权
    集成电路系统缺陷的搜索和分析系统

    公开(公告)号：US07284230B2

    公开(公告)日：2007-10-16

    申请号：US10605849

    申请日：2003-10-30

    申请人： Bette L. Bergman Reuter ,  David L. DeMaris ,  Mark A. Lavin ,  William C. Leipold ,  Daniel N. Maynard ,  Maharaj Mukherjee

    发明人： Bette L. Bergman Reuter ,  David L. DeMaris ,  Mark A. Lavin ,  William C. Leipold ,  Daniel N. Maynard ,  Maharaj Mukherjee

    IPC分类号： G06F17/50

    CPC分类号： G06T7/001 ,  G06T2207/30148

    摘要： Disclosed is a method of locating systematic defects in integrated circuits. Extracting and index processing of a circuit design and feature searching are performed. During extracting and index processing, a window grid for the circuit design is established and basis patterns are merged with shapes within each. Shapes in each window are transformed into feature vectors by finding intersections between basis patterns and shapes. Feature vectors are clustered to produce an index of feature vectors. During feature searching, a defect region window of the circuit layout is identified and basis patterns are merged with shapes in the defect region window. Shapes in the defect region window are transformed into defect vectors by finding intersections between basis patterns and shapes. Feature vectors similar to the defect vector are found using representative feature vectors from the index of feature vectors. Similarities and differences between defect vectors and feature vectors are analyzed.

    摘要翻译： 公开了一种定位集成电路系统缺陷的方法。 执行电路设计和特征搜索的提取和索引处理。 在提取和索引处理期间，建立了用于电路设计的窗口网格，并且将基本图案与每个窗体中的形状合并。 通过查找基础图案和形状之间的交点，将每个窗口中的形状转换为特征向量。 将特征向量聚类以产生特征向量的索引。 在特征搜索期间，识别电路布局的缺陷区域窗口，并将基本图案与缺陷区域窗口中的形状合并。 通过发现基础图案和形状之间的交点，将缺陷区域窗口中的形状转换为缺陷向量。 使用来自特征向量索引的代表特征向量，找到与缺陷向量相似的特征向量。 分析缺陷向量和特征向量之间的相似性和差异性。

    System for search and analysis of systematic defects in integrated circuits
    5.
    发明授权
    System for search and analysis of systematic defects in integrated circuits 有权
    集成电路系统缺陷的搜索和分析系统

    公开(公告)号：US07415695B2

    公开(公告)日：2008-08-19

    申请号：US11748575

    申请日：2007-05-15

    申请人： Bette L. Bergman Reuter ,  David L. DeMaris ,  Mark A. Lavin ,  William C. Leipold ,  Daniel N. Maynard ,  Maharaj Mukherjee

    发明人： Bette L. Bergman Reuter ,  David L. DeMaris ,  Mark A. Lavin ,  William C. Leipold ,  Daniel N. Maynard ,  Maharaj Mukherjee

    IPC分类号： G06F17/50

    CPC分类号： G06T7/001 ,  G06T2207/30148

    摘要： Disclosed is a method of locating systematic defects in integrated circuits. The invention first performs a preliminary extracting and index processing of the circuit design and then performs feature searching. When performing the preliminary extracting and index processing the invention establishes a window grid for the circuit design and merges basis patterns with shapes in the circuit design within each window of the window grid. The invention transforms shapes in a each window into feature vectors by finding intersections between the basis patterns and the shapes in the windows. Then, the invention clusters the feature vectors to produce an index of feature vectors. After performing the extracting and index processing, the invention performs the process of feature searching by first identifying a defect region window of the circuit layout and similarly merging basis patterns with shapes in the defect region window. This merging process can include rotating and mirroring the shapes in the defect region. The invention similarly transforms shapes in the defect region window into defect vectors by finding intersections between basis patterns and the shapes in the defect region. Then, the invention can easily find feature vectors that are similar to the defect vector using, for example, representative feature vectors from the index of feature vectors. Then, the similarities and differences between the defect vectors and the feature vectors can be analyzed.

    摘要翻译： 公开了一种定位集成电路系统缺陷的方法。 本发明首先进行电路设计的初步提取和索引处理，然后执行特征搜索。 当执行初步提取和索引处理时，本发明建立了用于电路设计的窗口网格，并且将窗体网格的每个窗口内的电路设计中的形状与基本图案合并。 本发明通过在窗口中找到基本图案和形状之间的交点来将每个窗口中的形状转换为特征向量。 然后，本发明聚集特征向量以产生特征向量的索引。 在执行提取和索引处理之后，本发明通过首先识别电路布局的缺陷区域窗口并且将基本模式与缺陷区域窗口中的形状类似地合并来执行特征搜索的处理。 该合并过程可以包括旋转和镜像缺陷区域中的形状。 本发明类似地通过在缺陷区域中找到基础图案和形状之间的交点来将缺陷区域窗口中的形状转换为缺陷向量。 然后，本发明可以使用例如来自特征向量的索引的代表性特征向量容易地找到与缺陷向量相似的特征向量。 然后，可以分析缺陷向量和特征向量之间的相似性和差异。

    SYSTEM FOR SEARCH AND ANALYSIS OF SYSTEMATIC DEFECTS IN INTEGRATED CIRCUITS
    6.
    发明申请
    SYSTEM FOR SEARCH AND ANALYSIS OF SYSTEMATIC DEFECTS IN INTEGRATED CIRCUITS 失效
    集成电路系统缺陷的搜索与分析系统

    公开(公告)号：US20080232675A1

    公开(公告)日：2008-09-25

    申请号：US12132710

    申请日：2008-06-04

    申请人： Bette L. Bergman Reuter ,  David L. DeMaris ,  Mark A. Lavin ,  William C. Leipold ,  Daniel N. Maynard ,  Maharaj Mukherjee

    发明人： Bette L. Bergman Reuter ,  David L. DeMaris ,  Mark A. Lavin ,  William C. Leipold ,  Daniel N. Maynard ,  Maharaj Mukherjee

    IPC分类号： G06K9/00

    CPC分类号： G06T7/001 ,  G06T2207/30148

    摘要： Disclosed is a method of locating systematic defects in integrated circuits. The invention first performs a preliminary extracting and index processing of the circuit design and then performs feature searching. When performing the preliminary extracting and index processing the invention establishes a window grid for the circuit design and merges basis patterns with shapes in the circuit design within each window of the window grid. The invention transforms shapes in a each window into feature vectors by finding intersections between the basis patterns and the shapes in the windows. Then, the invention clusters the feature vectors to produce an index of feature vectors. After performing the extracting and index processing, the invention performs the process of feature searching by first identifying a defect region window of the circuit layout and similarly merging basis patterns with shapes in the defect region window. This merging process can include rotating and mirroring the shapes in the defect region. The invention similarly transforms shapes in the defect region window into defect vectors by finding intersections between basis patterns and the shapes in the defect region. Then, the invention can easily find feature vectors that are similar to the defect vector using, for example, representative feature vectors from the index of feature vectors. Then, the similarities and differences between the defect vectors and the feature vectors can be analyzed.

    摘要翻译： 公开了一种定位集成电路系统缺陷的方法。 本发明首先进行电路设计的初步提取和索引处理，然后执行特征搜索。 当执行初步提取和索引处理时，本发明建立了用于电路设计的窗口网格，并且将窗体网格的每个窗口内的电路设计中的形状与基本图案合并。 本发明通过在窗口中找到基本图案和形状之间的交点来将每个窗口中的形状转换为特征向量。 然后，本发明聚集特征向量以产生特征向量的索引。 在执行提取和索引处理之后，本发明通过首先识别电路布局的缺陷区域窗口并且将基本模式与缺陷区域窗口中的形状类似地合并来执行特征搜索的处理。 该合并过程可以包括旋转和镜像缺陷区域中的形状。 本发明类似地通过在缺陷区域中找到基础图案和形状之间的交点来将缺陷区域窗口中的形状转换为缺陷向量。 然后，本发明可以使用例如来自特征向量的索引的代表性特征向量容易地找到与缺陷向量相似的特征向量。 然后，可以分析缺陷向量和特征向量之间的相似性和差异。