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1.发明授权公开(公告)号：US11094789B2
公开(公告)日：2021-08-17
申请号：US16497658
申请日：2019-04-12
发明人： Xiaolong Li , Jinchao Bai , Huibin Guo , Xiao Han , Yongzhi Song
IPC分类号： H01L29/417 , H01L27/32 , H01L29/40 , H01L29/66 , H01L29/786 , H01L21/3213 , H01L27/12 , H01L29/45
摘要： Embodiments of the present disclosure disclose a thin film transistor, a method for manufacturing a thin film transistor, an array substrate, and a display device. The thin film transistor includes a source electrode and a drain electrode, each of the source electrode and the drain electrode including a metal substrate and a conductive layer covering the metal substrate. An adhesion between the conductive layer and a photoresist material is larger than an adhesion between the metal substrate and the photoresist material. The metal substrate and the conductive layer are both formed on a base substrate, an orthographic projection of the conductive layer on the base substrate covers an orthographic projection of the metal substrate on the base substrate, and. an area of the orthographic projection of the conductive layer on the base substrate is larger than an area of the orthographic projection of the metal substrate on the base substrate.
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公开(公告)号：US11049889B2
公开(公告)日：2021-06-29
申请号：US16332882
申请日：2018-09-21
发明人： Xiao Han , Jinchao Bai , Xiangqian Ding , Huibin Guo
IPC分类号： H01L27/12 , G02F1/1343 , G02F1/1368 , H01L21/3065 , H01L21/308 , H01L21/3213
摘要： This disclosure provides an array substrate, a method for fabricating the same, a display panel, and a display device, where a first photo-resist layer is stripped in a changed order in that the first photo-resist layer on a source-drain is stripped through wet etching before a ohm contact layer film and an active layer film are etched in an electrically-conductive channel area (i.e., an electrically-conductive channel of a TFT is etched) to form an ohm contact layer and an active layer.
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3.发明授权公开(公告)号：US10236394B2
公开(公告)日：2019-03-19
申请号：US15741753
申请日：2017-01-25
发明人： Jinchao Bai , Huibin Guo , Xiangqian Ding , Jing Wang
IPC分类号： H01L27/12 , H01L29/786 , H01L21/223 , H01L29/66 , H01L29/417
摘要： The present application discloses A thin film transistor (TFT), including: a substrate; a source-drain layer comprising a source electrode and a drain electrode over the substrate; and an active layer comprising a poly-Si pattern and an amorphous-Si pattern having contact with the poly-Si pattern over the substrate. The amorphous-Si pattern is between the poly-Si pattern and the source-drain layer; the source electrode overlaps with the poly-Si pattern and the amorphous-Si pattern respectively in a direction substantially perpendicular to a surface of the substrate; and the drain electrode overlaps with the poly-Si pattern and the amorphous-Si pattern respectively in the direction substantially perpendicular to the surface of the substrate.
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公开(公告)号：US10147643B2
公开(公告)日：2018-12-04
申请号：US15521079
申请日：2016-09-07
发明人： Shoukun Wang , Huibin Guo , Yuchun Feng , Liangliang Li
IPC分类号： H01L21/77 , H01L27/12 , H01L21/3213 , H01L27/14
摘要： An array substrate, a manufacturing method thereof, and a display device are provided. The array substrate includes: a base substrate, a signal line disposed on the base substrate, an extinction layer disposed between the base substrate and the signal line, the extinction layer being configured to reduce an ambient light when the array substrate is located on a light exiting side. An orthographic projection of the signal line in a plane of the base substrate is coincided with an orthographic projection of the extinction layer in the plane of the base substrate.
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公开(公告)号：US10141423B2
公开(公告)日：2018-11-27
申请号：US15527410
申请日：2016-07-01
发明人： Huibin Guo , Xiaoxiang Zhang , Jing Wang
IPC分类号： H01L29/66 , H01L21/027 , H01L29/786
摘要： The disclosure provides a thin film transistor (TFT) and a fabrication method thereof, an array substrate and a fabrication method thereof, and a display apparatus. The fabrication method of a TFT includes: forming a protection layer in an area on an active layer between a source electrode and a drain electrode to be formed, forming a source-drain metal layer above the active layer having the protection layer formed thereon, coating a photoresist on the source-drain metal layer, and forming a photoresist reserved area corresponding to areas of the source electrode and the drain electrode to be formed and a photoresist non-reserved area corresponding to the other area; etching off the source-drain metal layer corresponding to the photoresist non-reserved area to form the source and drain electrodes and expose the protection layer above the active layer; and removing the photoresist above the source and drain electrodes and the protection layer.
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6.发明授权公开(公告)号：US10101626B2
公开(公告)日：2018-10-16
申请号：US15324053
申请日：2016-01-29
发明人： Shoukun Wang , Huibin Guo , Yuchun Feng , Liangliang Li , Tsungchieh Kuo
IPC分类号： H01L33/00 , G02F1/136 , G02F1/1343 , G02F1/1368 , G02F1/1362 , H01L27/12 , G06F3/038 , G09G3/36 , G09G3/20
摘要： An array substrate, a display panel, a display device, and a method for fabricating an array substrate are provided. The array substrate comprises gate lines and data lines on a substrate plate which are insulated from each other and intersect to define sub-pixel units, and the data lines comprise a first data line and a second data line which are arranged side by side between two neighboring columns of sub-pixel units. Between two of the sub-pixel units which are neighbors in a column direction, at least a portion of the first data line is arranged in a layer different from the neighboring second data line. At least a part of the first data line is arranged in a layer different from that of the neighboring second data line, to overcome the problem of short circuit between dual data lines.
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公开(公告)号：US09595547B2
公开(公告)日：2017-03-14
申请号：US14568813
申请日：2014-12-12
发明人： Huibin Guo , Shoukun Wang , Liangliang Li , Yuchun Feng , Zongjie Guo
IPC分类号： H01L27/12 , H01L29/786
CPC分类号： H01L27/1259 , H01L27/1222 , H01L27/124 , H01L29/78663
摘要： The invention discloses an array substrate, and a method for repairing a broken data line on an array substrate. The method for repairing a broken data line on an array substrate includes steps: performing a treatment on a part of a semiconductor layer corresponding to an opening in a data line so that the part of the semiconductor layer becomes a conductive region, and the ends of the opening in the data line are electrically connected to each other by the conductive semiconductor layer. The above method for repairing a broken data line provided by the invention is not affected by the linewidth of the data line so that the broken data line can be repaired in the case that the linewidth of the data line is relatively small.
摘要翻译： 本发明公开了一种阵列基板，以及在阵列基板上修复断线数据线的方法。 用于修复阵列基板上的断裂数据线的方法包括以下步骤：对与数据线中的开口相对应的半导体层的一部分进行处理，使得半导体层的一部分变为导电区域， 数据线中的开口通过导电半导体层彼此电连接。 上述用于修复由本发明提供的断线数据线的方法不受数据线的线宽的影响，从而在数据线的线宽相对较小的情况下可以修复断线数据线。
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公开(公告)号：US11189641B2
公开(公告)日：2021-11-30
申请号：US16028017
申请日：2018-07-05
发明人： Shoukun Wang , Huibin Guo , Hao Han , Fangbin Fu , Yongzhi Song
IPC分类号： H01L27/12 , G02F1/1368 , H01L29/786 , G02F1/1335 , G02F1/1362
摘要： An array substrate, a manufacturing method thereof, and a display apparatus are provided. The array substrate includes a display area and a non-display area in the periphery of the display area, the display area includes pixel regions, the display and non-display areas are provided with via holes, wherein each pixel region is provided, at a side facing a display side, with a reflection layer configured to reflect light irradiated thereon from an external light source to form a display image; and an anti-deterioration layer in contact with the reflection layer is provided in the via holes in the display and non-display areas. Thus, by using a new material, utilization of external light source is improved without additional masking process, and connection in via holes in the display area, and especially in the non-display area is achieved, which prevents deterioration of the via holes and poor contact resistance.
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公开(公告)号：US10379413B2
公开(公告)日：2019-08-13
申请号：US15521339
申请日：2016-11-02
发明人： Shoukun Wang , Liangliang Li , Yuchun Feng , Huibin Guo
IPC分类号： G02F1/1362 , G02F1/1368 , H01L27/12
摘要： This present disclosure provides an array substrate, a manufacturing method thereof, and a display apparatus, aiming at solving the issue of light reflection on the array substrates and improving the display effects of display apparatuses. The array substrate includes a transparent substrate; a plurality of components disposed on a first side of the transparent substrate; and a shielding pattern, disposed on a second side of the transparent substrate, and configured to shield light reflected from a surface of at least one of the plurality of components.
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公开(公告)号：US10282005B2
公开(公告)日：2019-05-07
申请号：US15314161
申请日：2016-03-23
发明人： Liangliang Li , Huibin Guo , Tsung Chieh Kuo , Xi Chen , Yuchun Feng , Shoukun Wang , Jing Wang
摘要： A touch display panel, a manufacturing method thereof and a method of detecting a touch for the same are disclosed. The touch display panel includes a first substrate (01) and a second substrate (02). The first substrate (01) includes, within its non-display region, a plurality of gate lines (10) parallel to each other, a plurality of data lines (20) parallel to each other, a plurality of first touch electrode lines (30) parallel to the gate lines (10), and a plurality of second touch electrode lines (40) parallel to the data lines (20). The first substrate (01) further includes first touch electrodes (50) electrically connected to the first touch electrode lines (30) and second touch electrodes (60) electrically connected to the second touch electrode lines (40). Between two adjacent data lines (20), there are two sub-pixels arranged in the same row on the first substrate (01). A second touch electrode line (40) is located between the two sub-pixels. A pair of gate lines (10) are located between any two adjacent rows of sub-pixels on the first substrate (01), and a first touch electrode lines (30) is located between the pair of the gate lines (10). Since the first touch electrode line (30) and the second touch electrode line (40) are disposed within the light-proof non-display region, their impact on the aperture ratio can be avoided.
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