Apparatus for cathodic vacuum-arc coating deposition
    1.
    发明授权
    Apparatus for cathodic vacuum-arc coating deposition 有权
    阴极真空电弧涂层沉积设备

    公开(公告)号:US08157976B2

    公开(公告)日:2012-04-17

    申请号:US11740592

    申请日:2007-04-26

    摘要: Apparatus for cathodic vacuum-arc coating deposition. The apparatus includes a mixing chamber, at least one input duct projecting from a first end wall of the mixing chamber, and an output duct projecting from a second end wall of the mixing chamber. Coupled with each input duct is a plasma source adapted to discharge an ion flow of a coating material into the mixing chamber, which is subsequently directed to the output duct. A first solenoidal coil disposed about a side wall of the mixing chamber creates a first magnetic field inside the mixing chamber for steering the ion flow. A second solenoidal coil is disposed adjacent to the first end wall and aligned substantially coaxially with the output duct. The second solenoidal coil creates a second magnetic field inside the mixing chamber for steering the first ion flow. The electrical currents flow through the first and second solenoidal coils in opposite solenoidal directions.

    摘要翻译: 阴极真空电弧涂层沉积设备。 该装置包括混合室,从混合室的第一端壁突出的至少一个输入管道和从混合室的第二端壁突出的输出管道。 与每个输入管道耦合的是等离子体源,其适于将涂覆材料的离子流排放到混合室中,其随后被引导到输出管道。 围绕混合室的侧壁设置的第一螺线管线圈在混合室内产生用于转向离子流的第一磁场。 第二螺线管线圈设置成与第一端壁相邻并且与输出管道基本上同轴对准。 第二螺线管线圈在混合室内产生用于转向第一离子流的第二磁场。 电流在相反的螺线管方向上流过第一和第二螺线管线圈。

    Filtered cathodic-arc plasma source
    2.
    发明授权
    Filtered cathodic-arc plasma source 失效
    过滤阴极电弧等离子体源

    公开(公告)号:US07381311B2

    公开(公告)日:2008-06-03

    申请号:US10693482

    申请日:2003-10-21

    IPC分类号: C23C14/32

    摘要: A filtered cathodic-arc plasma source of lower plasma losses and higher output plasma current to input current efficiency is disclosed. Plasma filtering is accomplished in a right angle bend magnetic filter arranged to include the effects of at least three added magnetic coils located at the right angle bend of the filter path. These magnetic coils and other filter attributes, including an array of transverse fins and a magnetic cusp trap in the filter path, achieve desirable magnetic flux paths, lower plasma collision losses and reduced undesired particle output from the plasma filter. Multiple cathode sources, multiple plasma output ports, Larmour radius influence, equipotential magnetic flux lines and electron/ion interaction considerations are also included in the plasma source. Application of the plasma source to film coating processes is included.

    摘要翻译: 公开了一种具有较低等离子体损耗和较高输出等离子体电流至输入电流效率的滤波阴极电弧等离子体源。 在直角弯曲磁性过滤器中完成等离子体过滤,其被布置为包括位于过滤器路径的直角弯曲处的至少三个添加的磁性线圈的效果。 这些磁性线圈和其它滤波器属性,包括横向翅片阵列和滤波器路径中的磁性尖瓣陷阱,实现期望的磁通路径,较低的等离子体碰撞损失和减少来自等离子体滤波器的不期望的粒子输出。 等离子体源还包括多个阴极源,多个等离子体输出端口,Larmour半径影响,等电位磁通线和电子/离子相互作用考虑。 包括等离子体源在薄膜涂覆工艺中的应用。