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公开(公告)号:US20250115770A1
公开(公告)日:2025-04-10
申请号:US18912542
申请日:2024-10-10
Applicant: Brewer Science, Inc.
Inventor: Reuben T. Chacko , Stephen R. Murphy
IPC: C09D5/00 , C09D7/63 , H01L27/146
Abstract: Materials that are processable as spin coated films with a refractive index of less than about 1.25 are presented. These compositions include metal organic frameworks in a solvent system, with the MOFs including a metal or metal cluster (e.g., zirconium oxide) having organic linkers (e.g., maleic acid, benzene dicarboxylic acid) and optional endcaps to alter pore size, compositional stability, steric, and other properties of the material. The formed films are processable at low temperatures, thus allowing them to be processed on plastics. The provided materials find use in, for example, silicon photonics, augmented reality applications, virtual reality (VR) applications, CMOS image sensors, and micro-OLED applications.
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公开(公告)号:US20240427240A1
公开(公告)日:2024-12-26
申请号:US18747908
申请日:2024-06-19
Applicant: Brewer Science, Inc.
Inventor: Reuben T. Chacko
IPC: G03F7/038 , C08F220/18 , C09D133/10 , G03F7/16
Abstract: Materials and methods for modifying surfaces in order to change surface energy are provided. These surface properties cause the surface to become more hydrophobic or oleophobic after light exposure. The ability to change surface energy upon exposure allows these materials to be patterned and enables a variety of uses, notably for use on semiconductor substrates in photolithography.
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公开(公告)号:US20220195238A1
公开(公告)日:2022-06-23
申请号:US17559988
申请日:2021-12-22
Applicant: Brewer Science, Inc.
Inventor: Reuben T. Chacko , Tantiboro Ouattara , Andrea M. Chacko , Yichen Liang , Kelsey Brakensiek
IPC: C09D183/04 , G03F7/20 , C08G77/20
Abstract: Silicon hardmasks with a single-component polymer are disclosed. These hardmasks provide high optical homogeneity and high chemical homogeneity, thus minimizing or avoiding negative stochastic effects on feature critical dimension. The hardmasks further provide low porosity, higher density, and high silicon content and improve performance factors such as LER/LWR, defectivity, uniformity, and DoF.
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