ON THE FLY AUTOMATIC WAFER CENTERING METHOD AND APPARATUS

    公开(公告)号:US20190164800A1

    公开(公告)日:2019-05-30

    申请号:US16197087

    申请日:2018-11-20

    Abstract: A Substrate processing apparatus including a wafer transport apparatus with a transport arm including an end effector, an arm pose deterministic feature integral to the substrate transport apparatus and disposed so that a static detection sensor of the substrate processing apparatus detects at least one edge of the at least one arm pose deterministic feature on the fly with radial motion of the transport arm, and a controller configured so that detection of the edge effects a determination of a proportion factor identifying at least a thermal expansion variance of the transport arm on the fly and includes a kinematic effects resolver configured to determine, from the detection of the edge on the fly, a discrete relation between the determined proportion factor and each different discrete variance respective to each different link of the transport arm determining at least the thermal expansion variance of the transport arm on the fly.

    ON THE FLY AUTOMATIC WAFER CENTERING METHOD AND APPARATUS

    公开(公告)号:US20210305076A1

    公开(公告)日:2021-09-30

    申请号:US17229495

    申请日:2021-04-13

    Abstract: Substrate processing apparatus including a wafer transport apparatus with a transport arm including an end effector, an arm pose deterministic feature integral to the substrate transport apparatus and disposed so that a static detection sensor of the substrate processing apparatus detects at least one edge of the at least one arm pose deterministic feature on the fly with radial motion of the transport arm, and a controller configured so that detection of the edge effects a determination of a proportion factor identifying at least a thermal expansion variance of the transport arm on the fly and includes a kinematic effects resolver configured to determine, from the detection of the edge on the fly, a discrete relation between the determined proportion factor and each different discrete variance respective to each different link of the transport arm determining at least the thermal expansion variance of the transport arm on the fly.

    METHOD AND APPARATUS FOR SUBSTRATE TRANSPORT APPARATUS POSITION COMPENSATION

    公开(公告)号:US20200273734A1

    公开(公告)日:2020-08-27

    申请号:US16872864

    申请日:2020-05-12

    Abstract: A substrate transport empiric arm droop mapping apparatus for a substrate transport system of a processing tool, the mapping apparatus including a frame, an interface disposed on the frame forming datum features representative of a substrate transport space in the processing tool defined by the substrate transport system, a substrate transport arm, that is articulated and has a substrate holder, mounted to the frame in a predetermined relation to at least one of the datum features, and a registration system disposed with respect to the substrate transport arm and at least one datum feature so that the registration system registers, in an arm droop distance register, empiric arm droop distance, due to arm droop changes, between a first arm position and a second arm position different than the first arm position and in which the substrate holder is moved in the transport space along at least one axis of motion.

    ON THE FLY AUTOMATIC WAFER CENTERING METHOD AND APPARATUS
    4.
    发明申请
    ON THE FLY AUTOMATIC WAFER CENTERING METHOD AND APPARATUS 审中-公开
    关于飞行自动烘干中心方法和装置

    公开(公告)号:US20170018446A1

    公开(公告)日:2017-01-19

    申请号:US15209497

    申请日:2016-07-13

    CPC classification number: H01L21/68 H01L21/68707

    Abstract: Substrate processing apparatus including a wafer transport apparatus with a transport arm including an end effector, an arm pose deterministic feature integral to the substrate transport apparatus and disposed so that a static detection sensor of the substrate processing apparatus detects at least one edge of the at least one arm pose deterministic feature on the fly with radial motion of the transport arm, and a controller configured so that detection of the edge effects a determination of a proportion factor identifying at least a thermal expansion variance of the transport arm on the fly and includes a kinematic effects resolver configured to determine, from the detection of the edge on the fly, a discrete relation between the determined proportion factor and each different discrete variance respective to each different link of the transport arm determining at least the thermal expansion variance of the transport arm on the fly.

    Abstract translation: 基板处理装置,包括具有包括端部执行器的输送臂的晶片输送装置,与基板输送装置成一体的臂姿势确定性特征,并且被设置为使得基板处理装置的静态检测传感器至少检测至少一个边缘 在运输臂的径向运动中一个手臂姿势确定性特征,以及控制器,其配置成使得边缘的检测影响识别运输臂在飞行中的至少热膨胀方差的比例因子的确定,并且包括 运动效应解算器,被配置为从飞行中的边缘的检测中确定所确定的比例因子与运输臂的每个不同链路相应的每个不同离散方差之间的离散关系,至少确定运输臂的热膨胀方差 在飞行中

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