公开(公告)号：US08810776B2

公开(公告)日：2014-08-19

申请号：US13946872

申请日：2013-07-19

申请人： Bu Gon Shin ,  Sin Young Kim ,  Jae Jin Kim ,  Da Mi Lee

发明人： Bu Gon Shin ,  Sin Young Kim ,  Jae Jin Kim ,  Da Mi Lee

IPC分类号： G03F1/38

CPC分类号： G03F1/38 ,  G03F1/50 ,  G03F7/24

摘要： A mask and an optical filter manufacturing apparatus including the same are provided. A mask used for a roll-to-roll process of forming patterns in a base film configured to move along a curved surface includes a mask body having a curved surface disposed opposite a roll around which the base film is wound and a plane surface corresponding to the reverse side of the curved surface. The curved surface of the mask body is disposed a predetermined distance apart from a curved surface of the roll. The mask and optical filter manufacturing apparatus enable formation of uniform patterns on the base film to enhance the quality of products and precisely attain the properties of the base film.

摘要翻译： 提供一种掩模和包括该掩模的滤光器制造装置。 用于在基底膜中形成沿着弯曲表面移动的图案的卷对卷工艺的掩模包括掩模体，该掩模体具有与基底膜卷绕的辊相对设置的弯曲表面，并且对应于 曲面的背面。 掩模体的弯曲表面与辊的弯曲表面隔开预定距离。 掩模和滤光器制造装置能够在基膜上形成均匀的图案，以提高产品的质量并精确地获得基膜的性能。

公开(公告)号：US20110217638A1

公开(公告)日：2011-09-08

申请号：US13128386

申请日：2010-02-02

申请人： Sin-Young Kim ,  Moon-Soo Park ,  Byoung-Kun Jeon ,  Sang-Choll Han ,  Bu Gon Shin ,  Hyuk Yoon

发明人： Sin-Young Kim ,  Moon-Soo Park ,  Byoung-Kun Jeon ,  Sang-Choll Han ,  Bu Gon Shin ,  Hyuk Yoon

IPC分类号： G03F7/20

CPC分类号： G02F1/133788 ,  G02B5/3083 ,  G02B27/2214 ,  G02B27/26 ,  G02F1/1303 ,  G02F2001/133538

摘要： The present invention relates to a method for manufacturing an optical filter for a three-dimensional image display device, which forms an alignment layer having different orientating directions along a fine region via a one-time continuous optical orientation process. The method comprising: forming a polymer layer on a substrate; a photo-orienting step comprising positioning a pattern mask above the polymer layer, the pattern mask having alternating light transmission regions and light shield regions arranged in both horizontal and a vertical directions to selectively transmit different polarized light, positioning a polarizer above the pattern mask where the polarizer has two distinguishable regions that transmit different polarized light, and downwardly irradiating UV light onto the polymer layer from above the polarizer, thereby forming an alignment layer having different orientating directions in fine regions of the polymer layer; and forming a retardation layer on the orientation layer. The alignment layer in which the fine regions with different orientating directions are formed alternately and continuously is obtained via a one-time continuous photo-orientation process. Therefore, the photo-orientation process and the method for manufacturing the optical filter are simplified in comparison with the conventional art. As a result, the process yield and productivity in the manufacturing of an optical filter for a 3D image display device are improved.

摘要翻译： 本发明涉及一种用于制造三维图像显示装置的滤光器的方法，其通过一次连续的光学取向工艺沿着细微区域形成具有不同取向方向的取向层。 该方法包括：在基底上形成聚合物层; 一种光取向步骤，包括在聚合物层上方定位图案掩模，图案掩模具有交替的光透射区域和布置在水平和垂直方向的光屏蔽区域以选择性地透射不同的偏振光，将偏振片定位在图案掩模上方 偏振器具有透射不同偏振光的两个可区分的区域，并且从偏光镜的上方向紫外光照射到聚合物层上，从而在聚合物层的细微区域形成具有不同取向方向的取向层; 并在取向层上形成延迟层。 通过一次连续的光取向工艺获得交替连续地形成具有不同取向方向的微细区域的取向层。 因此，与常规技术相比，光取向处理和制造滤光器的方法被简化。 结果，改善了用于3D图像显示装置的滤光器的制造中的工艺成品率和生产率。

公开(公告)号：US08982197B2

公开(公告)日：2015-03-17

申请号：US13269422

申请日：2011-10-07

申请人： Sin-Young Kim ,  Moon-Soo Park ,  Byoung-Kun Jeon ,  Sang-Choll Han ,  Bu Gon Shin ,  Hyuk Yoon

发明人： Sin-Young Kim ,  Moon-Soo Park ,  Byoung-Kun Jeon ,  Sang-Choll Han ,  Bu Gon Shin ,  Hyuk Yoon

IPC分类号： H04N13/04 ,  G02F1/1335 ,  G02B5/30 ,  G02B27/22 ,  G02B27/28

CPC分类号： H04N13/337 ,  G02B5/3083

摘要： An optical filter for stereoscopic image display device and a stereoscopic image display device may be provided. In one embodiment, the optical filter for stereoscopic image display device may include a plastic substrate; an alignment layer; and a retardation layer, and the stereoscopic image display device may include the optical filter.

摘要翻译： 可以提供用于立体图像显示装置和立体图像显示装置的滤光器。 在一个实施例中，用于立体图像显示装置的滤光器可以包括塑料基板; 对准层; 和延迟层，立体图像显示装置可以包括滤光器。

公开(公告)号：US20120026305A1

公开(公告)日：2012-02-02

申请号：US13269422

申请日：2011-10-07

申请人： Sin-Young KIM ,  Moon-Soo Park ,  Byoung-Kun Jeon ,  Sang-Choll Han ,  Bu Gon Shin ,  Hyuk Yoon

发明人： Sin-Young KIM ,  Moon-Soo Park ,  Byoung-Kun Jeon ,  Sang-Choll Han ,  Bu Gon Shin ,  Hyuk Yoon

IPC分类号： H04N13/04 ,  B05D3/06 ,  G02B27/26

CPC分类号： H04N13/337 ,  G02B5/3083

摘要： An optical filter for stereoscopic image display device and a stereoscopic image display device may be provided. In one embodiment, the optical filter for stereoscopic image display device may include a plastic substrate; an alignment layer; and a retardation layer, and the stereoscopic image display device may include the optical filter.

摘要翻译： 可以提供用于立体图像显示装置和立体图像显示装置的滤光器。 在一个实施例中，用于立体图像显示装置的滤光器可以包括塑料基板; 对准层; 和延迟层，立体图像显示装置可以包括滤光器。

公开(公告)号：US08062836B2

公开(公告)日：2011-11-22

申请号：US13128386

申请日：2010-02-02

申请人： Sin-Young Kim ,  Moon-Soo Park ,  Byoung-Kun Jeon ,  Sang-Choll Han ,  Bu Gon Shin ,  Hyuk Yoon

发明人： Sin-Young Kim ,  Moon-Soo Park ,  Byoung-Kun Jeon ,  Sang-Choll Han ,  Bu Gon Shin ,  Hyuk Yoon

IPC分类号： G03F7/20

CPC分类号： G02F1/133788 ,  G02B5/3083 ,  G02B27/2214 ,  G02B27/26 ,  G02F1/1303 ,  G02F2001/133538

摘要： The present invention relates to a method for manufacturing an optical filter for a stereoscopic image display device, which forms an alignment layer having different orientating directions along a fine region via a one-time continuous photo orientation process. The method comprising: forming a polymer layer on a substrate; a photo-orienting step comprising positioning a patterned mask above the polymer layer, the patterned mask having alternating light transmission regions and light shield regions arranged in both horizontal and a vertical directions to selectively transmit different polarized light, positioning a polarizer above the patterned mask where the polarizer has two distinguishable regions that transmit different polarized light, and downwardly irradiating UV light onto the polymer layer from above the polarizer, thereby forming an alignment layer having different orientating directions in fine regions of the polymer layer; and forming a retardation layer on the orientation layer. The alignment layer in which the fine regions with different orientating directions are formed alternately and continuously is obtained via a one-time continuous photo-orientation process. Therefore, the photo-orientation process and the method for manufacturing the optical filter are simplified in comparison with the conventional art. As a result, the process yield and productivity in the manufacturing of an optical filter for a 3D image display device are improved.

摘要翻译： 本发明涉及一种用于制造立体图像显示装置的滤光器的方法，其通过一次连续的光取向工艺沿着细微区域形成具有不同取向方向的取向层。 该方法包括：在基底上形成聚合物层; 光取向步骤包括将图案化掩模定位在聚合物层之上，图案化掩模具有交替的光透射区域和布置在水平和垂直方向上的光屏蔽区域以选择性地透射不同的偏振光，将偏振片定位在图案化掩模上方 偏振器具有透射不同偏振光的两个可区分的区域，并且从偏光镜的上方向紫外光照射到聚合物层上，从而在聚合物层的细微区域形成具有不同取向方向的取向层; 并在取向层上形成延迟层。 通过一次连续的光取向工艺获得交替连续地形成具有不同取向方向的微细区域的取向层。 因此，与常规技术相比，光取向处理和制造滤光器的方法被简化。 结果，改善了用于3D图像显示装置的滤光器的制造中的工艺成品率和生产率。

公开(公告)号：US07576008B2

公开(公告)日：2009-08-18

申请号：US11526690

申请日：2006-09-26

申请人： Tae Su Kim ,  Bu Gon Shin ,  Jae Sung You ,  Hyun Woo Shin

发明人： Tae Su Kim ,  Bu Gon Shin ,  Jae Sung You ,  Hyun Woo Shin

IPC分类号： H01L21/311

CPC分类号： H01L31/022425 ,  H01L33/382 ,  H01L33/42 ,  H05K3/0029 ,  H05K3/107 ,  H05K3/1241 ,  Y02E10/50

摘要： Disclosed is a method for manufacturing an optoelectronic semiconductor device having a p-n junction diode, which includes the steps of: (a) etching at least one surface of the p-n junction diode in a depth direction to form a plurality of continuous, isolated or mixed type electrode pattern grooves with a certain array; and (b) filling the formed grooves with a conductive ink containing a transparent conducting particle through an inkjet and then performing heat treatment to form a buried transparent electrode, the optoelectronic semiconductor device, and an apparatus for manufacturing the optoelectronic semiconductor device. In the present invention, covering loss is significantly reduced due to a buried transparent electrode so that the high efficiency of photoelectric conversion can be implemented, and there can be provided the easiness of a manufacturing process and the enhancement of productivity through the unification of etching and electrode forming processes.

摘要翻译： 公开了一种制造具有pn结二极管的光电子半导体器件的方法，其包括以下步骤：（a）在深度方向上蚀刻pn结二极管的至少一个表面以形成多个连续，隔离或混合型 具有一定阵列的电极图形凹槽; 和（b）通过喷墨用含有透明导电颗粒的导电油墨填充所形成的槽，然后进行热处理以形成掩埋的透明电极，光电子半导体器件和用于制造光电半导体器件的装置。 在本发明中，由于埋入了透明电极而导致的覆盖损耗显着降低，从而可以实现高效率的光电转换，并且可以提供制造工艺的容易性和通过蚀刻的统一提高生产率 电极形成工艺。

公开(公告)号：US20060281333A1

公开(公告)日：2006-12-14

申请号：US11431922

申请日：2006-05-11

申请人： Dong-Youn Shin ,  Bu Gon Shin

发明人： Dong-Youn Shin ,  Bu Gon Shin

IPC分类号： H01L21/20 ,  H01L23/58 ,  H01L21/31

CPC分类号： G03F7/70383 ,  C09D11/30 ,  H01L21/312 ,  H05K3/0032 ,  H05K3/048 ,  H05K3/125 ,  H05K3/1258 ,  H05K2203/013 ,  H05K2203/0568

摘要： Disclosed is a method for forming a pattern which comprises the steps of: (a) providing a substrate having a sacrificial layer made of a first material, partially or totally formed on the substrate; (b) forming pattern grooves, which are free from the first material and have a line width of a first resolution or lower, on the sacrificial layer by using a first means, by which the sacrificial layer is directly processed to form a line; (c) filling the pattern grooves with a second material to a second resolution by using a second means, to form a pattern of the second material on the substrate. A substrate having a pre-pattern formed by the method is also disclosed. The method for forming a pattern provides a high-resolution pattern with little or no waste of the second material, thereby reducing production costs. The method includes use of the first means with a high resolution, such as focused energy beams of laser, combined with the second means with a low resolution, such as ink-jet, and provides a high-resolution pattern with high processing efficiency.

摘要翻译： 公开了一种用于形成图案的方法，包括以下步骤：（a）提供具有由第一材料制成的牺牲层的基板，部分地或全部地形成在基板上; （b）通过使用第一装置在牺牲层上形成没有第一材料并且具有第一分辨率或更低的线宽的图案凹槽，通过该第一装置直接处理牺牲层以形成线; （c）通过使用第二装置用第二材料将图案凹槽填充到第二分辨率，以在基底上形成第二材料的图案。 还公开了通过该方法形成的预制图案的基板。 形成图案的方法提供了高分辨率图案，几乎或不浪费第二材料，从而降低了生产成本。 该方法包括使用具有高分辨率的第一装置，例如与诸如喷墨的低分辨率与第二装置结合的激光的聚焦能量束，并且提供具有高处理效率的高分辨率图案。

公开(公告)号：US07510951B2

公开(公告)日：2009-03-31

申请号：US11431922

申请日：2006-05-11

申请人： Dong-Youn Shin ,  Bu Gon Shin

发明人： Dong-Youn Shin ,  Bu Gon Shin

IPC分类号： H01L21/20 ,  H01L21/36

CPC分类号： G03F7/70383 ,  C09D11/30 ,  H01L21/312 ,  H05K3/0032 ,  H05K3/048 ,  H05K3/125 ,  H05K3/1258 ,  H05K2203/013 ,  H05K2203/0568

摘要： A patterning method comprising (a) providing a substrate having a sacrificial layer made of a first material, partially or totally formed on the substrate, (b) forming pattern grooves, which are free from the first material and have a line width of a first resolution or lower, on the sacrificial layer by using a first means, by which the sacrificial layer is directly processed to form a line, (c) filling the pattern grooves with a second material to a second resolution by using a second means, to form a pattern of the second material on the substrate. This method provides a high-resolution pattern with little or no waste of the second material, thereby reducing production costs. The method uses first high resolution means, such as focused energy beams of laser, combined with a low resolution means, such as ink-jet, to efficiently provide a high-resolution pattern.

摘要翻译： 一种图案化方法，包括：（a）提供具有由第一材料制成的牺牲层的基板，部分地或全部地形成在所述基板上，（b）形成图案凹槽，所述图案凹槽不含所述第一材料，并且具有第一 通过使用第一装置将牺牲层直接处理以形成线，（c）通过使用第二装置将第二材料的图案凹槽填充到第二分辨率，形成在牺牲层上，以形成 衬底上的第二材料的图案。 该方法提供了高分辨率图案，几乎或不浪费第二材料，从而降低了生产成本。 该方法使用第一高分辨率装置，例如激光的聚焦能量束，以及诸如喷墨的低分辨率装置，以有效地提供高分辨率图案。