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公开(公告)号：US20230112689A1
公开(公告)日：2023-04-13
申请号：US17963510
申请日：2022-10-11
Applicant: CANON KABUSHIKI KAISHA
Inventor： Masahiro Tamura , Tosiya Asano , Atsushi Kimura
Abstract: An imprint apparatus that performs an imprint process of forming a pattern of an imprint material on a substrate using a mold, the apparatus including a control unit configured to control a mold driving unit and a substrate driving unit, and the imprint process including curing the imprint material, and releasing the mold from the cured imprint material, wherein the control unit includes a compensator configured to feedback-control driving of at least one of the mold driving unit and the substrate driving unit such that a positional relationship between the mold and the substrate in the releasing is maintained at a positional relationship between the mold and the substrate in the curing, and makes a gain of the compensator in the releasing smaller than a gain of the compensator in a step of the imprint process other than the releasing.
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公开(公告)号：US20190033710A1
公开(公告)日：2019-01-31
申请号：US16044864
申请日：2018-07-25
Applicant: CANON KABUSHIKI KAISHA
Inventor： Ken-ichiro Shinoda , Masahiro Tamura
Abstract: An imprint apparatus includes a mold holder for holding a mold, a substrate holder for holding a substrate, a dispenser for arranging imprint material on the substrate, and a scope for capturing an image of a mark. The substrate holder includes a reference plate having a reference mark whose image is captured by the scope, the dispenser is arranged in a first direction when viewed from the mold holder, and the reference plate is arranged between a virtual straight line which is parallel to a second direction perpendicular to the first direction when viewed from the mold holder and passes through a center of the substrate holder, and an edge of the substrate holder located in the first direction when viewed from the virtual straight line.
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公开(公告)号：US20220388230A1
公开(公告)日：2022-12-08
申请号：US17735238
申请日：2022-05-03
Applicant: CANON KABUSHIKI KAISHA
Inventor： Yosuke Murakami , Kazuki Nakagawa , Masahiro Tamura
Abstract: In order to provide an imprint device and the like that can efficiently maintain a concentration of a gas when imprinting is sequentially performed, the imprint device includes: a mold holding unit configured to a mold; a substrate holding unit configured to holding a substrate; a gas supply unit configured to supply a gas to an imprint space between the mold and the substrate; and a control unit configured to control the gas supply unit and an imprinting operation, wherein the control unit is configured to sequentially perform imprinting on a plurality of imprint regions of the substrate, and the control unit is configured to, when a moving direction of the substrate between the imprint regions is changed from a first direction to a second direction, supply a gas to the imprint space in the first direction and the second direction using the gas supply unit during the imprinting operation on the imprint region before the change in the moving direction.
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公开(公告)号：US20200264507A1
公开(公告)日：2020-08-20
申请号：US16780023
申请日：2020-02-03
Applicant: CANON KABUSHIKI KAISHA
Inventor： Zenichi Hamaya , Masahiro Tamura , Yoshinari Someya
Abstract: The present invention provides an imprint method that performs a process of forming a pattern of an imprint material on a substrate using a mold, for each of a plurality of shot regions on the substrate, the process including: dispensing the imprint material onto the substrate; moving, to below the mold, the substrate on which the imprint material is dispensed; and supplying, in a moving path of the substrate in the moving, a first gas that promotes filling of the imprint material into a pattern of the mold, wherein in a case where a target shot region to be subjected to the process meets a predetermined condition, supplying a second gas having a lower oxygen concentration than air onto the substrate is additionally executed for the target shot region after the supplying the first gas.
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公开(公告)号：US10859912B2
公开(公告)日：2020-12-08
申请号：US16044864
申请日：2018-07-25
Applicant: CANON KABUSHIKI KAISHA
Inventor： Ken-ichiro Shinoda , Masahiro Tamura
Abstract: An imprint apparatus includes a mold holder for holding a mold, a substrate holder for holding a substrate, a dispenser for arranging imprint material on the substrate, and a scope for capturing an image of a mark. The substrate holder includes a reference plate having a reference mark whose image is captured by the scope, the dispenser is arranged in a first direction when viewed from the mold holder, and the reference plate is arranged between a virtual straight line which is parallel to a second direction perpendicular to the first direction when viewed from the mold holder and passes through a center of the substrate holder, and an edge of the substrate holder located in the first direction when viewed from the virtual straight line.
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Patent Agency Ranking
公开(公告)号：US10707078B2
公开(公告)日：2020-07-07
申请号：US15442792
申请日：2017-02-27
Applicant: CANON KABUSHIKI KAISHA
Inventor： Masahiro Tamura , Takuro Yamazaki
IPC: H01L21/027 , G03F7/00
Abstract: There is provided a method for use in molding an imprint material supplied onto a substrate with a mold to form a pattern on the substrate, the method comprising steps of: with respect to each of regions obtained by dividing a region of the mold based on information of a pattern of the mold, obtaining first information of a first arrangement pattern of the imprint material based on information of the pattern of the mold; obtaining second information of a second arrangement pattern of the imprint material based on information of a thickness of a residual layer of the pattern to be formed on the substrate; and obtaining third information of a third arrangement pattern of the imprint material to be arranged on the substrate based on the first information and the second information.
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公开(公告)号：US10120276B2
公开(公告)日：2018-11-06
申请号：US14674244
申请日：2015-03-31
Applicant: CANON KABUSHIKI KAISHA
Inventor： Philip D. Schumaker , Yeshwanth Srinivasan , Masahiro Tamura , Takuro Yamazaki
Abstract: The present invention provides an imprint apparatus which forms a pattern on a substrate by molding an imprint material on the substrate using a mold, comprising a supply unit configured to supply droplets of the imprint material onto the substrate; and a processing unit configured to acquire arrangement patterns of the droplets on the substrate, wherein based on the arrangement pattern corresponding to a first portion of the mold and the arrangement pattern corresponding to a second portion of the mold, the processing unit acquires the arrangement pattern corresponding to a boundary portion between the first portion and the second portion.
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8.发明申请IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING ARTICLE 审中-公开IMPRINT APPARATUS，IMPRINT METHOD，AND METHOD OF MANUFACTURING ARTICLE公开(公告)号：US20160288404A1
公开(公告)日：2016-10-06
申请号：US14674244
申请日：2015-03-31
Applicant: CANON KABUSHIKI KAISHA
Inventor： Philip D. Schumaker , Yeshwanth Srinivasan , Masahiro Tamura , Takuro Yamazaki
IPC: B29C59/02
CPC classification number: G03F7/0002
Abstract: The present invention provides an imprint apparatus which forms a pattern on a substrate by molding an imprint material on the substrate using a mold, comprising a supply unit configured to supply droplets of the imprint material onto the substrate; and a processing unit configured to acquire arrangement patterns of the droplets on the substrate, wherein based on the arrangement pattern corresponding to a first portion of the mold and the arrangement pattern corresponding to a second portion of the mold, the processing unit acquires the arrangement pattern corresponding to a boundary portion between the first portion and the second portion.
Abstract translation: 本发明提供了一种压印装置，其通过使用模具将压印材料模制在基板上而在基板上形成图案，所述模具包括供给单元，该供给单元构造成将压印材料的液滴供应到基板上; 以及处理单元，其被配置为获取所述基板上的液滴的布置图案，其中，基于与所述模具的第一部分对应的布置图案和对应于所述模具的第二部分的布置图案，所述处理单元获取所述布置图案 对应于第一部分和第二部分之间的边界部分。
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公开(公告)号：US11747722B2
公开(公告)日：2023-09-05
申请号：US16780023
申请日：2020-02-03
Applicant: CANON KABUSHIKI KAISHA
Inventor： Zenichi Hamaya , Masahiro Tamura , Yoshinari Someya
CPC classification number: G03F7/0002 , B29C35/0888 , B29C59/022
Abstract: The present invention provides an imprint method that performs a process of forming a pattern of an imprint material on a substrate using a mold, for each of a plurality of shot regions on the substrate, the process including: dispensing the imprint material onto the substrate; moving, to below the mold, the substrate on which the imprint material is dispensed; and supplying, in a moving path of the substrate in the moving, a first gas that promotes filling of the imprint material into a pattern of the mold, wherein in a case where a target shot region to be subjected to the process meets a predetermined condition, supplying a second gas having a lower oxygen concentration than air onto the substrate is additionally executed for the target shot region after the supplying the first gas.
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公开(公告)号：US20170252775A1
公开(公告)日：2017-09-07
申请号：US15442792
申请日：2017-02-27
Applicant: CANON KABUSHIKI KAISHA
Inventor： Masahiro Tamura , Takuro Yamazaki
IPC: B05D3/12 , B05C5/02 , H01L21/027 , B05D1/26
Abstract: There is provided a method for use in molding an imprint material supplied onto a substrate with a mold to form a pattern on the substrate, the method comprising steps of: with respect to each of regions obtained by dividing a region of the mold based on information of a pattern of the mold, obtaining first information of a first arrangement pattern of the imprint material based on information of the pattern of the mold; obtaining second information of a second arrangement pattern of the imprint material based on information of a thickness of a residual layer of the pattern to be formed on the substrate; and obtaining third information of a third arrangement pattern of the imprint material to be arranged on the substrate based on the first information and the second information.
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