公开(公告)号：US11899362B2

公开(公告)日：2024-02-13

申请号：US18067974

申请日：2022-12-19

Applicant: CANON KABUSHIKI KAISHA

Inventor： Yosuke Murakami ,  Kazuki Nakagawa

IPC: G03F7/00 ,  G03F9/00 ,  G03F7/20

CPC classification number: G03F7/0002 ,  G03F7/2022 ,  G03F9/7042

Abstract: An imprint apparatus performs an imprint process including aligning a substrate and a mold in a state in which the mold is in contact with an imprint material on the substrate and curing the imprint material by light irradiation after the aligning. The apparatus includes a first irradiation unit configured to perform first light irradiation of the imprint material on the substrate before bringing the mold into contact with the imprint material on the substrate for the aligning, a second irradiation unit configured to perform second light irradiation of the imprint material on the substrate in the aligning, and a third irradiation unit configured to perform third light irradiation of the imprint material on the substrate in the curing, wherein an exposure amount by the first light irradiation is determined based on an exposure amount by the second light irradiation.

公开(公告)号：US10216103B2

公开(公告)日：2019-02-26

申请号：US14848436

申请日：2015-09-09

Applicant: CANON KABUSHIKI KAISHA

Inventor： Kazuki Nakagawa

IPC: G03F9/00 ,  G03F7/00

Abstract: The present invention provides an imprint method of molding an imprint material supplied on a shot region of a substrate by a mold having a pattern region in which a pattern has been formed, the method comprising a deformation step of performing, based on information indicating at least one among a shape of the pattern region and a shape of the shot region, deformation of at least one region among the pattern region and the shot region, an estimation step of estimating a moving amount of a mark by the deformation, the mark being provided in the at least one region, and an overlay step of performing, based on the moving amount and detection results of positions of a mark in the pattern region and a mark in the shot region, overlay between the pattern region and the shot region.

公开(公告)号：US10073339B2

公开(公告)日：2018-09-11

申请号：US14565520

申请日：2014-12-10

Applicant: CANON KABUSHIKI KAISHA

Inventor： Kazuki Nakagawa ,  Yosuke Murakami ,  Mitsuru Hiura

IPC: G03F7/00 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B29C59/02 ,  B29C59/022 ,  B29C2059/023

Abstract: The present invention provides an imprint apparatus which performs an imprint process of molding an imprint material on a substrate with a mold and forming a pattern on the substrate, the apparatus including a detector configured to detect a shearing force generated in at least one of the mold and the substrate in a case where a pattern of the mold and a region of the substrate are aligned with each other with the imprint material on the substrate and the mold being in contact with each other, and a controller configured to control the imprint process based on the detected shearing force.

公开(公告)号：US09566741B2

公开(公告)日：2017-02-14

申请号：US14887472

申请日：2015-10-20

Applicant: CANON KABUSHIKI KAISHA

Inventor： Kazuki Nakagawa ,  Noriyasu Hasegawa ,  Yosuke Murakami ,  Takahiro Matsumoto

IPC: B41L35/14 ,  B29C59/02 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00 ,  B29C59/16 ,  B29K101/00 ,  B29L9/00 ,  B29L31/34

CPC classification number: H01L21/682 ,  B29C35/0805 ,  B29C59/026 ,  B29C59/16 ,  B29C2035/0822 ,  B29K2101/00 ,  B29L2009/00 ,  B29L2031/34 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0271 ,  H01L21/324 ,  H01L21/67115 ,  H01L21/6715 ,  H01L21/6838 ,  H01L22/20 ,  H01L23/544

Abstract: An imprint method of forming a pattern of a resin on a substrate held on a holding surface. An uncured resin on the substrate is brought in contact with a mold. A partial region of the substrate is thermally deformed by irradiating the region with light so as to change an outer circumferential shape of the region. The uncured resin is cured on the region by irradiating light having a wavelength different from the deforming light. The mold is released from the cured resin on the region in contact with the mold. In at least a portion of a period during the deforming step, a region different from the region is held at a first suction force, while the region is held at a second suction force less than the first. The first suction force and the second suction force act between the substrate and the holding surface.

Abstract translation: 在保持在保持表面上的基板上形成树脂图案的压印方法。 使基板上的未固化树脂与模具接触。 通过用光照射该区域来使基板的局部区域发生热变形，从而改变该区域的外周形状。 通过照射具有与变形光不同的波长的光，在该区域上固化未固化的树脂。 在与模具接触的区域上的固化树脂上释放模具。 在变形步骤期间的至少一部分时间段中，与该区域不同的区域被保持在第一抽吸力，同时该区域保持在小于第一抽吸力的第二抽吸力。 第一吸力和第二吸力作用在基板和保持表面之间。

公开(公告)号：US11036149B2

公开(公告)日：2021-06-15

申请号：US16105341

申请日：2018-08-20

Applicant: CANON KABUSHIKI KAISHA

Inventor： Yoichi Matsuoka ,  Kiyohito Yamamoto ,  Hisanobu Azuma ,  Shigeru Terashima ,  Toshihiro Maeda ,  Masami Yonekawa ,  Keiji Emoto ,  Kazuki Nakagawa

IPC: G03F7/20 ,  G03F7/00 ,  G06F7/20

Abstract: An imprint apparatus forms a pattern on a substrate by curing an imprint material on the substrate while the imprint material is in contact with a mold. The imprint apparatus includes a substrate chuck having a substrate holding region for holding the substrate, a peripheral member arranged to surround the side surface of the substrate held by the substrate chuck, and a control unit configured to control a cleaning process for cleaning at least a partial region of the peripheral member by using a cleaning member including a charging unit. The cleaning process includes an operation for attracting a particle in the partial region to the charging unit by moving the cleaning member relative to the peripheral member while the charging unit faces at least the partial region of the peripheral member.

公开(公告)号：US20190265589A1

公开(公告)日：2019-08-29

申请号：US16408586

申请日：2019-05-10

Applicant: CANON KABUSHIKI KAISHA

Inventor： Kazuki Nakagawa

IPC: G03F7/00 ,  H01L21/027

Abstract: There is provided that an imprint apparatus that forms a pattern on a substrate by curing an imprint material in a state in which a mold and the imprint material on the substrate are in contact with each other, the apparatus including a control unit configured to control a movement of a stage configured to hold the substrate and the supplying of a gas by a gas supplying unit, wherein the control unit removes charges from the mold by starting the supplying of the gas by the gas supplying unit before starting to move the stage below a dispenser after the mold and the cured imprint material are separated, and making a peripheral member face the mold via the gas during the movement of the stage.

公开(公告)号：US10359696B2

公开(公告)日：2019-07-23

申请号：US14515927

申请日：2014-10-16

Applicant: CANON KABUSHIKI KAISHA

Inventor： Yosuke Murakami ,  Tatsuya Hayashi ,  Kazuki Nakagawa

IPC: G03F7/00 ,  G03F7/20 ,  B29C43/02 ,  B29K101/00 ,  B29L31/00 ,  B29C43/52 ,  B29C43/36 ,  G03F9/00

Abstract: The present invention provides an imprint apparatus which performs an imprint process of forming a pattern on a substrate by using a mold, the apparatus comprising a heating unit configured to heat a region to be imprinted on the substrate, thereby deforming the region, and a processing unit configured to determine, as a region to be imprinted first, one region out of a first region and second region to be imprinted, and determine the other region as a region to be imprinted subsequently, wherein an influence on the other region in a case where the heating unit deforms the one region is smaller than an influence on the one region in a case where the heating unit deforms the other region.

公开(公告)号：US09823562B2

公开(公告)日：2017-11-21

申请号：US14288435

申请日：2014-05-28

Applicant: CANON KABUSHIKI KAISHA

Inventor： Tomofumi Nishikawara ,  Kazuki Nakagawa

IPC: G03F7/00

CPC classification number: G03F7/0002

Abstract: The present invention provides an imprint apparatus for forming a pattern in a plurality of shot regions on a substrate, comprising a heating unit configured to deform each of the shot regions by heating the substrate, and a control unit configured to control the heating unit, wherein when performing imprint processing for a target shot region as a shot region to undergo imprint processing based on heating control information used to heat, by the heating unit, a shot region which has undergone imprint processing prior to the target shot region, the control unit controls heating of the substrate by the heating unit so that a shape of the target shot region which has been deformed by heating of the substrate according to the control information becomes close to a target shape.

公开(公告)号：US09201298B2

公开(公告)日：2015-12-01

申请号：US13647667

申请日：2012-10-09

Applicant: CANON KABUSHIKI KAISHA

Inventor： Kazuki Nakagawa ,  Noriyasu Hasegawa ,  Yosuke Murakami ,  Takahiro Matsumoto

IPC: B41F23/04 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: H01L21/682 ,  B29C35/0805 ,  B29C59/026 ,  B29C59/16 ,  B29C2035/0822 ,  B29K2101/00 ,  B29L2009/00 ,  B29L2031/34 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0271 ,  H01L21/324 ,  H01L21/67115 ,  H01L21/6715 ,  H01L21/6838 ,  H01L22/20 ,  H01L23/544

Abstract: An imprint method of transferring a pattern formed on a mold onto a resin on a substrate. The substrate is held on a holding surface by suction. A shape of a substrate-side pattern area pre-existing on the substrate is deformed. A resin on the pattern area is brought in contact with the mold. Positions of the pattern of the mold and of the pattern area are adjusted. The resin is cured and the mold is released from the resin in contact with the mold. A deformation force, which is greater than a maximum static frictional force acting between a rear surface of the substrate corresponding to the pattern area and the holding surface, is applied to the substrate. A suction force acting on the rear surface of the substrate corresponding to the pattern area in deforming is less than a suction force acting on the substrate in adjusting.

Abstract translation: 将在模具上形成的图案转印到基板上的树脂上的压印方法。 基板通过抽吸保持在保持表面上。 预先存在于基板上的基板侧图案区域的形状变形。 图案区域上的树脂与模具接触。 调整模具图案和图案区域的位置。 树脂被固化并且模具从与模具接触的树脂中释放出来。 大于在与图案区域对应的基板的后表面和保持表面之间的最大静摩擦力的变形力施加到基板。 在变形中对应于图案区域的作用在基板的后表面上的吸力小于在调节中作用在基板上的吸力。

公开(公告)号：US20150190961A1

公开(公告)日：2015-07-09

申请号：US14565520

申请日：2014-12-10

Applicant: CANON KABUSHIKI KAISHA

Inventor： Kazuki Nakagawa ,  Yosuke Murakami ,  Mitsuru Hiura

IPC: B29C59/00 ,  B29C37/00 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B29C59/02 ,  B29C59/022 ,  B29C2059/023

Abstract: The present invention provides an imprint apparatus which performs an imprint process of molding an imprint material on a substrate with a mold and forming a pattern on the substrate, the apparatus including a detector configured to detect a shearing force generated in at least one of the mold and the substrate in a case where a pattern of the mold and a region of the substrate are aligned with each other with the imprint material on the substrate and the mold being in contact with each other, and a controller configured to control the imprint process based on the detected shearing force.

Abstract translation: 本发明提供了一种压印装置，其进行使用模具将压印材料成型在基板上并在基板上形成图案的压印工艺，该设备包括检测器，其被配置为检测在至少一个模具中产生的剪切力 以及在基板上的压印材料和模具彼此接触的情况下，模具的图案和基板的区域彼此对准的情况下的基板，以及控制器，其被配置为基于 检测剪切力。